Inventor · disambiguated record
Vasily Pashkovskiy
Also filed as: PASHKOVSKIY VASILY · PASHKOVSKIY VASILY GRIGORIEVICH
8 granted patents·8 pending applications·19 citations·filing 2006–2022
81Inventor score
Top patents by PatentIndex Score
16 records- 0188US11798788B2Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathodeSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 24, 2023·2 cites·20 claims
- 0285US9601397B1Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the systemSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Mar 21, 2017·4 cites·20 claims
- 0384US10410874B2Plasma processing apparatus and method, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Sep 10, 2019·5 cites·7 claims
- 0483US9136094B2Method of plasma processing and apparatuses using the methodCHO JUNG HYUN·Filed 2013·Granted Sep 15, 2015·6 cites·18 claims
- 0575US10950414B2Plasma processing apparatus and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 16, 2021·2 cites·14 claims
- 0662US12087550B2Device for measuring density of plasma, plasma processing system, and semiconductor device manufacturing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Sep 10, 2024·0 cites·19 claims
- 0751US10566176B2Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the systemSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Feb 18, 2020·0 cites·19 claims
- 0850US2010065215A1Plasma generating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 0949US2019122867A1Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathodeSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 1046US2008314318A1Plasma processing apparatus and method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1142US2008289576A1Plasma based ion implantation systemSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1241US2008023653A1Plasma based ion implantation apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1339US7804250B2Apparatus and method to generate plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 28, 2010·0 cites·36 claims
- 1438US2008032427A1Ion analysis system based on analyzer of ion energy distribution using retarded electric fieldSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1537US2012007503A1Plasma Generating ApparatusKIM HYUNGJOON·Filed 2011·Application pending·0 cites
- 1629US2015206716A1Plasma generating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →