Inventor · disambiguated record
David Fuard
Also filed as: FUARD DAVID
2 granted patents·24 citations·filing 2000–2001
60Inventor score
Top patents by PatentIndex Score
2 records- 0168US6326302B1Process for the anisotropic etching of an organic dielectric polymer material by a plasma gas and application in microelectronicsFRANCE TELECOM·Filed 2000·Granted Dec 4, 2001·15 cites·20 claims
- 0253US6818488B2Process for making a gate for a short channel CMOS transistor structureCOMMISSARIAT ENERGIE ATOMIQUE·Filed 2001·Granted Nov 16, 2004·9 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →