Inventor · disambiguated record
Alex Ka Tim Poon
Also filed as: POON ALEX · POON ALEX K T · POON ALEX K TIM · POON ALEX KA TIM
33 granted patents·25 pending applications·580 citations·filing 1999–2021
97Inventor score
Top patents by PatentIndex Score
58 records- 0198US7292313B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2006·Granted Nov 6, 2007·141 cites·47 claims
- 0297US8934080B2Apparatus and methods for recovering fluid in immersion lithographyPOON ALEX KA TIM·Filed 2012·Granted Jan 13, 2015·33 cites·21 claims
- 0397US8743343B2Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2013·Granted Jun 3, 2014·31 cites·34 claims
- 0496US8289497B2Apparatus and methods for recovering fluid in immersion lithographyPOON ALEX KA TIM·Filed 2009·Granted Oct 16, 2012·35 cites·36 claims
- 0595US8610873B2Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substratePOON ALEX KA TIM·Filed 2009·Granted Dec 17, 2013·26 cites·34 claims
- 0695US8237911B2Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machinePOON ALEX·Filed 2007·Granted Aug 7, 2012·34 cites·34 claims
- 0794US8400610B2Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machinePOON ALEX·Filed 2012·Granted Mar 19, 2013·32 cites·16 claims
- 0894US7576833B2Gas curtain type immersion lithography tool using porous material for fluid removalNIKON CORP·Filed 2007·Granted Aug 18, 2009·21 cites·37 claims
- 0993US8068209B2Nozzle to help reduce the escape of immersion liquid from an immersion lithography toolPOON ALEX KA TIM·Filed 2008·Granted Nov 29, 2011·34 cites·8 claims
- 1092US7532309B2Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluidNIKON CORP·Filed 2006·Granted May 12, 2009·15 cites·22 claims
- 1192US6791669B2Positioning device and exposure apparatus including the sameNIKON CORP·Filed 2001·Granted Sep 14, 2004·49 cites·14 claims
- 1290US9547243B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2014·Granted Jan 17, 2017·3 cites·31 claims
- 1385US8896807B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2013·Granted Nov 25, 2014·2 cites·18 claims
- 1485US8520187B2Apparatus and method for providing fluid for immersion lithographyPOON ALEX KA TIM·Filed 2009·Granted Aug 27, 2013·4 cites·18 claims
- 1583US6917412B2Modular stage with reaction force cancellationNIKON CORP·Filed 2003·Granted Jul 12, 2005·22 cites·45 claims
- 1680US9329492B2Apparatus and method to control vacuum at porous material using multiple porous materialsNIKON CORP·Filed 2013·Granted May 3, 2016·3 cites·16 claims
- 1780US6597435B2Reticle stage with reaction force cancellationNIKON CORP·Filed 2001·Granted Jul 22, 2003·17 cites·30 claims
- 1879US9176394B2Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrateNIKON CORP·Filed 2013·Granted Nov 3, 2015·3 cites·19 claims
- 1979US7929109B2Apparatus and method for recovering liquid droplets in immersion lithographyNIKON CORP·Filed 2006·Granted Apr 19, 2011·5 cites·32 claims
- 2079US7751026B2Apparatus and method for recovering fluid for immersion lithographyNIKON CORP·Filed 2006·Granted Jul 6, 2010·4 cites·44 claims
- 2178US6281655B1High performance stage assemblyNIKON CORP·Filed 1999·Granted Aug 28, 2001·47 cites·67 claims
- 2275US8054448B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2005·Granted Nov 8, 2011·3 cites·56 claims
- 2372US8634055B2Apparatus and method to control vacuum at porous material using multiple porous materialsPOON ALEX KA TIM·Filed 2010·Granted Jan 21, 2014·2 cites·47 claims
- 2472US8477284B2Apparatus and method to control vacuum at porous material using multiple porous materialsPOON ALEX KA TIM·Filed 2009·Granted Jul 2, 2013·3 cites·42 claims
- 2570US6989887B2Dual force mode fine stage apparatusNIKON CORP·Filed 2001·Granted Jan 24, 2006·11 cites·25 claims
- 2669US10203610B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2017·Granted Feb 12, 2019·0 cites·33 claims
- 2769US2019137888A1Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2019·Application pending·0 cites
- 2866US9817319B2Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2016·Granted Nov 14, 2017·0 cites·38 claims
- 2962US9217933B2Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machineNIKON CORP·Filed 2014·Granted Dec 22, 2015·0 cites·96 claims
- 3057US2007195303A1Apparatus and method for providing fluid for immersion lithographyNIKON CORP·Filed 2007·Application pending·0 cites
- 3153US9285683B2Apparatus and method for providing fluid for immersion lithographyPOON ALEX KA TIM·Filed 2011·Granted Mar 15, 2016·0 cites·16 claims
- 3253US8780323B2Apparatus and method for recovering liquid droplets in immersion lithographyPOON ALEX KA TIM·Filed 2011·Granted Jul 15, 2014·0 cites·23 claims
- 3348US2010231876A1Apparatus and method for recovering fluid for immersion lithographyNIKON CORP·Filed 2010·Application pending·0 cites
- 3446US2022057017A1Expandable barrier actuated valveNIKON CORP·Filed 2021·Application pending·0 cites
- 3546US2008225248A1Apparatus, systems and methods for removing liquid from workpiece during workpiece processingNIKON CORP·Filed 2008·Application pending·0 cites
- 3646US2008212050A1Apparatus and methods for removing immersion liquid from substrates using temperature gradientNIKON CORP·Filed 2008·Application pending·0 cites
- 3746US2008231823A1Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatusNIKON CORP·Filed 2008·Application pending·0 cites
- 3846US2008198348A1Apparatus and methods for minimizing force variation from immersion liquid in lithography systemsNIKON CORP·Filed 2008·Application pending·0 cites
- 3945US2013069449A1Modular coil arrays for planar and linear motorsNIKON CORP·Filed 2012·Application pending·0 cites
- 4045US2008100812A1Immersion lithography system and method having a wafer chuck made of a porous materialNIKON CORP·Filed 2007·Application pending·0 cites
- 4145US2008043211A1Apparatus and methods for recovering fluid in immersion lithographyNIKON CORP·Filed 2007·Application pending·0 cites
- 4244US2007131879A1Force provider with adjustable force characteristics for a stage assemblyNIKON CORP·Filed 2007·Application pending·0 cites
- 4344US2010282955A1Sealed rotary measurement systemNIKON CORP·Filed 2009·Application pending·0 cites
- 4444US2007126999A1Apparatus and method for containing immersion liquid in immersion lithographyNIKON CORP·Filed 2006·Application pending·0 cites
- 4543US7375800B2Non-contact pneumatic transfer for stages with small motionNIKON CORP·Filed 2004·Granted May 20, 2008·0 cites·18 claims
- 4642US2008073563A1Exposure apparatus that includes a phase change circulation system for moversNIKON CORP·Filed 2006·Application pending·0 cites
- 4741US11092170B2Dual valve fluid actuator assemblyNIKON CORP·Filed 2018·Granted Aug 17, 2021·0 cites·21 claims
- 4840US2012257179A1Apparatus and methods to recover liquid in immersion lithographyCOON DEREK·Filed 2011·Application pending·0 cites
- 4939US2012062866A1Microchannel-cooled coils of electromagnetic actuators exhibiting reduced eddy-current dragBINNARD MICHAEL B·Filed 2011·Application pending·0 cites
- 5038US7283200B2System and method for measuring displacement of a stageNIKON CORP·Filed 2003·Granted Oct 16, 2007·0 cites·60 claims
Showing the top 50 of 58 patent records by PatentIndex Score.
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