Inventor · disambiguated record
Kazuteru Obara
Also filed as: OBARA KAZUTERU
8 granted patents·4 pending applications·13 citations·filing 2009–2023
76Inventor score
Top patents by PatentIndex Score
12 records- 0189US8961691B2Film deposition apparatus, film deposition method, computer readable storage medium for storing a program causing the apparatus to perform the methodKATO HITOSHI·Filed 2009·Granted Feb 24, 2015·11 cites·6 claims
- 0277US10431479B2Heat treatment apparatus and temperature control methodTOKYO ELECTRON LTD·Filed 2018·Granted Oct 1, 2019·2 cites·8 claims
- 0359US12196492B2Heat treatment apparatus and heat treatment methodTOKYO ELECTRON LTD·Filed 2022·Granted Jan 14, 2025·0 cites·15 claims
- 0459US2010151131A1Film deposition apparatus, film deposition method, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 0557US11656126B2Heat treatment apparatus and temperature control methodTOKYO ELECTRON LTD·Filed 2019·Granted May 23, 2023·0 cites·5 claims
- 0656US2023417488A1Heat treatment apparatus and temperature regulation method of heat treatment apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0751US11674224B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jun 13, 2023·0 cites·14 claims
- 0849US11581201B2Heat treatment apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2020·Granted Feb 14, 2023·0 cites·16 claims
- 0948US10533896B2Heat treatment apparatus and temperature control methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 14, 2020·0 cites·4 claims
- 1047US2010068893A1Film deposition apparatus, film deposition method, and computer readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1143US11784070B2Heat treatment apparatus, heat treatment method, and film forming methodTOKYO ELECTRON LTD·Filed 2020·Granted Oct 10, 2023·0 cites·15 claims
- 1234US2017003171A1Temperature measuring method and heat processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →