Inventor · disambiguated record
Daniel Jozef Maria Direcks
Also filed as: DIRECKS DANIEL JOZEF MARIA · DIRECKS DANIËL JOZEF MARIA
19 granted patents·2 pending applications·97 citations·filing 2007–2022
92Inventor score
Files withASML NETHERLANDS BV11DIRECKS DANIEL JOZEF MARIA4PHILIPS DANNY MARIA HUBERTUS2BERKVENS PAUL PETRUS JOANNES1PATEL HRISHIKESH1
Top patents by PatentIndex Score
21 records- 0193US8351018B2Fluid handling structure, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Granted Jan 8, 2013·22 cites·19 claims
- 0291US8345218B2Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Granted Jan 1, 2013·14 cites·20 claims
- 0390US8634053B2Lithographic apparatus and device manufacturing methodRIEPEN MICHEL·Filed 2007·Granted Jan 21, 2014·12 cites·27 claims
- 0487US8421993B2Fluid handling structure, lithographic apparatus and device manufacturing methodDIRECKS DANIEL JOZEF MARIA·Filed 2009·Granted Apr 16, 2013·14 cites·20 claims
- 0587US7561250B2Lithographic apparatus having parts with a coated film adhered theretoASML NETHERLANDS BV·Filed 2007·Granted Jul 14, 2009·9 cites·36 claims
- 0686US8259283B2Immersion lithographic apparatus and device manufacturing methodDIRECKS DANIEL JOZEF MARIA·Filed 2009·Granted Sep 4, 2012·10 cites·24 claims
- 0781US8218126B2Lithographic apparatus and device manufacturing methodSTEFFENS KOEN·Filed 2008·Granted Jul 10, 2012·7 cites·32 claims
- 0877US11556067B2Contamination trapASML NETHERLANDS BV·Filed 2020·Granted Jan 17, 2023·1 cites·14 claims
- 0976US8472003B2Fluid handling structure, lithographic apparatus and device manufacturing methodPATEL HRISHIKESH·Filed 2010·Granted Jun 25, 2013·5 cites·24 claims
- 1064US11982947B2Contamination trapASML NETHERLANDS BV·Filed 2022·Granted May 14, 2024·0 cites·19 claims
- 1162US8638417B2Fluid handling structure, lithographic apparatus and a device manufacturing methodPHILIPS DANNY MARIA HUBERTUS·Filed 2011·Granted Jan 28, 2014·1 cites·25 claims
- 1261US8405815B2Fluid handling structure, lithographic apparatus and device manufacturing methodPHILIPS DANNY MARIA HUBERTUS·Filed 2010·Granted Mar 26, 2013·1 cites·20 claims
- 1360US10268127B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Apr 23, 2019·0 cites·20 claims
- 1460US2025021026A1Apparatus for supplying liquid target material to a radiation sourceASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1559US9645506B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted May 9, 2017·0 cites·20 claims
- 1657US12411424B2Temperature conditioning system, a lithographic apparatus and a method of temperature conditioning an objectASML NETHERLANDS BV·Filed 2022·Granted Sep 9, 2025·0 cites·20 claims
- 1755US9383654B2Fluid handling structure, lithographic apparatus and device manufacturing methodDIRECKS DANIEL JOZEF MARIA·Filed 2009·Granted Jul 5, 2016·0 cites·23 claims
- 1855US8681308B2Lithographic apparatus and device manufacturing methodBERKVENS PAUL PETRUS JOANNES·Filed 2007·Granted Mar 25, 2014·1 cites·22 claims
- 1954US11143968B2Fluid handling structure, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Oct 12, 2021·0 cites·20 claims
- 2039US9618835B2Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressureDIRECKS DANIEL JOZEF MARIA·Filed 2011·Granted Apr 11, 2017·0 cites·20 claims
- 2136US2011007286A1Lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Daniel Jozef Maria Direcks files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →