Inventor · disambiguated record
Masakazu Shimada
Also filed as: SHIMADA MASAKAZU
26 granted patents·3 pending applications·965 citations·filing 1993–2025
96Inventor score
Files withHITACHI INT ELECTRIC INC7KOKUSAI ELECTRIC CORP4OLYMPUS OPTICAL CO4HAYASHIDA AKIRA3KOKUSAI ELECTRIC CO LTD3
Top patents by PatentIndex Score
29 records- 0196US8501599B2Substrate processing apparatus and substrate processing methodUENO MASAAKI·Filed 2007·Granted Aug 6, 2013·470 cites·19 claims
- 0295US6563634B2Microscope with aberration correcting functionOLYMPUS OPTICAL CO·Filed 2001·Granted May 13, 2003·91 cites·5 claims
- 0394US6025956AIncident-light fluorescence microscopeOLYMPUS OPTICAL CO·Filed 1996·Granted Feb 15, 2000·168 cites·27 claims
- 0492US11293096B2Substrate processing apparatus, method for manufacturing semiconductor device and vaporizerHITACHI INT ELECTRIC INC·Filed 2018·Granted Apr 5, 2022·8 cites·12 claims
- 0591US8148271B2Substrate processing apparatus, coolant gas supply nozzle and semiconductor device manufacturing methodUENO MASAAKI·Filed 2006·Granted Apr 3, 2012·22 cites·20 claims
- 0688US8030599B2Substrate processing apparatus, heating device, and semiconductor device manufacturing methodHITACHI INT ELECTRIC INC·Filed 2009·Granted Oct 4, 2011·12 cites·15 claims
- 0783US6043475AFocal point adjustment apparatus and method applied to microscopesOLYMPUS OPTICAL CO·Filed 1997·Granted Mar 28, 2000·71 cites·4 claims
- 0882US10876207B2Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2019·Granted Dec 29, 2020·3 cites·11 claims
- 0976US7700054B2Substrate processing apparatus having gas side flow via gas inletHITACHI INT ELECTRIC INC·Filed 2007·Granted Apr 20, 2010·5 cites·12 claims
- 1075US8507296B2Substrate processing method and film forming methodUENO MASAAKI·Filed 2009·Granted Aug 13, 2013·4 cites·16 claims
- 1173US5735961ASemiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxideKOKUSAI ELECTRIC CO LTD·Filed 1996·Granted Apr 7, 1998·38 cites·7 claims
- 1271US11970771B2Vaporizer, substrate processing apparatus and method for manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2022·Granted Apr 30, 2024·0 cites·22 claims
- 1371US11031270B2Substrate processing apparatus, substrate holder and mounting toolKOKUSAI ELECTRIC CORP·Filed 2018·Granted Jun 8, 2021·1 cites·9 claims
- 1470US9437421B2Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Granted Sep 6, 2016·2 cites·10 claims
- 1569US8303712B2Substrate processing apparatus, method for manufacturing semiconductor device, and process tubeNAKASHIMA SEIYO·Filed 2009·Granted Nov 6, 2012·3 cites·15 claims
- 1668US8876453B2Substrate processing apparatus and method of manufacturing semiconductor deviceABURATANI YUKINORI·Filed 2011·Granted Nov 4, 2014·2 cites·6 claims
- 1768US7863204B2Substrate processing apparatus, heating apparatus for use in the same, method of manufacturing semiconductors with those apparatuses, and heating element supporting structureHITACHI INT ELECTRIC INC·Filed 2006·Granted Jan 4, 2011·3 cites·22 claims
- 1867US8158911B2Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending memberHAYASHIDA AKIRA·Filed 2008·Granted Apr 17, 2012·3 cites·19 claims
- 1963US8116618B2Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devicesHAYASHIDA AKIRA·Filed 2008·Granted Feb 14, 2012·2 cites·14 claims
- 2058US9184069B2Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulatorHAYASHIDA AKIRA·Filed 2008·Granted Nov 10, 2015·1 cites·18 claims
- 2154US2025191963A1Substrate processing apparatus, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 2253US5277215AMethod for supplying and discharging gas to and from semiconductor manufacturing equipment and system for executing the sameKOKUSAI ELECTRIC CO LTD·Filed 1993·Granted Jan 11, 1994·27 cites·16 claims
- 2349US2010229416A1Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2009·Application pending·0 cites
- 2447US5879415ASemiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxideKOKUSAI ELECTRIC CO LTD·Filed 1998·Granted Mar 9, 1999·11 cites·6 claims
- 2544US5516436AAgent for treating textile materialsNICCA CHEMICAL CO·Filed 1994·Granted May 14, 1996·11 cites·3 claims
- 2644US2008087218A1Board processing apparatus and method of fabricating semiconductor apparatusHITACHI INT ELECTRIC INC·Filed 2007·Application pending·0 cites
- 2735US6034815ALaser scan microscopeOLYMPUS OPTICAL CO·Filed 1999·Granted Mar 7, 2000·5 cites·6 claims
- 2828USD652395SSemiconductor manufacturing equipmentSHIMADA MASAKAZU·Filed 2010·Granted Jan 17, 2012·1 cites·1 claims
- 2928USD651990SSemiconductor manufacturing equipmentSHIMADA MASAKAZU·Filed 2010·Granted Jan 10, 2012·1 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →