Inventor · disambiguated record
Brent Schwab
Also filed as: SCHWAB BRENT · SCHWAB BRENT D
9 granted patents·3 pending applications·152 citations·filing 1996–2019
88Inventor score
Top patents by PatentIndex Score
12 records- 0177US6835667B2Method for etching high-k films in solutions comprising dilute fluoride speciesFSI INT INC·Filed 2002·Granted Dec 28, 2004·24 cites·34 claims
- 0274US6465374B1Method of surface preparationFSI INT INC·Filed 2000·Granted Oct 15, 2002·18 cites·21 claims
- 0373US6165273AEquipment for UV wafer heating and photochemistryFSI INTERNAT INC·Filed 1997·Granted Dec 26, 2000·36 cites·18 claims
- 0472US6221168B1HF/IPA based process for removing undesired oxides form a substrateFSI INT INC·Filed 1998·Granted Apr 24, 2001·43 cites·29 claims
- 0560US6663792B2Equipment for UV wafer heating and photochemistryFSI INT INC·Filed 2000·Granted Dec 16, 2003·6 cites·15 claims
- 0657US5922219AUV/halogen treatment for dry oxide etchingFSI INT INC·Filed 1996·Granted Jul 13, 1999·22 cites·21 claims
- 0749US7425505B2Use of silyating agentsFSI INT INC·Filed 2004·Granted Sep 16, 2008·2 cites·30 claims
- 0845US2020148534A1Method for achieving stiction-free high-aspect-ratio microstructures after wet chemical processingTEL FSI INC·Filed 2019·Application pending·0 cites
- 0939US2006272677A1Cleaning process for semiconductor substratesLEE NAM P·Filed 2005·Application pending·0 cites
- 1038US10748788B2System and method for monitoring treatment of microelectronic substrates with fluid sprays such as cryogenic fluid spraysTEL FSI INC·Filed 2018·Granted Aug 18, 2020·0 cites·19 claims
- 1134US2002025684A1Gaseous process for surface preparationFiled 2001·Application pending·0 cites
- 1230US6287413B1Apparatus for processing both sides of a microelectronic device precursorFSI INT INC·Filed 1999·Granted Sep 11, 2001·1 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →