Inventor · disambiguated record
Kyoichi Suwa
Also filed as: SUWA KYOICHI
39 granted patents·3 pending applications·5,122 citations·filing 1980–2020
99Inventor score
Top patents by PatentIndex Score
42 records- 0199US6191429B1Projection exposure apparatus and method with workpiece area detectionNIKON PREC INC·Filed 1999·Granted Feb 20, 2001·962 cites·14 claims
- 0299US5825043AFocusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatusNIKON PRECISION INC·Filed 1996·Granted Oct 20, 1998·1.7k cites·23 claims
- 0398US4908656AMethod of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precisionNIKON CORP·Filed 1989·Granted Mar 13, 1990·152 cites·14 claims
- 0498US4650983AFocusing apparatus for projection optical systemNIPPON KOGAKU KK·Filed 1984·Granted Mar 17, 1987·198 cites·18 claims
- 0598US4465368AExposure apparatus for production of integrated circuitNIPPON KOGAKU KK·Filed 1981·Granted Aug 14, 1984·474 cites·10 claims
- 0697US5402224ADistortion inspecting method for projection optical systemNIKON CORP·Filed 1993·Granted Mar 28, 1995·150 cites·3 claims
- 0796US4931830AProjection exposure apparatusNIKON CORP·Filed 1989·Granted Jun 5, 1990·108 cites·19 claims
- 0896US4666273AAutomatic magnification correcting system in a projection optical apparatusNIPPON KOGAKU KK·Filed 1986·Granted May 19, 1987·132 cites·24 claims
- 0995US6750952B2Apparatus for preforming measurement of a dimension of a test mark for semiconductor processingNIKON PREC INC·Filed 2002·Granted Jun 15, 2004·63 cites·32 claims
- 1095US4677301AAlignment apparatusNIPPON KOGAKU KK·Filed 1984·Granted Jun 30, 1987·90 cites·18 claims
- 1194US5615006AImaging characteristic and asymetric abrerration measurement of projection optical systemNIKON CORP·Filed 1995·Granted Mar 25, 1997·89 cites·11 claims
- 1293US4734746AExposure method and system for photolithographyNIPPON KOGAKU KK·Filed 1987·Granted Mar 29, 1988·72 cites·19 claims
- 1392US4531060APositioning methodNIPPON KOGAKU KK·Filed 1982·Granted Jul 23, 1985·112 cites·16 claims
- 1488US4699515AProcess of transfer of mask pattern onto substrate and apparatus for alignment therebetweenNIPPON KOGAKU KK·Filed 1985·Granted Oct 13, 1987·50 cites·17 claims
- 1587US5777729AWafer inspection method and apparatus using diffracted lightNIKON CORP·Filed 1996·Granted Jul 7, 1998·86 cites·40 claims
- 1687US4965630AProjection exposure apparatusNIKON CORP·Filed 1989·Granted Oct 23, 1990·50 cites·8 claims
- 1785US4741622AMethod and apparatus for detecting diversionNIPPON KOGAKU KK·Filed 1986·Granted May 3, 1988·40 cites·20 claims
- 1883US5434026AExposure condition measurement methodNIKON CORP·Filed 1992·Granted Jul 18, 1995·47 cites·12 claims
- 1983US4748478AProjection exposure apparatusNIPPON KOGAKU KK·Filed 1986·Granted May 31, 1988·61 cites·12 claims
- 2083US4592625ADouble-conjugate maintaining optical systemNIPPON KOGAKU KK·Filed 1983·Granted Jun 3, 1986·35 cites·22 claims
- 2182US6449031B1Method for use of a critical dimensional test structureNIKON CORP·Filed 2000·Granted Sep 10, 2002·17 cites·13 claims
- 2282US4657379APhotomask and exposure apparatus using the sameNIPPON KOGAKU KK·Filed 1985·Granted Apr 14, 1987·34 cites·6 claims
- 2381US5835227AMethod and apparatus for determining performance characteristics in lithographic toolsNIKON PRECISION INC·Filed 1997·Granted Nov 10, 1998·48 cites·54 claims
- 2481US4704020AProjection optical apparatusNIPPON KOGAKU KK·Filed 1986·Granted Nov 3, 1987·32 cites·5 claims
- 2580US4423959APositioning apparatusNIPPON KOGAKU KK·Filed 1983·Granted Jan 3, 1984·40 cites·14 claims
- 2679US4390279AAlignment device in an IC projection exposure apparatusNIPPON KOGAKU KK·Filed 1980·Granted Jun 28, 1983·30 cites·6 claims
- 2777US4679942AMethod of aligning a semiconductor substrate and a photomaskNIPPON KOGAKU KK·Filed 1985·Granted Jul 14, 1987·27 cites·11 claims
- 2876US6094256AMethod for forming a critical dimension test structure and its useNIKON PRECISION INC·Filed 1998·Granted Jul 25, 2000·29 cites·17 claims
- 2973US5838450ADirect reticle to wafer alignment using fluorescence for integrated circuit lithographyNIKON PRECISION INC·Filed 1995·Granted Nov 17, 1998·34 cites·30 claims
- 3071US4566795AAlignment apparatusNIPPON KOGAKU KK·Filed 1984·Granted Jan 28, 1986·21 cites·4 claims
- 3169US6855997B2Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devicesNIKON CORP·Filed 2000·Granted Feb 15, 2005·10 cites·16 claims
- 3266US5741614AAtomic force microscope measurement process for dense photoresist patternsNIKON CORP·Filed 1995·Granted Apr 21, 1998·26 cites·22 claims
- 3365US5666205AMeasuring method and exposure apparatusNIKON CORP·Filed 1995·Granted Sep 9, 1997·25 cites·15 claims
- 3464US5870197APrecision stage interferometer system with local single air ductNIKON CORP·Filed 1996·Granted Feb 9, 1999·23 cites·33 claims
- 3558US5698069ATechnique for detecting particles on a wafer support surfaceNIKON PRECISION INC·Filed 1996·Granted Dec 16, 1997·20 cites·28 claims
- 3655US4770533AApparatus for detecting position of an object such as a semiconductor waferNIPPON KOGAKU KK·Filed 1987·Granted Sep 13, 1988·11 cites·14 claims
- 3748US6610460B2Exposure methodNIKON CORP·Filed 2002·Granted Aug 26, 2003·2 cites·15 claims
- 3848US4806987AProjection-exposing apparatusNIKON CORP·Filed 1987·Granted Feb 21, 1989·8 cites·2 claims
- 3947US12019225B2Optical system, optical apparatus, imaging apparatus, and method for manufacturing optical system and imaging apparatusNIKON CORP·Filed 2020·Granted Jun 25, 2024·0 cites·34 claims
- 4044US2005106480A1Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devicesNIKON CORP·Filed 2004·Application pending·0 cites
- 4142US2004174512A1Illumination optical apparatus, exposure apparatus and method of exposureNIKON CORP·Filed 2004·Application pending·0 cites
- 4240US2003038931A1Illumination optical apparatus, exposure apparatus and method of exposureNIKON CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →