Inventor · disambiguated record
Johannes Hubertus Josephina Moors
Also filed as: MOORS JOHANNES H · MOORS JOHANNES H J · MOORS JOHANNES HUBERTUS J · MOORS JOHANNES HUBERTUS JOHANNES
92 granted patents·12 pending applications·728 citations·filing 1983–2023
99Inventor score
Files withASML NETHERLANDS BV71BANINE VADIM YEVGENYEVICH5ZEISS CARL SMT GMBH4ASML HOLDING NV2EHM DIRK HEINRICH2
Top patents by PatentIndex Score
104 records- 0198US7462850B2Radical cleaning arrangement for a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Dec 9, 2008·60 cites·13 claims
- 0297US7405417B2Lithographic apparatus having a monitoring device for detecting contaminationASML NETHERLANDS BV·Filed 2005·Granted Jul 29, 2008·62 cites·36 claims
- 0394US7414700B2Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Aug 19, 2008·16 cites·64 claims
- 0492US7868304B2Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted Jan 11, 2011·17 cites·30 claims
- 0592US7473908B2Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surfaceASML NETHERLANDS BV·Filed 2006·Granted Jan 6, 2009·22 cites·32 claims
- 0692US7372623B2Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted May 13, 2008·19 cites·23 claims
- 0791US11340532B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2019·Granted May 24, 2022·5 cites·29 claims
- 0891US7598503B2Lithographic apparatus and cleaning method thereforASML NETHERLANDS BV·Filed 2006·Granted Oct 6, 2009·11 cites·20 claims
- 0991US6781673B2Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Aug 24, 2004·56 cites·30 claims
- 1090US8382301B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2009·Granted Feb 26, 2013·18 cites·34 claims
- 1190US7639418B2Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2008·Granted Dec 29, 2009·13 cites·23 claims
- 1289US9897930B2Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical elementSJMAENOK LEONID AIZIKOVITCH·Filed 2009·Granted Feb 20, 2018·14 cites·18 claims
- 1388US7812330B2Radical cleaning arrangement for a lithographic apparatusASML NETHERLANDS BV·Filed 2008·Granted Oct 12, 2010·8 cites·10 claims
- 1487US8585224B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2013·Granted Nov 19, 2013·11 cites·34 claims
- 1587US8476167B2Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatusVAN MIERLO HUBERT ADRIAAN·Filed 2011·Granted Jul 2, 2013·14 cites·13 claims
- 1686US7262423B2Radiation system and lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Aug 28, 2007·8 cites·20 claims
- 1785US8610089B2Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning methodDONDERS SJOERD NICOLAAS LAMBERTUS·Filed 2012·Granted Dec 17, 2013·13 cites·19 claims
- 1884US11846887B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2022·Granted Dec 19, 2023·1 cites·25 claims
- 1984US7355672B2Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Apr 8, 2008·16 cites·33 claims
- 2083US7251012B2Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debrisASML NETHERLANDS BV·Filed 2003·Granted Jul 31, 2007·25 cites·53 claims
- 2183US6741329B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2002·Granted May 25, 2004·30 cites·19 claims
- 2282US8217347B2System and method for detecting at least one contamination species in a lithographic apparatusBANINE VADIM YEVGENYEVICH·Filed 2011·Granted Jul 10, 2012·3 cites·11 claims
- 2382US7485881B2Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter systemASML NETHERLANDS BV·Filed 2005·Granted Feb 3, 2009·5 cites·30 claims
- 2481US8507882B2Radiation source and lithographic apparatusSWINKELS GERARDUS HUBERTUS PETRUS MARIA·Filed 2009·Granted Aug 13, 2013·18 cites·11 claims
- 2581US7671347B2Cleaning method, apparatus and cleaning systemASML NETHERLANDS BV·Filed 2006·Granted Mar 2, 2010·6 cites·25 claims
- 2680US7897110B2System and method for detecting at least one contamination species in a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Mar 1, 2011·5 cites·14 claims
- 2780US6940587B2Lithographic apparatus and a measurement systemASML NETHERLANDS BV·Filed 2003·Granted Sep 6, 2005·17 cites·29 claims
- 2879US7088431B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Aug 8, 2006·23 cites·13 claims
- 2977US8279397B2Method for removing contamination on optical surfaces and optical arrangementEHM DIRK HEINRICH·Filed 2009·Granted Oct 2, 2012·5 cites·22 claims
- 3077US7459690B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Dec 2, 2008·3 cites·29 claims
- 3176US9411238B2Source-collector device, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Aug 9, 2016·4 cites·8 claims
- 3276US7167232B2Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatusASML NETHERLANDS BV·Filed 2003·Granted Jan 23, 2007·15 cites·19 claims
- 3375US8368040B2Radiation system and lithographic apparatusASML NETHERLANDS BV·Filed 2010·Granted Feb 5, 2013·4 cites·12 claims
- 3475US6750949B2Lithographic apparatus and device manufacturing methodAMSL NETHERLANDS BV·Filed 2002·Granted Jun 15, 2004·19 cites·28 claims
- 3574US7928412B2Lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Granted Apr 19, 2011·3 cites·7 claims
- 3673US6879374B2Device manufacturing method, device manufactured thereby and a mask for use in the methodASML NETHERLANDS BV·Filed 2002·Granted Apr 12, 2005·13 cites·42 claims
- 3772US8477285B2Particle cleaning of optical elements for microlithographyEHM DIRK HEINRICH·Filed 2010·Granted Jul 2, 2013·3 cites·25 claims
- 3871US6721389B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Apr 13, 2004·8 cites·17 claims
- 3969US8345223B2Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2009·Granted Jan 1, 2013·4 cites·34 claims
- 4069US2024160109A1Prolonging optical element lifetime in an euv lithography systemASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 4168US7684012B2Lithographic device, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·2 cites·21 claims
- 4268US7629594B2Lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 8, 2009·2 cites·12 claims
- 4368US7501642B2Radiation sourceASML NETHERLANDS BV·Filed 2005·Granted Mar 10, 2009·7 cites·21 claims
- 4468US7193229B2Lithographic apparatus, illumination system and method for mitigating debris particlesASML NETHERLANDS BV·Filed 2004·Granted Mar 20, 2007·8 cites·43 claims
- 4568US7095479B2Lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Aug 22, 2006·9 cites·12 claims
- 4668US7041989B1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 9, 2006·9 cites·20 claims
- 4767US7279690B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 9, 2007·2 cites·37 claims
- 4866US8928855B2Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensorMOORS JOHANNES HUBERTUS JOSEPHINA·Filed 2009·Granted Jan 6, 2015·4 cites·13 claims
- 4966US7491951B2Lithographic apparatus, system and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 17, 2009·2 cites·47 claims
- 5065US9164403B2Radiation source, lithographic apparatus and device manufacturing methodKEMPEN ANTONIUS THEODORUS WILHELMUS·Filed 2010·Granted Oct 20, 2015·1 cites·16 claims
Showing the top 50 of 104 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →