Inventor · disambiguated record
Yuji Matsuyama
Also filed as: MATSUI HIDEFUMI · MATSUYAMA YUJI
46 granted patents·8 pending applications·1,652 citations·filing 1990–2017
99Inventor score
Top patents by PatentIndex Score
54 records- 0198US6074154ASubstrate treatment system, substrate transfer system, and substrate transfer methodTOKYO ELECTRON LTD·Filed 1997·Granted Jun 13, 2000·457 cites·8 claims
- 0294US6514570B1Solution processing apparatus and methodTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·90 cites·20 claims
- 0394US6471422B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Oct 29, 2002·63 cites·13 claims
- 0493US6672779B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Jan 6, 2004·51 cites·22 claims
- 0592US6425722B1Substrate treatment system, substrate transfer system, and substrate transfer methodTOKYO ELECTRON LTD·Filed 2000·Granted Jul 30, 2002·54 cites·6 claims
- 0692US6402401B1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Jun 11, 2002·49 cites·66 claims
- 0791US6518199B2Method and system for coating and developingTOKYO ELECTRON LTD·Filed 2001·Granted Feb 11, 2003·31 cites·8 claims
- 0890US6533864B1Solution processing apparatus and methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 18, 2003·53 cites·12 claims
- 0989US6602382B1Solution processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 5, 2003·49 cites·9 claims
- 1088US6585430B2System and method for coating and developingTOKYO ELECTRON LTD·Filed 2001·Granted Jul 1, 2003·42 cites·17 claims
- 1188US6332723B1Substrate processing apparatus and methodTOKYO ELECTRON LTD·Filed 2000·Granted Dec 25, 2001·51 cites·19 claims
- 1287US5374312ALiquid coating systemTOKYO ELECTRON LTD·Filed 1993·Granted Dec 20, 1994·119 cites·7 claims
- 1386US6402821B1Filter unit and solution treatment unitTOKYO ELECTRON LTD·Filed 2000·Granted Jun 11, 2002·38 cites·10 claims
- 1486US6384894B2Developing method and developing unitTOKYO ELECTRON LTD·Filed 2001·Granted May 7, 2002·36 cites·11 claims
- 1586US6364547B1Solution processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Apr 2, 2002·38 cites·21 claims
- 1683US7408199B2Nitride semiconductor laser device and nitride semiconductor deviceNICHIA CORP·Filed 2005·Granted Aug 5, 2008·12 cites·37 claims
- 1779US6015066ALiquid supplying deviceTOKYO ELECTRON LTD·Filed 1997·Granted Jan 18, 2000·44 cites·15 claims
- 1878US6633022B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2001·Granted Oct 14, 2003·21 cites·20 claims
- 1977US6632281B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2001·Granted Oct 14, 2003·15 cites·17 claims
- 2076US6467976B2Coating and developing systemTOKYO ELECTRON LTD·Filed 2001·Granted Oct 22, 2002·18 cites·10 claims
- 2174US6655891B2Substrate treatment system, substrate transfer system, and substrate transfer methodTOKYO ELECTRON LTD·Filed 2002·Granted Dec 2, 2003·13 cites·9 claims
- 2274US6485893B1Resist pattern forming method and film forming methodTOKYO ELECTRON LTD·Filed 2000·Granted Nov 26, 2002·16 cites·5 claims
- 2372US6312171B1Developing apparatus and method thereofTOKYO ELECTRON LTD·Filed 2000·Granted Nov 6, 2001·16 cites·15 claims
- 2471US6875281B2Method and system for coating and developingTOKYO ELECTRON LTD·Filed 2001·Granted Apr 5, 2005·12 cites·9 claims
- 2570US6246030B1Heat processing method and apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jun 12, 2001·35 cites·21 claims
- 2670US5035200AProcessing liquid supply unitTOKYO ELECTRON LTD·Filed 1990·Granted Jul 30, 1991·51 cites·12 claims
- 2768US7813397B2Nitride semiconductor laser deviceNICHIA CORP·Filed 2008·Granted Oct 12, 2010·2 cites·8 claims
- 2866US6884298B2Method and system for coating and developingTOKYO ELECTRON LTD·Filed 2002·Granted Apr 26, 2005·6 cites·5 claims
- 2965US7517217B2Method and apparatus for heat processing of substrateTOKYO ELECTRON LTD·Filed 2005·Granted Apr 14, 2009·2 cites·3 claims
- 3063US7208066B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Apr 24, 2007·7 cites·9 claims
- 3163US6287025B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Sep 11, 2001·26 cites·20 claims
- 3262US6292250B1Substrate process apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Sep 18, 2001·25 cites·10 claims
- 3361US8641202B2Projection display deviceOKADA HISASHI·Filed 2009·Granted Feb 4, 2014·2 cites·3 claims
- 3461US7022190B2Substrate coating unit and substrate coating methodTOKYO ELECTRON LTD·Filed 2002·Granted Apr 4, 2006·6 cites·7 claims
- 3560US6215545B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Apr 10, 2001·23 cites·19 claims
- 3658US6261365B1Heat treatment method, heat treatment apparatus and treatment systemTOKYO ELECTRON LTD·Filed 1999·Granted Jul 17, 2001·19 cites·14 claims
- 3756US6979474B2Heat treatment method, heat treatment apparatus and treatment systemTOKYO ELECTRON LTD·Filed 2001·Granted Dec 27, 2005·4 cites·15 claims
- 3854US8768684B2Apparatus, method and program for processing informationMITSUZAWA ATSUSHI·Filed 2010·Granted Jul 1, 2014·1 cites·15 claims
- 3954US5958145AMethod for washing both surfaces of a substrateTOKYO ELECTRON LTD·Filed 1998·Granted Sep 28, 1999·16 cites·12 claims
- 4051US6173468B1Apparatus for washing both surfaces of a substrateTOKYO ELECTRON LTD·Filed 1999·Granted Jan 16, 2001·14 cites·7 claims
- 4150US10215996B2Light source deviceNICHIA CORP·Filed 2017·Granted Feb 26, 2019·0 cites·19 claims
- 4250US2006127575A1Substrate coating unit and substrate coating methodTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 4349US5985039AApparatus and method for washing both surfaces of a substrateTOKYO ELECTRON LTD·Filed 1998·Granted Nov 16, 1999·15 cites·16 claims
- 4448US6620248B2Coating apparatus and mixing apparatusTOYKO ELECTRON LTD·Filed 2001·Granted Sep 16, 2003·2 cites·11 claims
- 4545US6969538B2Method for heat processing of substrateTOKYO ELECTRON LTD·Filed 2001·Granted Nov 29, 2005·1 cites·8 claims
- 4644US2005048421A1Method and system for coating and developingTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 4743US9420615B2Information processing apparatus, information processing method, and programSONY CORP·Filed 2015·Granted Aug 16, 2016·0 cites·13 claims
- 4842US2003119333A1Method and system for coating and developingTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 4942US2006088072A1Semiconductor laser apparatusNICHIA CORP·Filed 2005·Application pending·0 cites
- 5040US2011209217A1Information processing apparatus, information processing method, and programSONY CORP·Filed 2011·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
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