Inventor · disambiguated record
Tsung-Chieh Tsai
Also filed as: TSAI TSUNG-CHIEH
36 granted patents·8 pending applications·81 citations·filing 2001–2025
96Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD29TAIWAN SEMICONDUCTOR MFG11CHEN CHIN-AN1CHUANG HARRY HAK-LAY1TSAI TSUNG-CHIEH1
Top patents by PatentIndex Score
44 records- 0191US9984191B2Cell layout and structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 29, 2018·13 cites·20 claims
- 0287US10325849B2Different scaling ratio in FEOL/ MOL/ BEOLTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 18, 2019·4 cites·20 claims
- 0387US9292649B2Different scaling ratio in FEOL / MOL/ BEOLTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Mar 22, 2016·6 cites·20 claims
- 0487US9136168B2Conductive line patterningTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 15, 2015·5 cites·20 claims
- 0586US2024371765A1Different scaling ratio in feol / mol/ beolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0685US9047437B2Method, system and software for accessing design rules and library of design features while designing semiconductor device layoutTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 2, 2015·8 cites·19 claims
- 0784US11152303B2Different scaling ratio in FEOL / MOL/ BEOLTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 19, 2021·2 cites·20 claims
- 0881US9508791B2Semiconductor device having a metal gateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 29, 2016·3 cites·20 claims
- 0980US2025364447A1Semiconductor device and methods of manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1076US12322701B2Different scaling ratio in FEOL / MOL/ BEOLTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 3, 2025·0 cites·20 claims
- 1176US2024213099A1Gate-all-around device with different channel semiconductor materials and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1274US11929288B2Gate-all-around device with different channel semiconductor materials and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 12, 2024·0 cites·20 claims
- 1374US8703594B2Semiconductor device having a treated gate structure and fabrication method thereofYEH MING-HSI·Filed 2011·Granted Apr 22, 2014·3 cites·20 claims
- 1473US9236379B2Semiconductor device and fabrication method thereofTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jan 12, 2016·3 cites·20 claims
- 1573US2024379664A1Checkerboard dummy design for epitaxial open ratioTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1673US2025056877A1Semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1771US11508624B2Gate-all-around device with different channel semiconductor materials and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 22, 2022·0 cites·20 claims
- 1870US8685808B2Semiconductor device fabrication methodTSAI TSUNG-CHIEH·Filed 2011·Granted Apr 1, 2014·4 cites·20 claims
- 1969US6878578B1Method for forming a high quality chemical oxide on a freshly cleaned silicon surface as a native oxide replacementTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Apr 12, 2005·15 cites·22 claims
- 2068US11281835B2Cell layout and structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 22, 2022·0 cites·20 claims
- 2167US12349454B2Checkerboard dummy design for epitaxial open ratioTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 1, 2025·0 cites·20 claims
- 2267US9746783B2Method for preventing photoresist corner rounding effectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Aug 29, 2017·1 cites·20 claims
- 2366US9991158B2Semiconductor device, layout of semiconductor device, and method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 5, 2018·1 cites·19 claims
- 2465US12159870B2Semiconductor structure and forming method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 3, 2024·0 cites·20 claims
- 2565US10998304B2Conductive line patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 4, 2021·0 cites·20 claims
- 2665US2023420392A1Semiconductor device and methods of manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 2760US10664639B2Cell layout and structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 26, 2020·0 cites·20 claims
- 2860US9230962B2Semiconductor device and fabrication method thereforTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jan 5, 2016·1 cites·20 claims
- 2959US10269785B2Conductive line patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 23, 2019·0 cites·20 claims
- 3056US9472501B2Conductive line patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 18, 2016·0 cites·20 claims
- 3156US6468354B2Semiconductor wafer supportTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Oct 22, 2002·5 cites·9 claims
- 3256US6425191B1Apparatus and method for reducing solvent residue in a solvent-type dryer for semiconductor wafersTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Jul 30, 2002·6 cites·18 claims
- 3355US8769475B2Method, system and software for accessing design rules and library of design features while designing semiconductor device layoutCHEN CHIN-AN·Filed 2011·Granted Jul 1, 2014·1 cites·18 claims
- 3454US9437434B2Semiconductor device and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 6, 2016·0 cites·20 claims
- 3554US9391056B2Mask optimization for multi-layer contactsTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 12, 2016·0 cites·20 claims
- 3654US9087773B2Implant region definitionTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 21, 2015·0 cites·20 claims
- 3750US11626398B2Semiconductor structure and method for manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 11, 2023·0 cites·20 claims
- 3850US10283495B2Mask optimization for multi-layer contactsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 7, 2019·0 cites·20 claims
- 3950US9637818B2Implant region definitionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 2, 2017·0 cites·13 claims
- 4047US2015318367A1Controlling Gate Formation for High Density Cell LayoutTAIWAN SEMICONDUCTOR MFG·Filed 2015·Application pending·0 cites
- 4142US9070623B2Controlling gate formation for high density cell layoutCHUANG HARRY-HAK-LAY·Filed 2010·Granted Jun 30, 2015·0 cites·18 claims
- 4237US10366900B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jul 30, 2019·0 cites·20 claims
- 4333US2003035713A1Moisture-controlled wafer storage container and method of usingTAIWAN SEMICONDUCTOR MFG·Filed 2001·Application pending·0 cites
- 4430US6647998B2Electrostatic charge-free solvent-type dryer for semiconductor wafersTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Nov 18, 2003·0 cites·20 claims
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