Inventor · disambiguated record
Kancharla-Arun Kumar Reddy
Also filed as: REDDY KANCHARLA-ARUN · REDDY KANCHARLA-ARUN K · REDDY KANCHARLA-ARUN KUMAR
19 granted patents·2 pending applications·46 citations·filing 2009–2021
91Inventor score
Top patents by PatentIndex Score
21 records- 0193US11679531B2Chemical mechanical polishing pad and preparation thereofROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Jun 20, 2023·2 cites·9 claims
- 0286US8492277B2Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitrideGUO YI·Filed 2010·Granted Jul 23, 2013·9 cites·18 claims
- 0385US8025813B2Chemical mechanical polishing composition and methods relating theretoROHM & HAAS ELECT MAT·Filed 2009·Granted Sep 27, 2011·11 cites·10 claims
- 0480US10464187B2High removal rate chemical mechanical polishing pads from amine initiated polyol containing curativesROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 5, 2019·1 cites·10 claims
- 0579US8790160B2Chemical mechanical polishing composition and method for polishing phase change alloysLEE JAESEOK·Filed 2011·Granted Jul 29, 2014·4 cites·8 claims
- 0679US8513126B2Slurry composition having tunable dielectric polishing selectivity and method of polishing a substrateLIU ZHENDONG·Filed 2010·Granted Aug 20, 2013·5 cites·9 claims
- 0779US8431490B2Method of chemical mechanical polishing a substrate with polishing composition adapted to enhance silicon oxide removalGUO YI·Filed 2010·Granted Apr 30, 2013·5 cites·3 claims
- 0874US8232208B2Stabilized chemical mechanical polishing composition and method of polishing a substrateGUO YI·Filed 2010·Granted Jul 31, 2012·3 cites·10 claims
- 0972US8440094B1Method of polishing a substrateGUO YI·Filed 2011·Granted May 14, 2013·3 cites·10 claims
- 1065US8444728B2Stabilized chemical mechanical polishing composition and method of polishing a substrateGUO YI·Filed 2012·Granted May 21, 2013·1 cites·8 claims
- 1161US8309468B1Chemical mechanical polishing composition and method for polishing germanium-antimony-tellurium alloysLEE JAESEOK·Filed 2011·Granted Nov 13, 2012·1 cites·8 claims
- 1260US8435420B1Method of polishing using tunable polishing formulationGUO YI·Filed 2011·Granted May 7, 2013·1 cites·10 claims
- 1354US12220784B2Chemical mechanical polishing pad and preparation thereofROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Feb 11, 2025·0 cites·8 claims
- 1446US10221336B2Aqueous silica slurry compositions for use in shallow trench isolation and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 5, 2019·0 cites·10 claims
- 1545US11524390B2Methods of making chemical mechanical polishing layers having improved uniformityROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 13, 2022·0 cites·6 claims
- 1645US10316218B2Aqueous silica slurry compositions for use in shallow trench isolation and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Jun 11, 2019·0 cites·6 claims
- 1737US8568610B2Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrateLIU ZHENDONG·Filed 2010·Granted Oct 29, 2013·0 cites·7 claims
- 1837US8496843B2Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitrideGUO YI·Filed 2010·Granted Jul 30, 2013·0 cites·18 claims
- 1937US2012001118A1Polishing slurry for chalcogenide alloyKOO JA-HO·Filed 2010·Application pending·0 cites
- 2037US2012003834A1Method Of Polishing Chalcogenide AlloyKOO JA-HO·Filed 2010·Application pending·0 cites
- 2136US8491808B2Method of polishing a substrate comprising polysilicon, silicon oxide and silicon nitrideGUO YI·Filed 2010·Granted Jul 23, 2013·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →