Inventor · disambiguated record
Ching-Shu Lo
Also filed as: LO CHING-SHU
6 granted patents·5 pending applications·4 citations·filing 2009–2024
69Inventor score
Top patents by PatentIndex Score
11 records- 0182US8938697B1Method of performing optical proximity correction for preparing mask projected onto wafer by photolithographyUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jan 20, 2015·3 cites·22 claims
- 0270US12204247B2Lithography film stack and lithography methodUNITED SEMICONDUCTOR XIAMEN CO LTD·Filed 2023·Granted Jan 21, 2025·0 cites·20 claims
- 0361US2025034696A1Target material structure and manufacturing method thereofUNITED SEMICONDUCTOR XIAMEN CO LTD·Filed 2023·Application pending·0 cites
- 0459US9256120B2Method of performing optical proximity correction for preparing mask projected onto wafer by photolithographyUNITED MICROELECTRONICS CORP·Filed 2014·Granted Feb 9, 2016·0 cites·18 claims
- 0558US2025371701A1Method for detecting defects of a semiconductor substrateUNITED SEMICONDUCTOR XIAMEN CO LTD·Filed 2024·Application pending·0 cites
- 0655US2025087466A1Processing apparatus and processing methodUNITED SEMICONDUCTOR XIAMEN CO LTD·Filed 2023·Application pending·0 cites
- 0752US12020932B2Photoresist coating methodUNITED SEMICONDUCTOR XIAMEN CO LTD·Filed 2022·Granted Jun 25, 2024·0 cites·8 claims
- 0851US2024221241A1Wafer Image Equalization Method and ApparatusUNITED SEMICONDUCTOR XIAMEN CO LTD·Filed 2023·Application pending·0 cites
- 0950US2024047278A1Method for detecting back surface of waferUNITED SEMICONDUCTOR XIAMEN CO LTD·Filed 2022·Application pending·0 cites
- 1049US8233142B2Monitoring method of exposure apparatusJIANG DA-BAI·Filed 2009·Granted Jul 31, 2012·1 cites·16 claims
- 1144US9147033B2Method of making photomask layout and method of forming photomask including the photomask layoutUNITED MICROELECTRONICS CORP·Filed 2013·Granted Sep 29, 2015·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →