Inventor · disambiguated record

Kuan-Wen Lin

Also filed as: LIN KUAN-WEN

20 granted patents·4 pending applications·20 citations·filing 2009–2025

91Inventor score

Technology areasH10P G03F A47B B08B G03B

Files withTAIWAN SEMICONDUCTOR MFG CO LTD20 DBS BANK TAIWAN LTD1 LIN HSIUNG-WEI1 LU CHI-LUN1 TAIWAN SEMICONDUCTOR MFG1

Top patents by PatentIndex Score

24 records

0195US11294292B2Particle removing assembly and method of cleaning mask for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·3 cites·20 claims
0292US12032302B2Method and device for cleaning substratesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 9, 2024·2 cites·20 claims
0391US9658526B2Mask pellicle indicator for haze preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 23, 2017·9 cites·20 claims
0489US11698592B2Particle removing assembly and method of cleaning mask for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 11, 2023·1 cites·20 claims
0586US2024377364A1Acoustic Measurement of Fabrication Equipment ClearanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
0683US12320782B2Acoustic measurement of fabrication equipment clearanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 3, 2025·0 cites·15 claims
0782US2025328088A1Method and device for cleaning substratesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
0881US12393129B2Method and device for cleaning substratesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Aug 19, 2025·0 cites·20 claims
0981US12085866B2Particle removing assembly and method of cleaning mask for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·0 cites·20 claims
1073US11709153B2Acoustic measurement of fabrication equipment clearanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
1172US10520805B2System and method for localized EUV pellicle glue removalTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 31, 2019·1 cites·20 claims
1272US9418847B2Lithography system and method for haze eliminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 16, 2016·2 cites·20 claims
1371US9885952B2Systems and methods of EUV mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 6, 2018·1 cites·20 claims
1470US9665000B1Method and system for EUV mask cleaning with non-thermal solutionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 30, 2017·1 cites·20 claims
1566US10156784B2Systems and methods of EUV mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 18, 2018·0 cites·20 claims
1663US11079669B2System and method for localized EUV pellicle glue removalTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 3, 2021·0 cites·20 claims
1762US10845342B2Acoustic measurement of film thicknessTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 24, 2020·0 cites·20 claims
1856US10794872B2Acoustic measurement of fabrication equipment clearanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 6, 2020·0 cites·20 claims
1955US8932958B2Device manufacturing and cleaning methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 13, 2015·0 cites·20 claims
2055US2010320811A1Storable structure of table and chairLIN HSIUNG-WEI·Filed 2009·Application pending·0 cites
2152US11430671B2Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 30, 2022·0 cites·20 claims
2250US2024031360A1Method and system for log-in and authorizationDBS BANK TAIWAN LTD·Filed 2023·Application pending·0 cites
2346US9740094B2Damage prevention on EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 22, 2017·0 cites·20 claims
2446US8598042B1Device manufacturing and cleaning methodLU CHI-LUN·Filed 2012·Granted Dec 3, 2013·0 cites·20 claims

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →