Inventor · disambiguated record
Martinus Hendricus Hoeks
Also filed as: HOEKS MARTINUS · HOEKS MARTINUS H H · HOEKS MARTINUS HENDRICUS · HOEKS MARTINUS HENDRICUS HENDR
15 granted patents·105 citations·filing 2000–2013
91Inventor score
Top patents by PatentIndex Score
15 records- 0188US7965373B2Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation loadASML NETHERLANDS BV·Filed 2005·Granted Jun 21, 2011·11 cites·20 claims
- 0288US7092231B2Chuck, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Aug 15, 2006·41 cites·23 claims
- 0376US7460208B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Dec 2, 2008·5 cites·38 claims
- 0475US7362415B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 22, 2008·15 cites·20 claims
- 0573US6875992B2Position measuring device, position measuring system, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 5, 2005·15 cites·20 claims
- 0668US6894261B2Position measuring system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2000·Granted May 17, 2005·12 cites·23 claims
- 0763US7791710B2System and method for determining maximum operational parameters used in maskless applicationsASML NETHERLANDS BV·Filed 2006·Granted Sep 7, 2010·1 cites·6 claims
- 0862US7812930B2Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volumeASML NETHERLANDS BV·Filed 2005·Granted Oct 12, 2010·2 cites·16 claims
- 0960US9494869B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2012·Granted Nov 15, 2016·1 cites·20 claims
- 1051US7145636B2System and method for determining maximum operational parameters used in maskless applicationsASML NETHERLANDS BV·Filed 2004·Granted Dec 5, 2006·2 cites·15 claims
- 1150US9354502B2Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer programASML NETHERLANDS BV·Filed 2012·Granted May 31, 2016·0 cites·20 claims
- 1249US9594304B2Lithography apparatus, a device manufacturing method, a method of manufacturing an attenuatorASML NETHERLANDS BV·Filed 2013·Granted Mar 14, 2017·0 cites·19 claims
- 1343US8717535B2SLM calibrationVISSER HUIBERT·Filed 2008·Granted May 6, 2014·0 cites·44 claims
- 1441US9513561B2Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing methodBLEEKER ARNO JAN·Filed 2012·Granted Dec 6, 2016·0 cites·20 claims
- 1540US7403865B2System and method for fault indication on a substrate in maskless applicationsASML NETHERLANDS BV·Filed 2004·Granted Jul 22, 2008·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →