Inventor · disambiguated record
Michael S. Cox
Also filed as: COX MICHAEL · COX MICHAEL S · COX MICHAEL SANTIAGO
68 granted patents·16 pending applications·3,423 citations·filing 1997–2021
99Inventor score
Top patents by PatentIndex Score
84 records- 0199US7399388B2Sequential gas flow oxide deposition techniqueAPPLIED MATERIALS INC·Filed 2003·Granted Jul 15, 2008·622 cites·28 claims
- 0299US6863019B2Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gasAPPLIED MATERIALS INC·Filed 2002·Granted Mar 8, 2005·608 cites·6 claims
- 0398US8129290B2Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cureBALSEANU MIHAELA·Filed 2006·Granted Mar 6, 2012·492 cites·16 claims
- 0498US6869880B2In situ application of etch back for improved deposition into high-aspect-ratio featuresAPPLIED MATERIALS INC·Filed 2002·Granted Mar 22, 2005·241 cites·13 claims
- 0598US6418874B1Toroidal plasma source for plasma processingAPPLIED MATERIALS INC·Filed 2000·Granted Jul 16, 2002·272 cites·19 claims
- 0697US6755150B2Multi-core transformer plasma sourceAPPLIED MATERIALS INC·Filed 2001·Granted Jun 29, 2004·79 cites·10 claims
- 0797US6450117B1Directing a flow of gas in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2000·Granted Sep 17, 2002·572 cites·61 claims
- 0896US11011356B2Sputtering target with backside cooling groovesAPPLIED MATERIALS INC·Filed 2020·Granted May 18, 2021·3 cites·20 claims
- 0996US9580796B2Deposition apparatus and methods to reduce deposition asymmetryRITCHIE ALAN·Filed 2011·Granted Feb 28, 2017·31 cites·7 claims
- 1096US9240308B2Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing systemAPPLIED MATERIALS INC·Filed 2014·Granted Jan 19, 2016·17 cites·11 claims
- 1195US9735037B2Locally heated multi-zone substrate supportAPPLIED MATERIALS INC·Filed 2016·Granted Aug 15, 2017·11 cites·17 claims
- 1294US9230780B2Hall effect enhanced capacitively coupled plasma sourceAPPLIED MATERIALS INC·Filed 2014·Granted Jan 5, 2016·14 cites·20 claims
- 1393US9649592B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2015·Granted May 16, 2017·11 cites·11 claims
- 1493US9552967B2Abatement system having a plasma sourceAPPLIED MATERIALS INC·Filed 2016·Granted Jan 24, 2017·7 cites·16 claims
- 1593US7363876B2Multi-core transformer plasma sourceAPPLIED MATERIALS INC·Filed 2004·Granted Apr 29, 2008·37 cites·8 claims
- 1691US9472434B2Locally heated multi-zone substrate supportAPPLIED MATERIALS INC·Filed 2014·Granted Oct 18, 2016·9 cites·16 claims
- 1791US7097886B2Deposition process for high aspect ratio trenchesAPPLIED MATERIALS INC·Filed 2002·Granted Aug 29, 2006·56 cites·19 claims
- 1890US10187966B2Method and apparatus for gas abatementAPPLIED MATERIALS INC·Filed 2016·Granted Jan 22, 2019·8 cites·17 claims
- 1990US6841006B2Atmospheric substrate processing apparatus for depositing multiple layers on a substrateAPPLIED MATERIALS INC·Filed 2001·Granted Jan 11, 2005·46 cites·11 claims
- 2090US6693050B1Gapfill process using a combination of spin-on-glass deposition and chemical vapor deposition techniquesAPPLIED MATERIALS INC·Filed 2003·Granted Feb 17, 2004·56 cites·19 claims
- 2188US9779920B2Sputtering target with backside cooling groovesAPPLIED MATERIALS INC·Filed 2014·Granted Oct 3, 2017·5 cites·23 claims
- 2288US9543124B2Capacitively coupled plasma source for abating compounds produced in semiconductor processesAPPLIED MATERIALS INC·Filed 2015·Granted Jan 10, 2017·4 cites·20 claims
- 2388US6364958B1Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridgesAPPLIED MATERIALS INC·Filed 2000·Granted Apr 2, 2002·43 cites·18 claims
- 2487US9984912B2Locally heated multi-zone substrate supportAPPLIED MATERIALS INC·Filed 2017·Granted May 29, 2018·4 cites·20 claims
- 2587US9508584B2In-situ removable electrostatic chuckAPPLIED MATERIALS INC·Filed 2014·Granted Nov 29, 2016·6 cites·20 claims
- 2686US10763090B2High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 1, 2020·3 cites·19 claims
- 2786US9754771B2Encapsulated magnetronAPPLIED MATERIALS INC·Filed 2014·Granted Sep 5, 2017·6 cites·14 claims
- 2885USD1017361SDrillBLACK & DECKER INC·Filed 2021·Granted Mar 12, 2024·10 cites·1 claims
- 2984US9867238B2Apparatus for treating an exhaust gas in a forelineAPPLIED MATERIALS INC·Filed 2013·Granted Jan 9, 2018·7 cites·13 claims
- 3084US9711386B2Electrostatic chuck for high temperature process applicationsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 18, 2017·5 cites·20 claims
- 3184US8753989B2Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cureBALSEANU MIHAELA·Filed 2012·Granted Jun 17, 2014·5 cites·14 claims
- 3283US10153143B2Smart chamber and smart chamber componentsAPPLIED MATERIALS INC·Filed 2015·Granted Dec 11, 2018·3 cites·20 claims
- 3383US9790589B2Gas cooled substrate support for stabilized high temperature depositionAPPLIED MATERIALS INC·Filed 2015·Granted Oct 17, 2017·3 cites·20 claims
- 3483US8887901B2Conveyor sprocket assemblyCOX MICHAEL S·Filed 2012·Granted Nov 18, 2014·8 cites·22 claims
- 3581US6712020B2Toroidal plasma source for plasma processingAPPLIED MATERIALS INC·Filed 2002·Granted Mar 30, 2004·15 cites·9 claims
- 3680US9773692B2In-situ removable electrostatic chuckAPPLIED MATERIALS INC·Filed 2016·Granted Sep 26, 2017·2 cites·20 claims
- 3780US6894474B2Non-intrusive plasma probeAPPLIED MATERIALS INC·Filed 2002·Granted May 17, 2005·38 cites·42 claims
- 3879US10714321B2Sputtering target with backside cooling groovesAPPLIED MATERIALS INC·Filed 2018·Granted Jul 14, 2020·1 cites·20 claims
- 3978US10049863B2Sputtering target with backside cooling groovesAPPLIED MATERIALS INC·Filed 2017·Granted Aug 14, 2018·1 cites·20 claims
- 4077US10449486B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2017·Granted Oct 22, 2019·1 cites·12 claims
- 4177US7718045B2Ground shield with reentrant featureAPPLIED MATERIALS INC·Filed 2006·Granted May 18, 2010·4 cites·18 claims
- 4276US8486242B2Deposition apparatus and methods to reduce deposition asymmetryCOX MICHAEL S·Filed 2010·Granted Jul 16, 2013·1 cites·13 claims
- 4375US9536768B2Electrostatic carrier for thin substrate handlingAPPLIED MATERIALS INC·Filed 2014·Granted Jan 3, 2017·2 cites·20 claims
- 4474US11185815B2Plasma abatement of compounds containing heavy atomsAPPLIED MATERIALS INC·Filed 2018·Granted Nov 30, 2021·1 cites·16 claims
- 4574US10344375B2Gas cooled substrate support for stabilized high temperature depositionAPPLIED MATERIALS INC·Filed 2017·Granted Jul 9, 2019·1 cites·20 claims
- 4673US10757797B2Method and apparatus for gas abatementAPPLIED MATERIALS INC·Filed 2018·Granted Aug 25, 2020·1 cites·18 claims
- 4772US9460950B2Wafer carrier for smaller wafers and wafer piecesAPPLIED MATERIALS INC·Filed 2013·Granted Oct 4, 2016·2 cites·13 claims
- 4872US7399707B2In situ application of etch back for improved deposition into high-aspect-ratio featuresAPPLIED MATERIALS INC·Filed 2005·Granted Jul 15, 2008·3 cites·7 claims
- 4971US7189639B2Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide for semiconductor dielectric applicationsAPPLIED MATERIALS INC·Filed 2005·Granted Mar 13, 2007·3 cites·32 claims
- 5069US10580626B2Arcing detection apparatus for plasma processingAPPLIED MATERIALS INC·Filed 2016·Granted Mar 3, 2020·1 cites·14 claims
Showing the top 50 of 84 patent records by PatentIndex Score.
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