Inventor · disambiguated record

Tobias Hackl

Also filed as: HACKL TOBIAS

2 granted patents·2 citations·filing 2012–2015

38Inventor score

Technology areasG03F

Files withZEISS CARL SMT GMBH2

Top patents by PatentIndex Score

2 records

0166US8546776B2Optical system for EUV lithography with a charged-particle sourceZEISS CARL SMT GMBH·Filed 2012·Granted Oct 1, 2013·1 cites·11 claims
0265US9921483B2Surface correction of mirrors with decoupling coatingZEISS CARL SMT GMBH·Filed 2015·Granted Mar 20, 2018·1 cites·20 claims

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →