Inventor · disambiguated record
Yoshihiro Hirota
Also filed as: HIROTA YOSHIHIRO
29 granted patents·12 pending applications·344 citations·filing 1991–2022
96Inventor score
Top patents by PatentIndex Score
41 records- 0191US6828806B1Electrostatic capacitance sensor, electrostatic capacitance sensor component, object mounting body and object mounting apparatusSUMITOMO METAL IND·Filed 2000·Granted Dec 7, 2004·40 cites·12 claims
- 0287US7742277B2Dielectric film capacitor and method of manufacturing the sameIBIDEN COMPANY LTD·Filed 2006·Granted Jun 22, 2010·17 cites·18 claims
- 0387US6373264B1Impedance detection apparatus and method of physical variableSUMITOMO METAL IND·Filed 1999·Granted Apr 16, 2002·82 cites·21 claims
- 0483US8258571B2MOS semiconductor memory device having charge storage region formed from stack of insulating filmsENDOH TETSUO·Filed 2008·Granted Sep 4, 2012·11 cites·19 claims
- 0577US6335642B1Impedance-to-voltage converterSUMITOMO METAL IND·Filed 1999·Granted Jan 1, 2002·35 cites·18 claims
- 0675US6756790B2Impedance detection circuit, impedance detection device, and impedance detection methodTOKYO ELECTRON LTD·Filed 2001·Granted Jun 29, 2004·19 cites·29 claims
- 0769US6861552B2Adamantyl ester monomer compositionTOKUYAMA CORP·Filed 2001·Granted Mar 1, 2005·4 cites·21 claims
- 0869US6348809B1Microscopic capacitance measurement system and probing systemSUMITOMO METAL IND·Filed 1999·Granted Feb 19, 2002·29 cites·8 claims
- 0967US6331780B1Static capacitance-to-voltage converter and converting methodSUMITOMO METAL IND·Filed 1999·Granted Dec 18, 2001·24 cites·24 claims
- 1067US6034549ALevel shift circuitSUMITOMO METAL IND·Filed 1997·Granted Mar 7, 2000·21 cites·13 claims
- 1166US6326795B1Capacitance detection system and methodSUMITOMO METAL IND·Filed 1999·Granted Dec 4, 2001·20 cites·12 claims
- 1262US7161360B2Electrostatic capacitance sensor, electrostatic capacitance sensor component, object mounting body and object mounting apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Jan 9, 2007·7 cites·18 claims
- 1355US2024412970A1Manufacturing method for semiconductor deviceTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1454US8076892B2Stator position adjustment method, motor drive device and stator position adjustment systemOGURI YASUNORI·Filed 2008·Granted Dec 13, 2011·3 cites·26 claims
- 1554US2024387176A1Stacked substrate for laser lift-off, substrate processing method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1649US10748782B2Method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2018·Granted Aug 18, 2020·0 cites·10 claims
- 1747US2014034893A1Switch device and crossbar memory array using sameTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1847US2010176441A1Semiconductor memory device and manufacturing method thereforTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1946US6770777B2Process for producing 2-alkyl-2-adamantyl esterTOKUYAMA CORP·Filed 2001·Granted Aug 3, 2004·0 cites·4 claims
- 2046US2010140683A1Silicon nitride film and nonvolatile semiconductor memory deviceTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2145US8318614B2Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatusKOHNO MASAYUKI·Filed 2008·Granted Nov 27, 2012·0 cites·14 claims
- 2244US7897498B2Method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·0 cites·9 claims
- 2344US6194888B1Impedance-to-voltage converter and converting methodSUMITOMO METAL IND·Filed 1999·Granted Feb 27, 2001·11 cites·10 claims
- 2443US7071352B2Processes for preparation of 2-alkyl-2-adamantyl estersTOKUYAMA CORP·Filed 2001·Granted Jul 4, 2006·0 cites·7 claims
- 2541US2014162428A1Method for fabricating phase change memoryTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2640US2007184379A1Peeling-off method and reworking method of resist filmTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2739US6696595B2Process of the preparation of high-purity alkyladamantyl estersTOKUYAMA CORP·Filed 2001·Granted Feb 24, 2004·0 cites·9 claims
- 2839US2014038430A1Method for processing objectTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2938US7026504B2Process for preparing alkyladamantyl esters and compositionsTOKUYAMA CORP·Filed 2001·Granted Apr 11, 2006·0 cites·11 claims
- 3036US6781016B2Process for the preparation of alicyclic ketones and an alkyl-substituted alicyclic estersTOKUYAMA CORP·Filed 2001·Granted Aug 24, 2004·0 cites·2 claims
- 3136US5892266ALayout structure of capacitive element(s) and interconnections in a semiconductorSUMITOMO METAL IND·Filed 1997·Granted Apr 6, 1999·4 cites·5 claims
- 3236US2012184107A1Semiconductor device manufacturing methodSATO YOSHIHIRO·Filed 2010·Application pending·0 cites
- 3335US8247289B2Capacitor and manufacturing method thereofYAMANISHI YOSHIKI·Filed 2006·Granted Aug 21, 2012·0 cites·6 claims
- 3435US5973538ASensor circuitSUMITOMO MEDAL IND LTD·Filed 1997·Granted Oct 26, 1999·8 cites·7 claims
- 3535US2011053381A1Method for modifying insulating film with plasmaTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 3634US5305176AInductive load drive circuitNEC CORP·Filed 1991·Granted Apr 19, 1994·2 cites·3 claims
- 3734US5217849AProcess for making a two-layer film carrierSUMITOMO METAL MINING CO·Filed 1992·Granted Jun 8, 1993·7 cites·6 claims
- 3833US8687405B2Phase change memory and method for fabricating phase change memoryNAKABAYASHI HAJIME·Filed 2012·Granted Apr 1, 2014·0 cites·6 claims
- 3933US2017287727A1Metal hard mask and method of manufacturing sameTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 4032US8241982B2Semiconductor device manufacturing methodHIROTA YOSHIHIRO·Filed 2010·Granted Aug 14, 2012·0 cites·10 claims
- 4130US2007181556A1Capacitor and manufacturing method thereofYAMANISHI YOSHIKI·Filed 2006·Application pending·0 cites
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