Inventor · disambiguated record
Ronald A. Weimer
Also filed as: WEIMER RONALD · WEIMER RONALD A · Weimer Ronald Allen
101 granted patents·15 pending applications·2,804 citations·filing 1994–2022
99Inventor score
Top patents by PatentIndex Score
116 records- 0199US7422635B2Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2003·Granted Sep 9, 2008·483 cites·17 claims
- 0299US6348380B1Use of dilute steam ambient for improvement of flash devicesMICRON TECHNOLOGY INC·Filed 2000·Granted Feb 19, 2002·325 cites·35 claims
- 0398US6462371B1Films doped with carbon for use in integrated circuit technologyMICRON TECHNOLOGY INC·Filed 1999·Granted Oct 8, 2002·269 cites·8 claims
- 0498US6455372B1Nucleation for improved flash erase characteristicsMICRON TECHNOLOGY INC·Filed 2000·Granted Sep 24, 2002·221 cites·53 claims
- 0597US8228743B2Memory cells containing charge-trapping zonesMIN KYU S·Filed 2011·Granted Jul 24, 2012·45 cites·7 claims
- 0696US6559007B1Method for forming flash memory device having a tunnel dielectric comprising nitrided oxideMICRON TECHNOLOGY INC·Filed 2000·Granted May 6, 2003·96 cites·19 claims
- 0795US7245010B2System and device including a barrier layerMICRON TECHNOLOGY INC·Filed 2005·Granted Jul 17, 2007·20 cites·2 claims
- 0894US7019351B2Transistor devices, and methods of forming transistor devices and circuit devicesMICRON TECHNOLOGY INC·Filed 2003·Granted Mar 28, 2006·74 cites·20 claims
- 0994US6815805B2Method of fabricating an integrated circuit with a dielectric layer exposed to a hydrogen-bearing nitrogen sourceMICRON TECHNOLOGY INC·Filed 2004·Granted Nov 9, 2004·56 cites·38 claims
- 1094US5634974AMethod for forming hemispherical grained siliconMICRON TECHNOLOGIES INC·Filed 1995·Granted Jun 3, 1997·101 cites·74 claims
- 1193US7898850B2Memory cells, electronic systems, methods of forming memory cells, and methods of programming memory cellsMICRON TECHNOLOGY INC·Filed 2007·Granted Mar 1, 2011·23 cites·14 claims
- 1293US6362086B2Forming a conductive structure in a semiconductor deviceMICRON TECHNOLOGY INC·Filed 1999·Granted Mar 26, 2002·108 cites·25 claims
- 1393US5759262AMethod of forming hemispherical grained siliconMICRON TECHNOLOGY INC·Filed 1997·Granted Jun 2, 1998·86 cites·26 claims
- 1492US9311268B1Method and system for communication with peripheral devicesQLOGIC CORP·Filed 2013·Granted Apr 12, 2016·16 cites·20 claims
- 1592US7647886B2Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambersMICRON TECHNOLOGY INC·Filed 2003·Granted Jan 19, 2010·45 cites·8 claims
- 1691US9704923B1Dual-layer dielectric in memory deviceINTEL CORP·Filed 2015·Granted Jul 11, 2017·6 cites·8 claims
- 1791US6544908B1Ammonia gas passivation on nitride encapsulated devicesMICRON TECHNOLOGY INC·Filed 2000·Granted Apr 8, 2003·40 cites·57 claims
- 1890US10629652B2Dual-layer dielectric in memory deviceINTEL CORP·Filed 2018·Granted Apr 21, 2020·5 cites·27 claims
- 1990US7173304B2Method of manufacturing devices comprising conductive nano-dots, and devices comprising sameMICRON TECHNOLOGY INC·Filed 2005·Granted Feb 6, 2007·26 cites·57 claims
- 2090US6475883B2Method for forming a barrier layerMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 5, 2002·29 cites·22 claims
- 2190US6410968B1Semiconductor device with barrier layerMICRON TECHNOLOGY INC·Filed 2000·Granted Jun 25, 2002·31 cites·11 claims
- 2289US6291868B1Forming a conductive structure in a semiconductor deviceMICRON TECHNOLOGY INC·Filed 1998·Granted Sep 18, 2001·76 cites·15 claims
- 2386US9424226B1Method and system for signal equalization in communication between computing devicesQLOGIC CORP·Filed 2013·Granted Aug 23, 2016·8 cites·20 claims
- 2486US7771537B2Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD depositionMICRON TECHNOLOGY INC·Filed 2006·Granted Aug 10, 2010·5 cites·13 claims
- 2586US7279398B2Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2006·Granted Oct 9, 2007·6 cites·12 claims
- 2685US10134809B2Dual-layer dielectric in memory deviceINTEL CORP·Filed 2017·Granted Nov 20, 2018·3 cites·7 claims
- 2785US7056806B2Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2003·Granted Jun 6, 2006·23 cites·31 claims
- 2885US5930106ADRAM capacitors made from silicon-germanium and electrode-limited conduction dielectric filmsMICRON TECHNOLOGY INC·Filed 1996·Granted Jul 27, 1999·51 cites·22 claims
- 2984US8153502B2Methods for filling trenches in a semiconductor materialLI LI·Filed 2006·Granted Apr 10, 2012·12 cites·30 claims
- 3081US7407892B2Deposition methodsMICRON TECHNOLOGY INC·Filed 2005·Granted Aug 5, 2008·3 cites·6 claims
- 3181US7264768B2Single substrate annealing of magnetoresistive structureMICRON TECHNOLOGY INC·Filed 2005·Granted Sep 4, 2007·8 cites·7 claims
- 3281US6150208ADRAM capacitors made from silicon-germanium and electrode-limited conduction dielectric filmsMICRON TECHNOLOGY INC·Filed 1998·Granted Nov 21, 2000·40 cites·19 claims
- 3379US7470583B2Method of improved high K dielectric-polysilicon interface for CMOS devicesMICRON TECHNOLOGY INC·Filed 2006·Granted Dec 30, 2008·4 cites·25 claims
- 3479US7258892B2Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD depositionMICRON TECHNOLOGY INC·Filed 2003·Granted Aug 21, 2007·13 cites·27 claims
- 3579US6596595B1Forming a conductive structure in a semiconductor deviceMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 22, 2003·16 cites·24 claims
- 3679US6592661B1Method for processing wafers in a semiconductor fabrication systemMICRON TECHNOLOGY INC·Filed 1998·Granted Jul 15, 2003·33 cites·76 claims
- 3779US6162737AFilms doped with carbon for use in integrated circuit technologyMICRON TECHNOLOGY INC·Filed 1999·Granted Dec 19, 2000·36 cites·36 claims
- 3878US7235138B2Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpiecesMICRON TECHNOLOGY INC·Filed 2003·Granted Jun 26, 2007·14 cites·20 claims
- 3977US6734531B2Use of selective oxidation conditions for dielectric conditioningMICRON TECHNOLOGY INC·Filed 2003·Granted May 11, 2004·13 cites·32 claims
- 4077US6696336B2Double sided container process used during the manufacture of a semiconductor deviceMICRON TECHNOLOGY INC·Filed 2001·Granted Feb 24, 2004·19 cites·20 claims
- 4176US8569130B2Forming air gaps in memory arrays and memory arrays with air gaps thus formedMATHEW JAMES·Filed 2011·Granted Oct 29, 2013·4 cites·28 claims
- 4275US7915126B2Methods of forming non-volatile memory cells, and methods of forming NAND cell unit string gatesMICRON TECHNOLOGY INC·Filed 2007·Granted Mar 29, 2011·4 cites·26 claims
- 4375US7081656B2CMOS constructionsMICRON TECHNOLOGY INC·Filed 2004·Granted Jul 25, 2006·15 cites·15 claims
- 4475US6576979B2Use of selective oxidation conditions for dielectric conditioningMICRON TECHNOLOGY INC·Filed 2002·Granted Jun 10, 2003·11 cites·20 claims
- 4575US6555487B1Method of selective oxidation conditions for dielectric conditioningMICRON TECHNOLOGY INC·Filed 2000·Granted Apr 29, 2003·12 cites·49 claims
- 4675US5962065AMethod of forming polysilicon having a desired surface roughnessMICRON TECHNOLOGY INC·Filed 1997·Granted Oct 5, 1999·39 cites·17 claims
- 4774US12484290B2Active area salicidation for NMOS and PMOS devicesMICRON TECHNOLOGY INC·Filed 2022·Granted Nov 25, 2025·0 cites·15 claims
- 4874US8384192B2Methods for forming small-scale capacitor structuresMICRON TECHNOLOGY INC·Filed 2011·Granted Feb 26, 2013·2 cites·22 claims
- 4974US7253053B2Methods of forming transistor devices and capacitor constructionsMICRON TECHNOLOGY INC·Filed 2004·Granted Aug 7, 2007·14 cites·21 claims
- 5072US7084448B2Double sided container process used during the manufacture of a semiconductor deviceMICRON TECHNOLOGY INC·Filed 2004·Granted Aug 1, 2006·14 cites·13 claims
Showing the top 50 of 116 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →