Inventor · disambiguated record
Kouichirou Tsujita
Also filed as: TSUJITA KOUICHIROU
31 granted patents·3 pending applications·187 citations·filing 1989–2014
96Inventor score
Top patents by PatentIndex Score
34 records- 0182US7642022B2Parameter determination method, exposure method, device fabrication method, and storage mediumCANON KK·Filed 2009·Granted Jan 5, 2010·6 cites·7 claims
- 0276US9406510B2Pattern forming method and article manufacturing methodCANON KK·Filed 2014·Granted Aug 2, 2016·3 cites·9 claims
- 0374US6774043B2Method of manufacturing semiconductor deviceRENESAS TECH CORP·Filed 2001·Granted Aug 10, 2004·19 cites·18 claims
- 0473US4981529ASemiconductor substrate provided with marks for alignment even under a resist filmMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Jan 1, 1991·42 cites·2 claims
- 0572US9551926B2Determination method, storage medium and information processing apparatusGYODA YUICHI·Filed 2012·Granted Jan 24, 2017·2 cites·11 claims
- 0669US8049191B2Method of transferring pattern of reticle, computer readable storage medium, and method of manufacturing deviceCANON KK·Filed 2009·Granted Nov 1, 2011·2 cites·10 claims
- 0767US8582083B2Effective light source shape database generation method, optical image calculation method, recording medium, exposure method, and device fabrication methodYOSHII HIROTO·Filed 2009·Granted Nov 12, 2013·2 cites·11 claims
- 0864US9690201B2Drawing method and method of manufacturing articleCANON KK·Filed 2013·Granted Jun 27, 2017·1 cites·8 claims
- 0964US8584055B2Non-transitory computer-readable storage medium, decision method and computer for deciding exposure condition using evaluation item of interest and auxiliary evaluation itemGYODA YUICHI·Filed 2012·Granted Nov 12, 2013·1 cites·18 claims
- 1061US8334968B2Recording medium storing program for determining exposure parameter, exposure method, and method of manufacturing deviceTSUJITA KOUICHIROU·Filed 2009·Granted Dec 18, 2012·1 cites·5 claims
- 1160US6938238B2Method of manufacturing electronic deviceRENESAS TECH CORP·Filed 2003·Granted Aug 30, 2005·7 cites·3 claims
- 1259US9448495B2Resist pattern calculation method and calculation program storage mediumNAKAYAMA RYO·Filed 2011·Granted Sep 20, 2016·1 cites·7 claims
- 1357US5955227APattern determination methodMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Sep 21, 1999·18 cites·3 claims
- 1457US5488246ASemiconductor device and method of manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jan 30, 1996·26 cites·6 claims
- 1556US5902702APhase shift mask, blank for phase shift mask, and method of manufacturing phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1996·Granted May 11, 1999·17 cites·18 claims
- 1654US5783365AManufacturing method of semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jul 21, 1998·19 cites·6 claims
- 1753US6916749B2Method of manufacturing semiconductor deviceRENESAS TECH CORP·Filed 2003·Granted Jul 12, 2005·4 cites·8 claims
- 1852US8867023B2Method for determining exposure condition and computer-readable storage media storing program for determining exposure conditionTSUJITA KOUICHIROU·Filed 2011·Granted Oct 21, 2014·0 cites·6 claims
- 1952US8085386B2Method for determining exposure condition and computer-readable storage media storing program for determining exposure conditionTSUJITA KOUICHIROU·Filed 2007·Granted Dec 27, 2011·0 cites·6 claims
- 2049US8029954B2Exposure method and memory medium storing computer programCANON KK·Filed 2009·Granted Oct 4, 2011·0 cites·10 claims
- 2149US6461800B1Resist patterning methodMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Oct 8, 2002·2 cites·3 claims
- 2248US6849486B2Method of manufacturing a thinned gate electrode utilizing protective films and etchingRENESAS TECH CORP·Filed 2002·Granted Feb 1, 2005·2 cites·11 claims
- 2344US8339579B2Exposure methodTSUJITA KOUICHIROU·Filed 2006·Granted Dec 25, 2012·0 cites·15 claims
- 2444US6607992B2Antireflection coating and semiconductor device manufacturing methodMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Aug 19, 2003·1 cites·9 claims
- 2542US8949748B2Recording medium recording program for generating mask data, method for manufacturing mask, and exposure methodISHII HIROYUKI·Filed 2011·Granted Feb 3, 2015·0 cites·7 claims
- 2640US9036897B2Storage medium storing computer program for determining at least one of exposure condition and mask patternISHII HIROYUKI·Filed 2011·Granted May 19, 2015·0 cites·12 claims
- 2740US2012033194A1Decision method and storage mediumMIKAMI KOJI·Filed 2011·Application pending·0 cites
- 2839US9268239B2Exposure method and storage mediumGYODA YUICHI·Filed 2011·Granted Feb 23, 2016·0 cites·11 claims
- 2939US6518196B2Method of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Feb 11, 2003·0 cites·12 claims
- 3039US5547813AMethod of forming a fine resist pattern of high resolution using a contrast enhancement layerMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Aug 20, 1996·5 cites·5 claims
- 3139US2005095539A1Exposure methodSEMICONDUCTOR LEADING EDGE TEC·Filed 2004·Application pending·0 cites
- 3237US8739079B2Recording medium and determination methodTSUJITA KOUICHIROU·Filed 2009·Granted May 27, 2014·0 cites·7 claims
- 3337US5872054AAnti-reflection film and method of manufacturingMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Feb 16, 1999·6 cites·1 claims
- 3435US2003087196A1Resist pattern hardening methodMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
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