Inventor · disambiguated record
Ralph R. Dammel
Also filed as: DAMMEL RALPH · DAMMEL RALPH R · DAMMEL RALPH RAINER
77 granted patents·19 pending applications·1,837 citations·filing 1988–2021
99Inventor score
Files withCLARIANT FINANCE BVI LTD19HOECHST AG18AZ ELECTRONIC MATERIALS USA15HOECHST CELANESE CORP13DAMMEL RALPH R4
Top patents by PatentIndex Score
96 records- 0198US6447980B1Photoresist composition for deep UV and process thereofCLARIANT FINANCE BVI LTD·Filed 2000·Granted Sep 10, 2002·144 cites·12 claims
- 0297US6723488B2Photoresist composition for deep UV radiation containing an additiveCLARIANT FINANCE BVI LTD·Filed 2001·Granted Apr 20, 2004·99 cites·13 claims
- 0396US8329387B2Antireflective coating compositionsYAO HUIRONG·Filed 2008·Granted Dec 11, 2012·38 cites·8 claims
- 0496US6991888B2Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Jan 31, 2006·84 cites·19 claims
- 0595US7745077B2Composition for coating over a photoresist patternAZ ELECTRONIC MATERIALS USA·Filed 2008·Granted Jun 29, 2010·31 cites·19 claims
- 0694US7521170B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Apr 21, 2009·21 cites·8 claims
- 0794US7416834B2Antireflective coating compositionsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Aug 26, 2008·19 cites·22 claims
- 0893US7595141B2Composition for coating over a photoresist patternAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted Sep 29, 2009·46 cites·12 claims
- 0993US7473512B2Process of imaging a deep ultraviolet photoresist with a top coating and materials thereofAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Jan 6, 2009·18 cites·27 claims
- 1093US6844131B2Positive-working photoimageable bottom antireflective coatingCLARIANT FINANCE BVI LTD·Filed 2002·Granted Jan 18, 2005·113 cites·23 claims
- 1191US7923200B2Composition for coating over a photoresist pattern comprising a lactamAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Apr 12, 2011·17 cites·16 claims
- 1291US6114085AAntireflective composition for a deep ultraviolet photoresistCLARIANT FINANCE BVI LTD·Filed 1998·Granted Sep 5, 2000·112 cites·17 claims
- 1391US5994430AAntireflective coating compositions for photoresist compositions and use thereofCLARIANT FINANCE BVI LTD·Filed 1997·Granted Nov 30, 1999·42 cites·22 claims
- 1489US6737215B2Photoresist composition for deep ultraviolet lithographyCLARIANT FINANCE BVI LTD·Filed 2001·Granted May 18, 2004·33 cites·22 claims
- 1589US5525453APositive-working radiation-sensitive mixtureHOECHST JAPAN·Filed 1994·Granted Jun 11, 1996·61 cites·20 claims
- 1688US6576394B1Negative-acting chemically amplified photoresist compositionCLARIANT FINANCE BVI LTD·Filed 2000·Granted Jun 10, 2003·32 cites·15 claims
- 1787US6686429B2Polymer suitable for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 2001·Granted Feb 3, 2004·28 cites·22 claims
- 1887US6274295B1Light-absorbing antireflective layers with improved performance due to refractive index optimizationCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 14, 2001·64 cites·14 claims
- 1986US4927956A3,5-disubstituted-4-acetoxystyrene and process for its productionHOECHST CELANESE CORP·Filed 1989·Granted May 22, 1990·21 cites·5 claims
- 2085US8084186B2Hardmask process for forming a reverse tone image using polysilazaneABDALLAH DAVID·Filed 2009·Granted Dec 27, 2011·13 cites·15 claims
- 2185US5981145ALight absorbing polymersCLARIANT FINANCE BVI LTD·Filed 1997·Granted Nov 9, 1999·59 cites·7 claims
- 2285US4868256AProcess for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene its polymerization, and hydrolysisHOECHST CELANESE·Filed 1988·Granted Sep 19, 1989·22 cites·17 claims
- 2382US8524441B2Silicon-based antireflective coating compositionsZHANG RUZHI·Filed 2008·Granted Sep 3, 2013·10 cites·16 claims
- 2482US5338641APositive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compoundHOECHST AG·Filed 1993·Granted Aug 16, 1994·39 cites·25 claims
- 2581US7816071B2Process of imaging a photoresist with multiple antireflective coatingsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Oct 19, 2010·19 cites·22 claims
- 2681US5733714AAntireflective coating for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 1996·Granted Mar 31, 1998·78 cites·28 claims
- 2777US5476750AMetal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresistsHOECHST CELANESE CORP·Filed 1992·Granted Dec 19, 1995·32 cites·7 claims
- 2876US6365322B1Photoresist composition for deep UV radiationCLARIANT FINANCE BVI LTD·Filed 1999·Granted Apr 2, 2002·34 cites·19 claims
- 2975US5652297AAqueous antireflective coatings for photoresist compositionsHOECHST CELANESE CORP·Filed 1996·Granted Jul 29, 1997·38 cites·19 claims
- 3075US5342727ACopolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive compositionHOECHST CELANESE CORP·Filed 1991·Granted Aug 30, 1994·25 cites·18 claims
- 3175US5340682APositive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compoundHOECHST AG·Filed 1993·Granted Aug 23, 1994·29 cites·21 claims
- 3273US6800415B2Negative-acting aqueous photoresist compositionCLARIANT FINANCE BVI LTD·Filed 2001·Granted Oct 5, 2004·12 cites·12 claims
- 3371US7833693B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2008·Granted Nov 16, 2010·1 cites·10 claims
- 3470US4946759APositive radiation-sensitive mixture and radiation-sensitive recording material produced therefromHOECHST AG·Filed 1988·Granted Aug 7, 1990·9 cites·14 claims
- 3570US4933495AProcess for the production of 3-mono or 3,5 dihalogenated 4-acetoxystyrene, its polymerization, and hydrolysisHOECHST CELANESE CORP·Filed 1989·Granted Jun 12, 1990·9 cites·7 claims
- 3669US6800416B2Negative deep ultraviolet photoresistCLARIANT FINANCE BVI LTD·Filed 2002·Granted Oct 5, 2004·9 cites·9 claims
- 3769US5652317AAntireflective coatings for photoresist compositionsHOECHST CELANESE CORP·Filed 1996·Granted Jul 29, 1997·28 cites·18 claims
- 3869US4965400APreparation of 3,5-disubstituted-4-acetoxystyreneVICARI RICHARD·Filed 1988·Granted Oct 23, 1990·20 cites·10 claims
- 3968US5403697APositive radiation-sensitive mixture and recording material produced therefromHOECHST AG·Filed 1992·Granted Apr 4, 1995·21 cites·23 claims
- 4067US5922503AProcess for obtaining a lift-off imaging profileCLARIANT FINANCE BVI LTD·Filed 1997·Granted Jul 13, 1999·30 cites·15 claims
- 4166US7547501B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Jun 16, 2009·1 cites·5 claims
- 4266US5424166ANegative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfromHOECHST AG·Filed 1994·Granted Jun 13, 1995·21 cites·26 claims
- 4365US5286602AAcid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixtureHOECHST AG·Filed 1992·Granted Feb 15, 1994·8 cites·20 claims
- 4464US7033728B2Photoresist compositionAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Apr 25, 2006·18 cites·26 claims
- 4563US6852465B2Photoresist composition for imaging thick filmsCLARIANT INT LTD·Filed 2003·Granted Feb 8, 2005·7 cites·20 claims
- 4663US5688893AMethod of using a Lewis base to control molecular weight of novolak resinsHOECHST CELANESE CORP·Filed 1996·Granted Nov 18, 1997·18 cites·5 claims
- 4762US5541036ANegative photoresist compositions comprising a photosensitive compound, an alkoxymethylated melamine and novolak resinHOECHST JAPAN·Filed 1993·Granted Jul 30, 1996·17 cites·12 claims
- 4862US5401608ANegative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewithHOECHST AG·Filed 1992·Granted Mar 28, 1995·17 cites·19 claims
- 4961US5326826ARadiation-sensitive polymers containing diazocarbonyl groups and a process for their preparationHOECHST AG·Filed 1992·Granted Jul 5, 1994·16 cites·46 claims
- 5060US5346806AAcid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixtureHOECHST AG·Filed 1992·Granted Sep 13, 1994·7 cites·20 claims
Showing the top 50 of 96 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Ralph R. Dammel files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →