Inventor · disambiguated record
Ming-Hui Weng
Also filed as: WENG MING-HUI
35 granted patents·19 pending applications·58 citations·filing 1995–2025
95Inventor score
Top patents by PatentIndex Score
54 records- 0198US11705332B2Photoresist layer surface treatment, cap layer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 18, 2023·9 cites·20 claims
- 0297US11456266B2Bump structure and method of manufacturing bump structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Sep 27, 2022·3 cites·20 claims
- 0395US12057315B2Photoresist layer surface treatment, cap layer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 6, 2024·2 cites·20 claims
- 0495US11822237B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 21, 2023·3 cites·20 claims
- 0593US12159787B2Method of manufacturing a semiconductor device and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 3, 2024·2 cites·20 claims
- 0693US12135501B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 5, 2024·1 cites·20 claims
- 0793US12002675B2Photoresist layer outgassing preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 4, 2024·2 cites·20 claims
- 0892US10866517B2Lithography techniques for reducing resist swellingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·3 cites·20 claims
- 0992US2025364456A1Bump structure and method of manufacturing bump structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1091US10520822B2Lithography techniques for reducing resist swellingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 31, 2019·3 cites·20 claims
- 1189US11079681B2Lithography method for positive tone developmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 3, 2021·2 cites·20 claims
- 1288US10032640B1Formation of semiconductor structure with a photoresist cross link and de-cross link processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 24, 2018·5 cites·20 claims
- 1386US12476210B2Bump structure and method of manufacturing bump structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Nov 18, 2025·0 cites·20 claims
- 1486US12374548B2Photoresist layer outgassing preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 29, 2025·0 cites·20 claims
- 1586US11022886B2Bottom-up material formation for planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 1, 2021·4 cites·20 claims
- 1684US11694896B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 4, 2023·1 cites·20 claims
- 1784US2025323038A1Photoresist layer outgassing preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1883US10083832B1Under layer composition and method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Sep 25, 2018·3 cites·20 claims
- 1981US12463034B2Photoresist layer surface treatment, cap layer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Nov 4, 2025·0 cites·20 claims
- 2078US11923326B2Bump structure and method of manufacturing bump structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 5, 2024·0 cites·20 claims
- 2178US2025147424A1Lithography method for positive tone developmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2277US12222654B2Lithography method for positive tone developmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 11, 2025·0 cites·20 claims
- 2377US2025147417A1Method of manufacturing a semiconductor device and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2476US2024371638A1Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2575US2024310735A1Lithography techniques for reducing defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2675US2024385514A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2774US12222643B2Method of manufacturing a semiconductor device and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 11, 2025·0 cites·20 claims
- 2874US10691023B2Method for performing lithography process with post treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 23, 2020·1 cites·20 claims
- 2973US12272554B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 8, 2025·0 cites·20 claims
- 3072US12074025B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 27, 2024·0 cites·20 claims
- 3172US10866515B2Lithography process using photoresist material with photosensitive functional groupTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 15, 2020·1 cites·20 claims
- 3272US2023384675A1Underlayer composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3371US2023384669A1Photoresist materials and associated methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3470US2025246430A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3569US12025920B2Lithography techniques for reducing defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 3669US11143963B2Negative tone developer for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 12, 2021·0 cites·20 claims
- 3768US10879108B2Topographic planarization method for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 29, 2020·1 cites·20 claims
- 3866US11281107B2Method for performing lithography process with post treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 22, 2022·0 cites·18 claims
- 3966US2025123562A1Photoresist material and method for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4066US2025116931A1Photoresist compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4165US12222653B2Method for forming semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 11, 2025·0 cites·20 claims
- 4264US2022291586A1Underlayer composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Application pending·0 cites
- 4362US2022365428A1Photoresist materials and associated methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Application pending·0 cites
- 4462US2025306469A1Method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4562US2024385523A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4660US10520820B2Negative tone developer for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 31, 2019·0 cites·20 claims
- 4759US11009796B2Method for forming semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 18, 2021·0 cites·20 claims
- 4858US2025116937A1Lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4958US2024337947A1Method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 5055US10520833B1Extreme ultraviolet lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 31, 2019·0 cites·20 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →