Inventor · disambiguated record
Paul P. Tesch
Also filed as: TESCH PAUL · TESCH PAUL P
13 granted patents·1 pending application·207 citations·filing 2001–2017
92Inventor score
Top patents by PatentIndex Score
14 records- 0195US8405054B2Multi-source plasma focused ion beam systemSMITH NOEL·Filed 2011·Granted Mar 26, 2013·27 cites·8 claims
- 0295US8076650B2Multi-source plasma focused ion beam systemSMITH NOEL·Filed 2007·Granted Dec 13, 2011·44 cites·29 claims
- 0393US9401262B2Multi-source plasma focused ion beam systemFEI CO·Filed 2015·Granted Jul 26, 2016·4 cites·19 claims
- 0489US8525419B2High voltage isolation and cooling for an inductively coupled plasma ion sourceSMITH NOEL S·Filed 2009·Granted Sep 3, 2013·25 cites·19 claims
- 0585US9029812B2Multi-source plasma focused ion beam systemFEI CO·Filed 2014·Granted May 12, 2015·4 cites·15 claims
- 0684US6949756B2Shaped and low density focused ion beamsFEI CO·Filed 2001·Granted Sep 27, 2005·20 cites·29 claims
- 0782US6797953B2Electron beam system using multiple electron beamsFEI CO·Filed 2002·Granted Sep 28, 2004·38 cites·39 claims
- 0882US6710338B2Focused ion beam systemFEI CO·Filed 2001·Granted Mar 23, 2004·25 cites·16 claims
- 0979US10128076B1Inductively coupled plasma ion source with tunable radio frequency powerOREGON PHYSICS LLC·Filed 2017·Granted Nov 13, 2018·3 cites·12 claims
- 1077US8692217B2Multi-source plasma focused ion beam systemFEI CO·Filed 2013·Granted Apr 8, 2014·2 cites·10 claims
- 1176US6797969B2Multi-column FIB for nanofabrication applicationsFEI CO·Filed 2001·Granted Sep 28, 2004·12 cites·30 claims
- 1267US9655223B2RF system, magnetic filter, and high voltage isolation for an inductively coupled plasma ion sourceOREGON PHYSICS LLC·Filed 2013·Granted May 16, 2017·3 cites·11 claims
- 1346US10192708B2Electron emitter sourceOREGON PHYSICS LLC·Filed 2016·Granted Jan 29, 2019·0 cites·20 claims
- 1446US2011163068A1Multibeam SystemUTLAUT MARK·Filed 2009·Application pending·0 cites
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