Inventor · disambiguated record
Deyan Wang
Also filed as: WANG DEYAN
65 granted patents·19 pending applications·294 citations·filing 2003–2023
98Inventor score
Top patents by PatentIndex Score
84 records- 0197US8241832B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Aug 14, 2012·25 cites·9 claims
- 0297US7968268B2Compositions and processes for immersion lithographyROHM & HAAS ELECT MAT·Filed 2006·Granted Jun 28, 2011·31 cites·17 claims
- 0396US7128822B2Leveler compoundsSHIPLEY CO LLC·Filed 2003·Granted Oct 31, 2006·70 cites·13 claims
- 0494US7776506B2Coating compositions for photoresistsROHM & HAAS ELECT MAT·Filed 2007·Granted Aug 17, 2010·17 cites·8 claims
- 0593US9156785B2Base reactive photoacid generators and photoresists comprising sameAQAD EMAD·Filed 2011·Granted Oct 13, 2015·9 cites·10 claims
- 0692US7662981B2Leveler compoundsROHM & HAAS ELECT MAT·Filed 2009·Granted Feb 16, 2010·19 cites·4 claims
- 0791US9562169B2Metal hardmask compositionsROHM & HAAS ELECT MAT·Filed 2015·Granted Feb 7, 2017·7 cites·15 claims
- 0891US8257902B2Compositons and processes for immersion lithographyWANG DEYAN·Filed 2008·Granted Sep 4, 2012·10 cites·10 claims
- 0991US7510639B2Leveler compoundsROHM & HAAS ELECT MAT·Filed 2005·Granted Mar 31, 2009·20 cites·5 claims
- 1090US8262891B2Leveler compoundsWANG DEYAN·Filed 2006·Granted Sep 11, 2012·7 cites·7 claims
- 1189US8871428B2Compositions and processes for immersion lithographyWANG DEYAN·Filed 2012·Granted Oct 28, 2014·4 cites·6 claims
- 1289US8506788B2Leveler compoundsWANG DEYAN·Filed 2012·Granted Aug 13, 2013·3 cites·7 claims
- 1387US8715902B2Compositions and processes for immersion lithographyWANG DEYAN·Filed 2009·Granted May 6, 2014·6 cites·21 claims
- 1486US9012128B2Photoresist and coated substrate comprising sameRohm and Hass Electronic Materials LLC·Filed 2013·Granted Apr 21, 2015·5 cites·7 claims
- 1586US8795774B2HardmaskROHM & HAAS ELECT MAT·Filed 2012·Granted Aug 5, 2014·5 cites·13 claims
- 1685US9382444B2Neutral layer polymers, methods of manufacture thereof and articles comprising the sameDOW GLOBAL TECHNOLOGIES LLC·Filed 2014·Granted Jul 5, 2016·3 cites·11 claims
- 1785US8722825B2Surface active additive and photoresist composition comprising sameWANG DEYAN·Filed 2012·Granted May 13, 2014·4 cites·6 claims
- 1884US8883400B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Nov 11, 2014·2 cites·16 claims
- 1983US9563128B2Compositions and processes for immersion lithographyROHM & HAAS ELECT MAT·Filed 2014·Granted Feb 7, 2017·2 cites·30 claims
- 2082US9102901B2Methods and compositions for removal of metal hardmasksROHM & HAAS ELECT MAT·Filed 2013·Granted Aug 11, 2015·5 cites·11 claims
- 2182US8012666B2Compositions and processes for photolithographyROHM & HAAS ELECT MAT·Filed 2007·Granted Sep 6, 2011·5 cites·12 claims
- 2281US9696622B2Compositions and processes for immersion lithographyWANG DEYAN·Filed 2011·Granted Jul 4, 2017·2 cites·33 claims
- 2381US9136123B2Hardmask surface treatmentROHM AND HAAS ELECTRONICS MATERIALS LLC·Filed 2013·Granted Sep 15, 2015·5 cites·16 claims
- 2480US8927439B1Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solventROHM & HAAS ELECT MAT·Filed 2013·Granted Jan 6, 2015·4 cites·11 claims
- 2578US11332559B2Polymers for display devicesROHM & HAAS ELECT MAT·Filed 2020·Granted May 17, 2022·1 cites·14 claims
- 2676US9171720B2Hardmask surface treatmentROHM & HAAS ELECT MAT·Filed 2013·Granted Oct 27, 2015·3 cites·11 claims
- 2775US10794866B2Acoustic wave sensors and methods of sensing a gas-phase analyteROHM & HAAS ELECT MAT·Filed 2019·Granted Oct 6, 2020·1 cites·16 claims
- 2874US10578969B2Photoresist topcoat compositions and methods of processing photoresist compositionsROHM & HAAS ELECT MAT·Filed 2019·Granted Mar 3, 2020·1 cites·13 claims
- 2974US9274427B2Compositions and processes for photolithographyROHM & HAAS ELECT MAT·Filed 2014·Granted Mar 1, 2016·2 cites·11 claims
- 3071US9868820B2Polyarylene materialsROHM & HAAS ELECT MAT·Filed 2014·Granted Jan 16, 2018·3 cites·10 claims
- 3169US12024640B2UV-curing resin compositions for hard coat applicationsROHM & HAAS ELECT MAT·Filed 2021·Granted Jul 2, 2024·0 cites·5 claims
- 3269US9188864B2Photoresist compositions and methods of forming photolithographic patternsBAE YOUNG CHEOL·Filed 2011·Granted Nov 17, 2015·2 cites·10 claims
- 3369US9158198B2Photoresist compositions and methods of forming photolithographic patternsROHM & HAAS ELECT MAT·Filed 2013·Granted Oct 13, 2015·1 cites·18 claims
- 3467US9122159B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Sep 1, 2015·1 cites·15 claims
- 3566US9070548B2Metal hardmask compositionsROHM & HAAS ELECT MAT·Filed 2013·Granted Jun 30, 2015·1 cites·20 claims
- 3665US9436082B2Compositions comprising base-reactive component and processes for photolithographyWANG DEYAN·Filed 2011·Granted Sep 6, 2016·1 cites·9 claims
- 3765US9005880B2Compositions comprising sulfonamide material and processes for photolithographyWANG DEYAN·Filed 2009·Granted Apr 14, 2015·1 cites·12 claims
- 3865US8975006B2Compositions comprising carboxy component and processes for photolithographyWANG DEYAN·Filed 2009·Granted Mar 10, 2015·1 cites·6 claims
- 3965US7955778B2Compositions and processes for photolithographyROHM & HAAS ELECT MAT·Filed 2009·Granted Jun 7, 2011·1 cites·18 claims
- 4064US8748080B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Jun 10, 2014·1 cites·10 claims
- 4162US9244355B2Compositions and processes for immersion lithographyCAPORALE STEFAN J·Filed 2007·Granted Jan 26, 2016·2 cites·15 claims
- 4261US2024152047A1High refractive index materialsROHM & HAAS ELECT MAT·Filed 2023·Application pending·0 cites
- 4361US2019346763A1Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithographyWANG DEYAN·Filed 2019·Application pending·0 cites
- 4460US11572476B2Anti-reflective coatingROHM & HAAS ELECT MAT·Filed 2020·Granted Feb 7, 2023·0 cites·8 claims
- 4560US10222699B2Compositions and processes for immersion lithographyROHM & HAAS ELECT MAT·Filed 2014·Granted Mar 5, 2019·0 cites·2 claims
- 4659US11999844B2Optically clear shear thickening fluids and optical display device comprising sameROHM & HAAS ELECT MAT·Filed 2021·Granted Jun 4, 2024·0 cites·14 claims
- 4759US10359698B2Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithographyWANG DEYAN·Filed 2009·Granted Jul 23, 2019·0 cites·8 claims
- 4857US8808967B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Aug 19, 2014·0 cites·15 claims
- 4956US2022214619A1Photoresist topcoat compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2021·Application pending·0 cites
- 5056US2022214616A1Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2021·Application pending·0 cites
Showing the top 50 of 84 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →