Inventor · disambiguated record
Markus Hauf
Also filed as: HAUF MARKUS · HAUF MARKUS JOSEF
62 granted patents·6 pending applications·482 citations·filing 1998–2025
98Inventor score
Files withZEISS CARL SMT GMBH40HAUF MARKUS5MATTSON TECH INC3MATTSON THERMAL PRODUCTS GMBH3STEAG RTP SYSTEMS GMBH3
Top patents by PatentIndex Score
68 records- 0196US7525640B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 28, 2009·37 cites·23 claims
- 0295US7830611B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Nov 9, 2010·34 cites·48 claims
- 0393US8325322B2Optical correction deviceHAUF MARKUS·Filed 2010·Granted Dec 4, 2012·16 cites·20 claims
- 0492US8587767B2Illumination optics for EUV microlithography and related system and apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 19, 2013·12 cites·22 claims
- 0592US8508854B2Optical element and methodEVA ERIC·Filed 2010·Granted Aug 13, 2013·12 cites·59 claims
- 0691US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 0791US8057053B2Device for controlling temperature of an optical elementHAUF MARKUS·Filed 2010·Granted Nov 15, 2011·12 cites·20 claims
- 0891US7990622B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2010·Granted Aug 2, 2011·7 cites·47 claims
- 0990US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 1090US8169595B2Optical apparatus and method for modifying the imaging behavior of such apparatusSCHRIEVER MARTIN·Filed 2009·Granted May 1, 2012·23 cites·52 claims
- 1188US9874819B2Mirror arrayZEISS CARL SMT GMBH·Filed 2016·Granted Jan 23, 2018·4 cites·23 claims
- 1287US8064151B2Lithographic apparatus and thermal optical manipulator control methodJANSEN BASTIAAN STEPHANUS HENDRICUS·Filed 2007·Granted Nov 22, 2011·10 cites·18 claims
- 1386US8632194B2Device for controlling temperature of an optical elementZEISS CARL SMT GMBH·Filed 2012·Granted Jan 21, 2014·6 cites·21 claims
- 1485US6600138B2Rapid thermal processing system for integrated circuitsMATTSON TECH INC·Filed 2001·Granted Jul 29, 2003·32 cites·36 claims
- 1584US9593733B2Damping arrangement for dissipating oscillating energy of an element in a system, more particularly in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Mar 14, 2017·6 cites·23 claims
- 1684US9442397B2Device for controlling temperature of an optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Sep 13, 2016·3 cites·20 claims
- 1784US6614005B1Device and method for thermally treating substratesSTEAG RTP SYSTEMS GMBH·Filed 2000·Granted Sep 2, 2003·36 cites·39 claims
- 1884US6369363B2Method of measuring electromagnetic radiationSTEAG AST·Filed 2001·Granted Apr 9, 2002·30 cites·5 claims
- 1983US9207541B2Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 8, 2015·6 cites·25 claims
- 2083US8891172B2Optical element and methodEVA ERIC·Filed 2009·Granted Nov 18, 2014·7 cites·7 claims
- 2182US11187989B2Method for determining properties of an EUV sourceZEISS CARL SMT GMBH·Filed 2020·Granted Nov 30, 2021·1 cites·20 claims
- 2281US8894225B2Device for controlling temperature of an optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Nov 25, 2014·3 cites·20 claims
- 2380US9081292B2Arrangement for actuating an element in a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Jul 14, 2015·3 cites·41 claims
- 2479US10514276B2Sensor deviceZEISS CARL SMT GMBH·Filed 2019·Granted Dec 24, 2019·2 cites·20 claims
- 2579US8710471B2Projection illumination system for EUV microlithographyDINGER UDO·Filed 2010·Granted Apr 29, 2014·3 cites·28 claims
- 2677US7056389B2Method and device for thermal treatment of substratesMATTSON THERMAL PRODUCTS·Filed 2002·Granted Jun 6, 2006·22 cites·21 claims
- 2773US8861102B2Lithographic apparatus and thermal optical manipulator control methodJANSEN BASTIAAN STEPHANUS HENDRICUS·Filed 2011·Granted Oct 14, 2014·2 cites·19 claims
- 2873US8328374B2Device for controlling temperature of an optical elementHAUF MARKUS·Filed 2011·Granted Dec 11, 2012·2 cites·15 claims
- 2972US8701262B2Support structure and related assemblies and methodsHAUF MARKUS·Filed 2011·Granted Apr 22, 2014·5 cites·16 claims
- 3071US9116440B2Optical module for guiding a radiation beamZEISS CARL SMT GMBH·Filed 2014·Granted Aug 25, 2015·2 cites·40 claims
- 3170US9665011B2Arrangement for actuating at least one optical element in an optical systemZEISS CARL SMT GMBH·Filed 2015·Granted May 30, 2017·1 cites·29 claims
- 3270US9041910B2Multi facet mirror of a microlithographic projection exposure apparatus with a tilting actuatorZEISS CARL SMT GMBH·Filed 2013·Granted May 26, 2015·1 cites·20 claims
- 3369US10303065B2Arrangement for actuating at least one optical element in an optical systemZEISS CARL SMT GMBH·Filed 2017·Granted May 28, 2019·1 cites·19 claims
- 3469US9195151B2Device for controlling temperature of an optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Nov 24, 2015·1 cites·24 claims
- 3568US10684551B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2019·Granted Jun 16, 2020·0 cites·9 claims
- 3668US10108097B2Arrangement for manipulating the position of an elementZEISS CARL SMT GMBH·Filed 2017·Granted Oct 23, 2018·1 cites·21 claims
- 3768US10101507B2Mirror deviceZEISS CARL SMT GMBH·Filed 2017·Granted Oct 16, 2018·1 cites·20 claims
- 3868US6191392B1Method of measuring electromagnetic radiationSTEAG AST ELEKTRONIK GMBH·Filed 1998·Granted Feb 20, 2001·35 cites·36 claims
- 3968US2025206598A1Apparatus for stress-reduced mounting of mems-based micromirrorsZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 4067US7768721B2Optical assembly, projection exposure apparatus and projection objectiveZEISS CARL SMT AG·Filed 2008·Granted Aug 3, 2010·3 cites·26 claims
- 4167US7169717B2Method of producing a calibration waferMATTSON THERMAL PRODUCTS GMBH·Filed 2003·Granted Jan 30, 2007·13 cites·20 claims
- 4267US6847012B1Apparatus and method for measuring the temperature of substratesSTEAG RTP SYSTEMS GMBH·Filed 2000·Granted Jan 25, 2005·10 cites·11 claims
- 4367US2025028250A1Arrangement, method and computer program product for calibrating facet mirrorsZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 4465US9651772B2Arrangement for the actuation of at least one element in an optical systemZEISS CARL SMT GMBH·Filed 2015·Granted May 16, 2017·1 cites·28 claims
- 4565US7316969B2Method and apparatus for thermally treating substratesMATTSON TECH INC·Filed 2006·Granted Jan 8, 2008·2 cites·15 claims
- 4665US2025199422A1Individual mirror of a pupil facet mirror and pupil facet mirror for an illumination optical unit of a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 4764US9887613B2Lithography device with eddy-current brakeZEISS CARL SMT GMBH·Filed 2014·Granted Feb 6, 2018·1 cites·27 claims
- 4863US10317802B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2018·Granted Jun 11, 2019·0 cites·21 claims
- 4963US6561694B1Method and device for calibrating measurements of temperatures independent of emissivitySTEAG RTP SYSTEMS GMBH·Filed 1999·Granted May 13, 2003·30 cites·29 claims
- 5063US2025044711A1Temperature-insensitive actuator and deformation mirrorZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
Showing the top 50 of 68 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →