Inventor · disambiguated record
Ikuo Yoneda
Also filed as: YONEDA IKUO
43 granted patents·13 pending applications·421 citations·filing 1995–2019
97Inventor score
Top patents by PatentIndex Score
56 records- 0197US5792376APlasma processing apparatus and plasma processing methodTOSHIBA KK·Filed 1995·Granted Aug 11, 1998·191 cites·8 claims
- 0294US9381540B2Pattern forming methodTOSHIBA KK·Filed 2015·Granted Jul 5, 2016·6 cites·19 claims
- 0392US8419995B2Imprint methodYONEDA IKUO·Filed 2009·Granted Apr 16, 2013·19 cites·13 claims
- 0489US8480946B2Imprint method and template for imprintingMIKAMI SHINJI·Filed 2009·Granted Jul 9, 2013·12 cites·10 claims
- 0589US8202463B2Imprint methodYONEDA IKUO·Filed 2009·Granted Jun 19, 2012·13 cites·14 claims
- 0687US8444889B2Imprint pattern forming methodTOKUE HIROSHI·Filed 2010·Granted May 21, 2013·7 cites·13 claims
- 0787US8019462B2Imprint system and imprint methodTOSHIBA KK·Filed 2010·Granted Sep 13, 2011·6 cites·5 claims
- 0887US7390365B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Jun 24, 2008·27 cites·15 claims
- 0986US10168615B2Imprint apparatus, imprint method, and article manufacturing methodCANON KK·Filed 2014·Granted Jan 1, 2019·5 cites·12 claims
- 1085US8691123B2Fine processing method, fine processing apparatus, and recording medium with fine processing program recorded thereonNAKAGAWA YASUTADA·Filed 2011·Granted Apr 8, 2014·6 cites·16 claims
- 1184US10192741B2Device substrate, method of manufacturing device substrate, and method of manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2017·Granted Jan 29, 2019·3 cites·9 claims
- 1284US8485624B2Droplet dispensing control method, droplet dispensing control device, and method of manufacturing semiconductor devicesMIKAMI SHINJI·Filed 2011·Granted Jul 16, 2013·4 cites·20 claims
- 1384US6929903B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2003·Granted Aug 16, 2005·21 cites·10 claims
- 1483US8468480B2Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor deviceINANAMI RYOICHI·Filed 2010·Granted Jun 18, 2013·8 cites·13 claims
- 1583US7856288B2Imprint system and imprint methodTOSHIBA KK·Filed 2008·Granted Dec 21, 2010·8 cites·6 claims
- 1682US8227267B2Template inspection method and manufacturing method for semiconductor deviceYONEDA IKUO·Filed 2009·Granted Jul 24, 2012·7 cites·8 claims
- 1779US7854604B2Semiconductor device fabrication method and pattern formation moldTOSHIBA KK·Filed 2008·Granted Dec 21, 2010·5 cites·4 claims
- 1877US9793120B2Device substrate, method of manufacturing device substrate, and method of manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2016·Granted Oct 17, 2017·2 cites·5 claims
- 1977US9377777B2Fine processing method, fine processing apparatus, and recording medium with fine processing program recorded thereonTOSHIBA KK·Filed 2014·Granted Jun 28, 2016·3 cites·4 claims
- 2077US9046763B2Pattern forming methodKOSHIBA TAKESHI·Filed 2010·Granted Jun 2, 2015·3 cites·4 claims
- 2177US7094522B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Aug 22, 2006·14 cites·4 claims
- 2274US8973494B2Imprint method and imprint apparatusHATANO MASAYUKI·Filed 2011·Granted Mar 10, 2015·2 cites·20 claims
- 2370US7001086B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Feb 21, 2006·9 cites·10 claims
- 2468US8946080B2Pattern transfer methodYONEDA IKUO·Filed 2012·Granted Feb 3, 2015·2 cites·19 claims
- 2565USRE47093EImprint pattern forming methodTOSHIBA MEMORY CORP·Filed 2016·Granted Oct 23, 2018·0 cites·53 claims
- 2665US9944014B2Pattern forming method and pattern forming apparatusTOSHIBA MEMORY CORP·Filed 2016·Granted Apr 17, 2018·0 cites·4 claims
- 2765US8282868B2Semiconductor device fabrication method and pattern formation moldYONEDA IKUO·Filed 2010·Granted Oct 9, 2012·1 cites·9 claims
- 2864US8221827B2Patterning methodTOKUE HIROSHI·Filed 2009·Granted Jul 17, 2012·1 cites·10 claims
- 2963US10241397B2Imprint apparatus and imprint methodTOSHIBA MEMORY CORP·Filed 2014·Granted Mar 26, 2019·1 cites·4 claims
- 3061USRE46191EImprint pattern forming methodTOSHIBA KK·Filed 2015·Granted Nov 1, 2016·0 cites·30 claims
- 3161US9403316B2Pattern forming method and pattern forming apparatusTOSHIBA KK·Filed 2014·Granted Aug 2, 2016·0 cites·7 claims
- 3260US11333969B2Imprint apparatus, imprint method, and article manufacturing methodCANON KK·Filed 2018·Granted May 17, 2022·0 cites·8 claims
- 3360US2009045539A1Pattern forming method and pattern forming apparatusYONEDA IKUO·Filed 2008·Application pending·0 cites
- 3459US9588418B2Pattern forming methodTOSHIBA KK·Filed 2014·Granted Mar 7, 2017·0 cites·18 claims
- 3559US2015014877A1Imprint apparatus, imprint method, and article manufacturing methodCANON KK·Filed 2014·Application pending·0 cites
- 3657US10018908B2Pattern forming methodTOSHIBA MEMORY CORP·Filed 2017·Granted Jul 10, 2018·0 cites·15 claims
- 3756USRE48815EMethod of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor deviceKIOXIA CORP·Filed 2015·Granted Nov 9, 2021·0 cites·27 claims
- 3856US8945798B2Near-field exposure mask and pattern forming methodTOSHIBA KK·Filed 2013·Granted Feb 3, 2015·0 cites·17 claims
- 3955US6165907APlasma etching method and plasma etching apparatusTOSHIBA KK·Filed 1997·Granted Dec 26, 2000·20 cites·4 claims
- 4053US9550322B2Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint methodTOSHIBA KK·Filed 2015·Granted Jan 24, 2017·0 cites·10 claims
- 4150US8206895B2Method for forming pattern and method for manufacturing semiconductor deviceYONEDA IKUO·Filed 2008·Granted Jun 26, 2012·0 cites·5 claims
- 4250US2009095711A1Microfabrication apparatus and device manufacturing methodKOSHIBA TAKESHI·Filed 2008·Application pending·0 cites
- 4349US6159642AExposure mask and method of manufacturing thereof, and pattern data generating method for an exposure maskTOSHIBA KK·Filed 1997·Granted Dec 12, 2000·15 cites·17 claims
- 4449US2009315223A1Template and pattern forming methodYONEDA IKUO·Filed 2009·Application pending·0 cites
- 4547US9029047B2Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint methodSHIDA NAOMI·Filed 2012·Granted May 12, 2015·0 cites·7 claims
- 4647US2010124601A1Pattern formation method and computer program productOTA TAKUMI·Filed 2009·Application pending·0 cites
- 4747US2010022036A1Method for forming pattern, and templateYONEDA IKUO·Filed 2008·Application pending·0 cites
- 4846US11282723B2Liquid delivery member, liquid delivery apparatus, and semiconductor device manufacturing methodKIOXIA CORP·Filed 2019·Granted Mar 22, 2022·0 cites·14 claims
- 4945US2008090170A1Pattern forming template and pattern forming methodYONEDA IKUO·Filed 2007·Application pending·0 cites
- 5044US7368735B2Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted May 6, 2008·0 cites·12 claims
Showing the top 50 of 56 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →