Inventor · disambiguated record
Theodore H. Fedynyshyn
Also filed as: FEDYNYSHYN THEODORE · FEDYNYSHYN THEODORE H
24 granted patents·6 pending applications·272 citations·filing 1982–2020
95Inventor score
Files withMASSACHUSETTS INST TECHNOLOGY17FEDYNYSHYN THEODORE H4OLIN CORP4BERGGREN KARL K1FEDYNYSHYN THEODORE1
Top patents by PatentIndex Score
30 records- 0194US6468712B1Resist materials for 157-nm lithographyMASSACHUSETTS INST TECHNOLOGY·Filed 2000·Granted Oct 22, 2002·54 cites·33 claims
- 0289US6783914B1Encapsulated inorganic resistsMASSACHUSETTS INST TECHNOLOGY·Filed 2000·Granted Aug 31, 2004·29 cites·15 claims
- 0386US4565856APyrithione-containing bioactive polymers and their use in paint and wood preservative productsOLIN CORP·Filed 1984·Granted Jan 21, 1986·20 cites·8 claims
- 0482US7745102B2Immersion fluids for lithographyMASSACHUSETTS INST TECHNOLOGY·Filed 2007·Granted Jun 29, 2010·7 cites·26 claims
- 0581US4632881APyrithione-containing bioactive polymers and their use in paint and wood perservative productsOLIN CORP·Filed 1986·Granted Dec 30, 1986·24 cites·4 claims
- 0680US6680157B1Resist methods and materials for UV and electron-beam lithography with reduced outgassingMASSACHUSETTS INST TECHNOLOGY·Filed 2000·Granted Jan 20, 2004·43 cites·46 claims
- 0779US10851251B2Block copolymer ink formulation for 3D printing and method of making a 3D printed radiofrequency (RF) deviceHARVARD COLLEGE·Filed 2016·Granted Dec 1, 2020·2 cites·25 claims
- 0876US6913865B2Surface modified encapsulated inorganic resistMASSACHUSETTS INST TECHNOLOGY·Filed 2002·Granted Jul 5, 2005·12 cites·26 claims
- 0973US8551566B2Directed material assemblyFEDYNYSHYN THEODORE H·Filed 2010·Granted Oct 8, 2013·3 cites·34 claims
- 1071US8158338B2Resist sensitizerFEDYNYSHYN THEODORE H·Filed 2008·Granted Apr 17, 2012·11 cites·51 claims
- 1171US4375420ASelected 4-hydroxyphenyl anilino alkoxysilanes and their use as antioxidantsOLIN CORP·Filed 1982·Granted Mar 1, 1983·8 cites·13 claims
- 1270US7153630B2Resist with reduced line edge roughnessMASSACHUSETTS INST TECHNOLOGY·Filed 2005·Granted Dec 26, 2006·2 cites·21 claims
- 1368US7622246B2Contrast enhancing layersMASSACHUSETTS INST TECHNOLOGY·Filed 2006·Granted Nov 24, 2009·2 cites·53 claims
- 1468US4596864APyrithione-containing bioactive polymers and their use in paint and wood preservative productsOLIN CORP·Filed 1985·Granted Jun 24, 1986·21 cites·8 claims
- 1565US6936398B2Resist with reduced line edge roughnessMASSACHUSETTS INST TECHNOLOGY·Filed 2001·Granted Aug 30, 2005·6 cites·23 claims
- 1664US5302490ARadiation sensitive compositions comprising blends of an aliphatic novolak resin and an aromatic novolak resinSHIPLEY CO·Filed 1993·Granted Apr 12, 1994·21 cites·13 claims
- 1757US6794109B2Low abosorbing resists for 157 nm lithographyMASSACHUSETTS INST TECHNOLOGY·Filed 2001·Granted Sep 21, 2004·4 cites·36 claims
- 1855US2005118570A1Sample preparation methods and devicesMASSACHUSETTS INST TECHNOLOGY·Filed 2004·Application pending·0 cites
- 1953US11267981B23-D printed devices formed with conductive inks and method of makingMASSACHUSETTS INST TECHNOLOGY·Filed 2019·Granted Mar 8, 2022·0 cites·17 claims
- 2053US6872504B2High sensitivity X-ray photoresistMASSACHUSETTS INST TECHNOLOGY·Filed 2002·Granted Mar 29, 2005·3 cites·47 claims
- 2152US11845219B23-d printed devices formed with magnetic inks and methods of making graded index structuresMASSACHUSETTS INST TECHNOLOGY·Filed 2020·Granted Dec 19, 2023·0 cites·11 claims
- 2245US2012276334A1Surfaces with Controllable Wetting and AdhesionFEDYNYSHYN THEODORE·Filed 2012·Application pending·0 cites
- 2344US7443090B2Surface-emission cathodes having cantilevered electrodesMASSACHUSETTS INST TECHNOLOGY·Filed 2005·Granted Oct 28, 2008·0 cites·28 claims
- 2442US8323866B2Inorganic resist sensitizerFEDYNYSHYN THEODORE H·Filed 2009·Granted Dec 4, 2012·0 cites·31 claims
- 2541US6815145B2Resist materials for 157-nm lithographyMASSACHUSETTS INST TECHNOLOGY·Filed 2002·Granted Nov 9, 2004·0 cites·20 claims
- 2641US2005277204A1Sample preparation methods and devicesMASSACHUSETTS INST TECHNOLOGY·Filed 2005·Application pending·0 cites
- 2740US2015337068A1Preparation, purification and use of high-x diblock copolymersBERGGREN KARL K·Filed 2013·Application pending·0 cites
- 2839US2018212026A1Surface modified diamond materials and methods of manufacturingMASSACHUSETTS INST TECHNOLOGY·Filed 2017·Application pending·0 cites
- 2933US2004009424A1Protecting groups for lithographic resist compositionsMASS INST OF TECHNOLOGY MIT·Filed 2003·Application pending·0 cites
- 3030US8110339B2Multi-tone resist compositionsFEDYNYSHYN THEODORE H·Filed 2008·Granted Feb 7, 2012·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →