Inventor · disambiguated record
Tasuku Matsumiya
Also filed as: MATSUMIYA TASUKU
33 granted patents·6 pending applications·115 citations·filing 2003–2021
96Inventor score
Top patents by PatentIndex Score
39 records- 0194US8192915B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2009·Granted Jun 5, 2012·21 cites·14 claims
- 0291US9169421B2Method of producing structure containing phase-separated structure, method of forming pattern, and top coat materialTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Oct 27, 2015·7 cites·12 claims
- 0391US8227170B2Resist composition, method of forming resist pattern, polymeric compound, and compoundDAZAI TAKAHIRO·Filed 2010·Granted Jul 24, 2012·11 cites·20 claims
- 0490US8329378B2Positive resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted Dec 11, 2012·9 cites·12 claims
- 0590US8268529B2Positive resist composition, method of forming resist pattern using the same, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Sep 18, 2012·9 cites·11 claims
- 0690US8182976B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2009·Granted May 22, 2012·13 cites·16 claims
- 0787US9442371B2Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Sep 13, 2016·2 cites·17 claims
- 0885US8236477B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2009·Granted Aug 7, 2012·7 cites·8 claims
- 0983US9567477B2Undercoat agent and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Feb 14, 2017·4 cites·4 claims
- 1082US8541529B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2012·Granted Sep 24, 2013·3 cites·6 claims
- 1181US8404428B2Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compoundMATSUMIYA TASUKU·Filed 2010·Granted Mar 26, 2013·3 cites·7 claims
- 1280US8232041B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Jul 31, 2012·12 cites·10 claims
- 1379US9206307B2Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Dec 8, 2015·2 cites·17 claims
- 1478US8846838B2Fluorine-containing block copolymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Sep 30, 2014·2 cites·1 claims
- 1576US9816003B2Method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Nov 14, 2017·2 cites·2 claims
- 1667US8487056B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2012·Granted Jul 16, 2013·4 cites·6 claims
- 1763US9834696B2Undercoat agent and method of forming pattern of layer containing block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Dec 5, 2017·0 cites·7 claims
- 1862US7923192B2Base material for pattern-forming material, positive resist composition and method of resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Apr 12, 2011·1 cites·20 claims
- 1960US10101660B2Methods of forming patterns of semiconductor devicesPARK JEONG JU·Filed 2016·Granted Oct 16, 2018·1 cites·15 claims
- 2058US2013243958A1Undercoat agent and method of forming pattern of layer containing block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 2156US12411408B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Sep 9, 2025·0 cites·8 claims
- 2256US11835857B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Dec 5, 2023·0 cites·7 claims
- 2356US9914847B2Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Mar 13, 2018·0 cites·7 claims
- 2455US9475088B2Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer compositionTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Oct 25, 2016·0 cites·2 claims
- 2555US2021003918A1Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 2653US8367296B2Positive resist composition, method of forming resist pattern, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Feb 5, 2013·0 cites·16 claims
- 2752US2015093507A1Method of producing structure containing phase-separated structure, and block copolymer compositionTOKYO OHKA KOGYO CO LTD·Filed 2014·Application pending·0 cites
- 2848US10179866B2Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Jan 15, 2019·0 cites·2 claims
- 2948US10066096B2Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Sep 4, 2018·0 cites·4 claims
- 3048US7449276B2Positive photoresist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Nov 11, 2008·2 cites·12 claims
- 3148US2018171172A1Resin composition for forming phase-separated structure and method of producing structure including phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2017·Application pending·0 cites
- 3246US9821338B2Method of producing structure containing phase-separated structure utilizing a brush composition comprising PS-PMMATOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Nov 21, 2017·0 cites·1 claims
- 3344US9828519B2Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Nov 28, 2017·0 cites·5 claims
- 3443US9776208B2Brush composition, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Oct 3, 2017·0 cites·16 claims
- 3541US10100221B2Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer compositionTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Oct 16, 2018·0 cites·1 claims
- 3639US8043798B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Oct 25, 2011·0 cites·7 claims
- 3738US2006127799A1Method for forming resist pattern and resist patternKUBOTA NAOTAKA·Filed 2003·Application pending·0 cites
- 3838US2006063102A1Positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 3930US7871753B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 18, 2011·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →