Inventor · disambiguated record
Yasuhiko Akamatsu
Also filed as: AKAMATSU YASUHIKO
5 granted patents·6 pending applications·5 citations·filing 2005–2019
68Inventor score
Top patents by PatentIndex Score
11 records- 0168US7863125B2Manufacturing method of CMOS type semiconductor device, and CMOS type semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2009·Granted Jan 4, 2011·3 cites·7 claims
- 0264US11935936B2Aluminum alloy film, method of producing the same, and thin film transistorULVAC INC·Filed 2019·Granted Mar 19, 2024·1 cites·7 claims
- 0362US8172993B2Magnetron sputtering electrode, and sputtering apparatus provided with magnetron sputtering electrodeAKAMATSU YASUHIKO·Filed 2007·Granted May 8, 2012·1 cites·13 claims
- 0458US2011195562A1Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect TransistorULVAC INC·Filed 2009·Application pending·0 cites
- 0558US2011198213A1Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect TransistorULVAC INC·Filed 2009·Application pending·0 cites
- 0646US7569890B2Manufacturing method of CMOS type semiconductor device, and CMOS type semiconductor deviceRENESAS TECH CORP·Filed 2006·Granted Aug 4, 2009·0 cites·4 claims
- 0745US2011180402A1Vacuum Processing ApparatusULVAC INC·Filed 2009·Application pending·0 cites
- 0843US2011201150A1Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect TransistorULVAC INC·Filed 2009·Application pending·0 cites
- 0935US8221594B2Magnetron sputtering apparatus and magnetron sputtering methodAKAMATSU YASUHIKO·Filed 2010·Granted Jul 17, 2012·0 cites·5 claims
- 1033US2021140032A1Aluminum alloy target and method of producing the sameULVAC INC·Filed 2019·Application pending·0 cites
- 1130US2007210352A1Semiconductor Device And Method Of Manufacturing The SameAKAMATSU YASUHIKO·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →