Inventor · disambiguated record
Bernard J. Roman
Also filed as: ROMAN BERNARD J · ROMAN BERNARD JOHN
22 granted patents·3 pending applications·1,296 citations·filing 1981–2010
97Inventor score
Files withMOTOROLA INC13FREESCALE SEMICONDUCTOR INC4ROMAN BERNARD J3BELL TELEPHONE LABOR INC2RECKER MICHAEL J1
Top patents by PatentIndex Score
25 records- 0197US5900340AOne dimensional lithographic proximity correction using DRC shape functionsMOTOROLA INC·Filed 1997·Granted May 4, 1999·269 cites·14 claims
- 0293US5219793AMethod for forming pitch independent contacts and a semiconductor device having the sameMOTOROLA INC·Filed 1991·Granted Jun 15, 1993·149 cites·24 claims
- 0392US5534462AMethod for forming a plug and semiconductor device having the sameMOTOROLA INC·Filed 1995·Granted Jul 9, 1996·135 cites·25 claims
- 0490US5639687AMethod for forming an integrated circuit pattern on a semiconductor substrate using silicon-rich silicon nitrideMOTOROLA INC·Filed 1996·Granted Jun 17, 1997·90 cites·20 claims
- 0589US6586160B2Method for patterning resistMOTOROLA INC·Filed 2001·Granted Jul 1, 2003·43 cites·18 claims
- 0689US4959326AFabricating T-gate MESFETS employing double exposure, double develop techniquesSIEMENS AG·Filed 1988·Granted Sep 25, 1990·65 cites·20 claims
- 0787US5920487ATwo dimensional lithographic proximity correction using DRC shape functionsMOTOROLA INC·Filed 1997·Granted Jul 6, 1999·70 cites·20 claims
- 0886US5918147AProcess for forming a semiconductor device with an antireflective layerMOTOROLA INC·Filed 1995·Granted Jun 29, 1999·89 cites·42 claims
- 0985US5538922AMethod for forming contact to a semiconductor deviceMOTOROLA INC·Filed 1995·Granted Jul 23, 1996·74 cites·62 claims
- 1084US5378659AMethod and structure for forming an integrated circuit pattern on a semiconductor substrateMOTOROLA INC·Filed 1993·Granted Jan 3, 1995·69 cites·34 claims
- 1181US5525542AMethod for making a semiconductor device having anti-reflective coatingMOTOROLA INC·Filed 1995·Granted Jun 11, 1996·65 cites·17 claims
- 1279US8230628B2Apparatus and method for attaching signs to concrete road barriersRECKER MICHAEL J·Filed 2010·Granted Jul 31, 2012·8 cites·17 claims
- 1379US5827625AMethods of designing a reticle and forming a semiconductor device therewithMOTOROLA INC·Filed 1997·Granted Oct 27, 1998·45 cites·34 claims
- 1475US4373018AMultiple exposure microlithography patterning methodBELL TELEPHONE LABOR INC·Filed 1981·Granted Feb 8, 1983·26 cites·6 claims
- 1571US5539249AMethod and structure for forming an integrated circuit pattern on a semiconductor substrateMOTOROLA INC·Filed 1994·Granted Jul 23, 1996·36 cites·25 claims
- 1667US5292623AMethod for forming integrated circuit devices using a phase shifting maskMOTOROLA INC·Filed 1992·Granted Mar 8, 1994·21 cites·15 claims
- 1759US5085230ASmoker's applianceROMAN BERNARD J·Filed 1990·Granted Feb 4, 1992·29 cites·23 claims
- 1852US6797440B2Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor deviceFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Sep 28, 2004·3 cites·22 claims
- 1948US2007039627A1Smoker's applianceROMAN BERNARD J·Filed 2006·Application pending·0 cites
- 2046USD323778SDoor stopROMAN BERNARD J·Filed 1990·Granted Feb 11, 1992·5 cites·1 claims
- 2141US7732102B2Cr-capped chromeless phase lithographyFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Jun 8, 2010·0 cites·15 claims
- 2241US2007015089A1Method of making a semiconductor device using a dual-tone phase shift maskFREESCALE SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 2339US2007243491A1Method of making a semiconductor with a high transmission CVD silicon nitride phase shift maskWU WEI E·Filed 2006·Application pending·0 cites
- 2438US7018747B2Photomask having line end phase anchorsFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Mar 28, 2006·0 cites·20 claims
- 2537US4334950AAdvantageous fabrication technique for devices relying on magnetic propertiesBELL TELEPHONE LABOR INC·Filed 1981·Granted Jun 15, 1982·5 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →