Inventor · disambiguated record
David (Tawei) Lin
Also filed as: LIN DAVID (TAWEI)
4 granted patents·0 citations·filing 2019–2022
56Inventor score
Technology areasH10P
Files withFUJIFILM ELECTRONIC MAT USA INC4
Top patents by PatentIndex Score
4 records- 0163US11505718B2Barrier ruthenium chemical mechanical polishing slurryFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Granted Nov 22, 2022·0 cites·25 claims
- 0262US11999876B2Bulk ruthenium chemical mechanical polishing compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted Jun 4, 2024·0 cites·10 claims
- 0355US11034859B2Barrier ruthenium chemical mechanical polishing slurryFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Jun 15, 2021·0 cites·32 claims
- 0454US11279850B2Bulk ruthenium chemical mechanical polishing compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Mar 22, 2022·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →