Inventor · disambiguated record
Monique Mcintosh
Also filed as: MCINTOSH MONIQUE
3 granted patents·8 pending applications·13 citations·filing 2006–2018
64Inventor score
Files withAPPLIED MATERIALS INC11
Top patents by PatentIndex Score
11 records- 0193US9649592B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2015·Granted May 16, 2017·11 cites·11 claims
- 0277US10449486B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2017·Granted Oct 22, 2019·1 cites·12 claims
- 0374US11185815B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2018·Granted Nov 30, 2021·1 cites·16 claims
- 0454US2008003157A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 0554US2008003151A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 0652US2008003158A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 0749US2008003150A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 0846US2008014134A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 0943US2007086931A1Methods and apparatus for process abatementAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1042US2016276179A1Nitrogen oxide abatement in semiconductor fabricationAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 1137US2016089630A1Vacuum foreline reagent addition for fluorine abatementAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →