Inventor · disambiguated record
Mark Buehler
Also filed as: BUEHLER MARK · BUEHLER MARK F · BUEHLER MARK S
5 granted patents·9 pending applications·53 citations·filing 1998–2006
79Inventor score
Top patents by PatentIndex Score
14 records- 0161US6746498B1Abrasive with a modified surface and a method for making itINTEL CORP·Filed 2002·Granted Jun 8, 2004·9 cites·2 claims
- 0257US6592433B2Method for defect reductionINTEL CORP·Filed 1999·Granted Jul 15, 2003·18 cites·17 claims
- 0353US6358853B2Ceria based slurry for chemical-mechanical polishingINTEL CORP·Filed 1998·Granted Mar 19, 2002·19 cites·5 claims
- 0450US6716771B2Method for post-CMP conversion of a hydrophobic surface of a low-k dielectric layer to a hydrophilic surfaceINTEL CORP·Filed 2002·Granted Apr 6, 2004·7 cites·1 claims
- 0547US2007228011A1Novel chemical composition to reduce defectsBUEHLER MARK F·Filed 2006·Application pending·0 cites
- 0644US2005206005A1Composition and a method for defect reductionBUEHLER MARK F·Filed 2005·Application pending·0 cites
- 0739US6918819B2Method for defect reductionINTEL CORP·Filed 2003·Granted Jul 19, 2005·0 cites·4 claims
- 0839US2003084200A1System and method for generating programmable traps for a communications networkVTEL CORP·Filed 2001·Application pending·0 cites
- 0939US2008153731A1Clean chemistry composition, method of manufacturing same, and system making use of sameBUEHLER MARK·Filed 2006·Application pending·0 cites
- 1039US2003028895A1System and method for managing disparate video network devices through objectsVTEL CORP·Filed 2001·Application pending·0 cites
- 1136US2007152252A1Reducing aluminum dissolution in high pH solutionsBUEHLER MARK F·Filed 2005·Application pending·0 cites
- 1233US2006046523A1Facilitating removal of sacrificial layers to form replacement metal gatesKAVALIEROS JACK·Filed 2004·Application pending·0 cites
- 1333US2005092350A1Scrubbing brush with ligand attachmentsFiled 2003·Application pending·0 cites
- 1427US2002025449A1An electroactive film on a substrate and method of makingFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →