Inventor · disambiguated record
Wang Yueh
Also filed as: YUEH WANG · YUEH WANG LO CHUN · YUEH WANG S
23 granted patents·10 pending applications·792 citations·filing 1999–2006
96Inventor score
Top patents by PatentIndex Score
33 records- 0198US7005227B2One component EUV photoresistINTEL CORP·Filed 2004·Granted Feb 28, 2006·471 cites·8 claims
- 0297US6306554B1Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2000·Granted Oct 23, 2001·89 cites·45 claims
- 0393US6680159B2Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2001·Granted Jan 20, 2004·41 cites·28 claims
- 0486US7459260B2Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the methodINTEL CORP·Filed 2005·Granted Dec 2, 2008·9 cites·27 claims
- 0585US6492086B1Phenolic/alicyclic copolymers and photoresistsSHIPLEY CO LLC·Filed 1999·Granted Dec 10, 2002·46 cites·2 claims
- 0683US6406828B1Polymer and photoresist compositionsSHIPLEY CO LLC·Filed 2000·Granted Jun 18, 2002·39 cites·24 claims
- 0781US6599677B2Polymer and photoresist compositionsSHIPLEY CO LLC·Filed 2002·Granted Jul 29, 2003·15 cites·18 claims
- 0879US7125793B2Method for forming an opening for an interconnect structure in a dielectric layer having a photosensitive materialINTEL CORP·Filed 2003·Granted Oct 24, 2006·23 cites·15 claims
- 0975US6849381B2Copolymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2003·Granted Feb 1, 2005·12 cites·20 claims
- 1070US7700256B2Phenolic/alicyclic copolymers and photoresistsROHM & HAAS ELECT MAT·Filed 2002·Granted Apr 20, 2010·8 cites·15 claims
- 1170US7678527B2Methods and compositions for providing photoresist with improved properties for contacting liquidsINTEL CORP·Filed 2003·Granted Mar 16, 2010·11 cites·30 claims
- 1270US7241560B2Basic quencher/developer solutions for photoresistsINTEL CORP·Filed 2005·Granted Jul 10, 2007·3 cites·9 claims
- 1366US6864192B1Langmuir-blodgett chemically amplified photoresistINTEL CORP·Filed 2003·Granted Mar 8, 2005·11 cites·15 claims
- 1462US6777157B1Copolymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2000·Granted Aug 17, 2004·6 cites·15 claims
- 1549US7226718B2Non-outgassing low activation energy resistINTEL CORP·Filed 2005·Granted Jun 5, 2007·0 cites·20 claims
- 1649US7105266B2Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2001·Granted Sep 12, 2006·1 cites·20 claims
- 1747US7147986B2Resist compounds including acid labile groups attached to polymeric chains at anhydride linkagesINTEL CORP·Filed 2004·Granted Dec 12, 2006·1 cites·15 claims
- 1845US7118847B2Polymer and photoresist compositionsSHIPLEY CO LLC·Filed 2004·Granted Oct 10, 2006·0 cites·9 claims
- 1945US2004176214A1Connector for trampoline safety fence postSHEN TAI INDUSTRY CO LTD·Filed 2003·Application pending·0 cites
- 2044US7867687B2Methods and compositions for reducing line wide roughnessINTEL CORP·Filed 2003·Granted Jan 11, 2011·1 cites·21 claims
- 2143US7147985B2Resist compounds including acid labile groups having hydrophilic groups attached theretoINTEL CORP·Filed 2004·Granted Dec 12, 2006·5 cites·18 claims
- 2242US7442487B2Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresistsINTEL CORP·Filed 2003·Granted Oct 28, 2008·0 cites·29 claims
- 2342US2008076058A1Luminescent photoresistLEESON MICHAEL J·Filed 2006·Application pending·0 cites
- 2441US2007122734A1Molecular photoresistROBERTS JEANETTE M·Filed 2005·Application pending·0 cites
- 2539US7427463B2Photoresists with reduced outgassing for extreme ultraviolet lithographyINTEL CORP·Filed 2003·Granted Sep 23, 2008·0 cites·30 claims
- 2639US2006292500A1Cure during rinse to prevent resist collapseROBERTS JEANETTE·Filed 2005·Application pending·0 cites
- 2739US2004265734A1Photoresist performance through control of polymer characteristicsFiled 2003·Application pending·0 cites
- 2837US2005084807A1Reducing photoresist line edge roughness using chemically-assisted reflowFiled 2003·Application pending·0 cites
- 2936US2005158654A1Reducing outgassing of reactive material upon exposure of photolithography resistsFiled 2004·Application pending·0 cites
- 3035US7022454B2Monomers, polymers, methods of synthesis thereof and photoresist compositionsSHIPLEY CO LLC·Filed 2001·Granted Apr 4, 2006·0 cites·15 claims
- 3135US2024219842A1Photoresist developerCHANDHOK MANISH·Filed 2004·Application pending·0 cites
- 3234US2006003271A1Basic supercritical solutions for quenching and developing photoresistsCLARK SHAN C·Filed 2004·Application pending·0 cites
- 3325US2006046183A1Photoresist formulation with surfactant additiveYUEH WANG·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →