Inventor · disambiguated record
Gerardus Carolus Johannus Hofmans
Also filed as: HOFMANS GERARDUS CAROLUS JOHAN · HOFMANS GERARDUS CAROLUS JOHANNUS
8 granted patents·1 pending application·44 citations·filing 2004–2012
85Inventor score
Files withASML NETHERLANDS BV3HOFMANS GERARDUS CAROLUS JOHANNUS3STAALS FRANK2GERAETS HUBERTUS ANTONIUS1
Top patents by PatentIndex Score
9 records- 0184US8554510B2Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program productSTAALS FRANK·Filed 2010·Granted Oct 8, 2013·5 cites·14 claims
- 0282US8908148B2Calibration method and inspection apparatusGERAETS HUBERTUS ANTONIUS·Filed 2011·Granted Dec 9, 2014·9 cites·10 claims
- 0380US8208122B2Method of measuring a lithographic projection apparatusSTAALS FRANK·Filed 2009·Granted Jun 26, 2012·7 cites·26 claims
- 0478US7502096B2Lithographic apparatus, calibration method, device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2006·Granted Mar 10, 2009·7 cites·22 claims
- 0577US8436998B2Method of measuring focus of a lithographic projection apparatusHOFMANS GERARDUS CAROLUS JOHANNUS·Filed 2012·Granted May 7, 2013·3 cites·9 claims
- 0669US7379154B2Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicleASML NETHERLANDS BV·Filed 2004·Granted May 27, 2008·9 cites·18 claims
- 0764US8446564B2Lithographic apparatus and device manufacturing methodHOFMANS GERARDUS CAROLUS JOHANNUS·Filed 2009·Granted May 21, 2013·2 cites·16 claims
- 0864US8289516B2Method of measuring focus of a lithographic projection apparatusHOFMANS GERARDUS CAROLUS JOHANNUS·Filed 2008·Granted Oct 16, 2012·2 cites·12 claims
- 0950US2008137049A1Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicleASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →