Inventor · disambiguated record
Chang-Cheng Hung
Also filed as: HUNG CHANG-CHENG
17 granted patents·86 citations·filing 2000–2020
91Inventor score
Files withTAIWAN SEMICONDUCTOR MFG12WU KEN2HUNG CHANG-CHENG1TAIWAN SEMICONDUCTOR MFG CO LTD1TAIWAN SEMICONDUCTOR MFG CORP1
Top patents by PatentIndex Score
17 records- 0187US8038897B2Method and system for wafer inspectionTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Oct 18, 2011·8 cites·13 claims
- 0281US7162071B2Progressive self-learning defect review and classification methodTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Jan 9, 2007·39 cites·16 claims
- 0374US7819980B2System and method for removing particles in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Oct 26, 2010·4 cites·19 claims
- 0471US7759136B2Critical dimension (CD) control by spectrum metrologyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 20, 2010·4 cites·16 claims
- 0563US6365303B1Electrostatic discharge damage prevention method on masksTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Apr 2, 2002·15 cites·20 claims
- 0661US7035449B2Method for applying a defect finder mark to a backend photomask making processTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Apr 25, 2006·7 cites·17 claims
- 0755US6861179B1Charge effect and electrostatic damage prevention method on photo-maskTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Mar 1, 2005·4 cites·28 claims
- 0853US11243573B2Semiconductor package, display apparatus and manufacturing method of semiconductor packageTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 8, 2022·0 cites·20 claims
- 0952US8624345B2Photomask and photomask substrate with reduced light scattering propertiesWU KEN·Filed 2012·Granted Jan 7, 2014·0 cites·18 claims
- 1048US8046860B2System and method for removing particles in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Nov 1, 2011·0 cites·20 claims
- 1148US6653029B2Dual-focused ion beams for semiconductor image scanning and mask repairTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Nov 25, 2003·1 cites·15 claims
- 1247US8198118B2Method for forming a robust mask with reduced light scatteringWU KEN·Filed 2006·Granted Jun 12, 2012·0 cites·20 claims
- 1347US6858354B1Method to prevent side lobe on seal ringTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Feb 22, 2005·1 cites·39 claims
- 1446US6858353B2Increased-contrast film for high-transmittance attenuated phase-shaft masksTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Feb 22, 2005·1 cites·13 claims
- 1544US8617410B2Method and system for wafer inspectionHUNG CHANG-CHENG·Filed 2011·Granted Dec 31, 2013·0 cites·16 claims
- 1643US7469057B2System and method for inspecting errors on a waferTAIWAN SEMICONDUCTOR MFG CORP·Filed 2004·Granted Dec 23, 2008·2 cites·20 claims
- 1743US7460251B2Dimension monitoring method and systemTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Dec 2, 2008·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →