Inventor · disambiguated record
Makoto Ohkura
Also filed as: OHKURA MAKOTO
43 granted patents·2 pending applications·976 citations·filing 1980–2012
98Inventor score
Top patents by PatentIndex Score
45 records- 0196US6943086B2Laser annealing apparatus, TFT device and annealing method of the sameHITACHI LTD·Filed 2002·Granted Sep 13, 2005·82 cites·32 claims
- 0296US4670768AComplementary MOS integrated circuits having vertical channel FETsHITACHI LTD·Filed 1984·Granted Jun 2, 1987·107 cites·5 claims
- 0389US7326623B2Method of manufacturing display deviceHITACHI LTD·Filed 2005·Granted Feb 5, 2008·11 cites·17 claims
- 0489US4565584AMethod of producing single crystal film utilizing a two-step heat treatmentHITACHI LTD·Filed 1983·Granted Jan 21, 1986·76 cites·8 claims
- 0588US7834353B2Method of manufacturing display deviceHITACHI DISPLAYS LTD·Filed 2008·Granted Nov 16, 2010·9 cites·4 claims
- 0688US7253864B2Active matrix display device with active element including a semiconductor film formed of an aggregate of single crystals each extending in the same directionHITACHI LTD·Filed 2005·Granted Aug 7, 2007·11 cites·11 claims
- 0788US4609407AMethod of making three dimensional semiconductor devices in selectively laser regrown polysilicon or amorphous silicon layersHITACHI LTD·Filed 1983·Granted Sep 2, 1986·83 cites·38 claims
- 0888US4599133AMethod of producing single-crystal silicon filmHITACHI LTD·Filed 1983·Granted Jul 8, 1986·67 cites·17 claims
- 0987US4937641ASemiconductor memory and method of producing the sameHITACHI LTD·Filed 1987·Granted Jun 26, 1990·67 cites·11 claims
- 1086US6452213B1Semiconductor device having first, second and third non-crystalline films sequentially formed on insulating base with second film having thermal conductivity not lower than that of first film and not higher than that of third film, and method of manufacturing the sameHITACHI LTD·Filed 2000·Granted Sep 17, 2002·40 cites·6 claims
- 1185US7022183B2Semiconductor thin film and process for production thereofHIATCHI LTD·Filed 2003·Granted Apr 4, 2006·19 cites·20 claims
- 1285US6806099B2Process for producing polycrystalline silicon film by crystallizing on amorphous silicon film by light irradiationHITACHI LTD·Filed 2002·Granted Oct 19, 2004·29 cites·3 claims
- 1384US7129124B2Display device, process of fabricating same, and apparatus for fabricating sameHITACHI DISPLAYS LTD·Filed 2003·Granted Oct 31, 2006·26 cites·6 claims
- 1479US6570184B2Thin film transistor and method for manufacturing the sameHITACHI LTD·Filed 2002·Granted May 27, 2003·20 cites·28 claims
- 1578US7183148B2Display panel and method for manufacturing the sameHITACHI DISPLAYS LTD·Filed 2004·Granted Feb 27, 2007·18 cites·13 claims
- 1678US7023500B2Display device with active-matrix transistor having silicon film modified by selective laser irradiationHITACHI LTD·Filed 2003·Granted Apr 4, 2006·17 cites·4 claims
- 1776US6936847B2Display device with an improved contact hole arrangement for contacting a semiconductor layer through an insulation filmHITACHI LTD·Filed 2003·Granted Aug 30, 2005·18 cites·15 claims
- 1876US6670638B2Liquid crystal display element and method of manufacturing the sameHITACHI LTD·Filed 2001·Granted Dec 30, 2003·19 cites·3 claims
- 1974US7227186B2Thin film transistor and method of manufacturing the sameHITACHI LTD·Filed 2005·Granted Jun 5, 2007·3 cites·9 claims
- 2074US6624443B2Display device with an improved contact hole arrangement for contacting a semiconductor layer through an insulation filmHITACHI LTD·Filed 2002·Granted Sep 23, 2003·16 cites·6 claims
- 2174US6291847B1Semiconductor integrated circuit device and process for manufacturing the sameHITACHI LTD·Filed 1998·Granted Sep 18, 2001·30 cites·14 claims
- 2274US4498951AMethod of manufacturing single-crystal filmHITACHI LTD·Filed 1982·Granted Feb 12, 1985·39 cites·18 claims
- 2371US6657227B2Transistor with thin film active region having clusters of different crystal orientationHITACHI LTD·Filed 2001·Granted Dec 2, 2003·10 cites·7 claims
- 2470US6861299B2Process for manufacturing thin film transistor on unannealed glass substrateHITACHI LTD·Filed 2003·Granted Mar 1, 2005·12 cites·26 claims
- 2570US4394191AStacked polycrystalline silicon film of high and low conductivity layersHITACHI LTD·Filed 1980·Granted Jul 19, 1983·33 cites·10 claims
- 2669US6226079B1Defect assessing apparatus and method, and semiconductor manufacturing methodHITACHI LTD·Filed 1998·Granted May 1, 2001·35 cites·9 claims
- 2768US7655950B2Method of manufacturing an active matrix substrate and an image display device using the sameHITACHI DISPLAYS LTD·Filed 2006·Granted Feb 2, 2010·2 cites·4 claims
- 2860US7132343B2Method and apparatus for manufacturing display panelHITACHI DISPLAYS LTD·Filed 2004·Granted Nov 7, 2006·7 cites·5 claims
- 2957US7528408B2Semiconductor thin film and process for production thereofHITACHI LTD·Filed 2006·Granted May 5, 2009·4 cites·2 claims
- 3056US7022558B2Method of manufacturing an active matrix substrate and an image display device using the sameHITACHI DISPLAYS LTD·Filed 2003·Granted Apr 4, 2006·4 cites·12 claims
- 3156US7009205B2Image display device using transistors each having a polycrystalline semiconductor layerHITACHI DEVICE ENG·Filed 2003·Granted Mar 7, 2006·7 cites·6 claims
- 3254US6479867B2Thin film transistorHITACHI LTD·Filed 2001·Granted Nov 12, 2002·6 cites·25 claims
- 3351US2007131962A1Display panel and method for manufacturing the sameYAZAKI AKIO·Filed 2007·Application pending·0 cites
- 3451US2007041410A1Apparatus for fabricating a display deviceHONGO MIKIO·Filed 2006·Application pending·0 cites
- 3550US4984038ASemiconductor memory and method of producing the sameHITACHI LTD·Filed 1988·Granted Jan 8, 1991·14 cites·6 claims
- 3648US7413604B2Process for producing polysilicon filmHITACHI LTD·Filed 2004·Granted Aug 19, 2008·1 cites·4 claims
- 3747US7388228B2Display device and method of manufacturing the sameHITACHI LTD·Filed 2005·Granted Jun 17, 2008·0 cites·13 claims
- 3847US4351674AMethod of producing a semiconductor deviceHITACHI LTD·Filed 1980·Granted Sep 28, 1982·13 cites·11 claims
- 3946US6573546B2Semiconductor integrated circuit device and process for manufacturing the sameHITACHI LTD·Filed 2001·Granted Jun 3, 2003·2 cites·3 claims
- 4045US7180095B2Display device and manufacturing method thereofHITACHI DISPLAYS LTD·Filed 2004·Granted Feb 20, 2007·2 cites·19 claims
- 4144US6903371B2Thin film transistor and display using the sameHITACHI LTD·Filed 2004·Granted Jun 7, 2005·0 cites·6 claims
- 4244US4570175AThree-dimensional semiconductor device with thin film monocrystalline member contacting substrate at a plurality of locationsHITACHI LTD·Filed 1983·Granted Feb 11, 1986·11 cites·3 claims
- 4343US8958138B2Display device and method of manufacturing the display deviceNITTA HIDEKAZU·Filed 2012·Granted Feb 17, 2015·0 cites·11 claims
- 4442US6716688B2Irradiation of manufacturing a thin film transistor by laser irradiationHITACHI LTD·Filed 2002·Granted Apr 6, 2004·0 cites·12 claims
- 4537US4695856ASemiconductor deviceHITACHI LTD·Filed 1984·Granted Sep 22, 1987·6 cites·3 claims
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