Inventor · disambiguated record
Hyo-Young Kwon
Also filed as: KWON HYO-YOUNG
18 granted patents·2 pending applications·22 citations·filing 2012–2017
89Inventor score
Top patents by PatentIndex Score
20 records- 0184US9971243B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted May 15, 2018·2 cites·15 claims
- 0283US9556094B2Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask compositionCHEIL IND INC·Filed 2013·Granted Jan 31, 2017·6 cites·15 claims
- 0376US10066057B2Organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Sep 4, 2018·2 cites·20 claims
- 0472US9329475B2Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display deviceCHEIL IND INC·Filed 2014·Granted May 3, 2016·1 cites·9 claims
- 0571US10340148B2Polymer, organic layer composition, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted Jul 2, 2019·2 cites·18 claims
- 0671US9725389B2Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionCHEIL IND INC·Filed 2012·Granted Aug 8, 2017·2 cites·12 claims
- 0769US9873815B2Polymer, organic layer composition, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted Jan 23, 2018·2 cites·5 claims
- 0866US9359276B2Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask compositionCHOI YOO-JEONG·Filed 2012·Granted Jun 7, 2016·1 cites·10 claims
- 0965US10392459B2Photocurable composition and device including barrier layer formed from compositionCHEIL IND INC·Filed 2013·Granted Aug 27, 2019·1 cites·6 claims
- 1062US9593205B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Mar 14, 2017·1 cites·17 claims
- 1160US9758612B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Sep 12, 2017·1 cites·22 claims
- 1260US9195136B2Resist underlayer composition, method of forming patterns and semiconductor integrated circuit device including the patternsKWON HYO-YOUNG·Filed 2013·Granted Nov 24, 2015·1 cites·14 claims
- 1350US2015160553A1Positive Photosensitive Resin Composition, Photosensitive Resin Film, and Display Device Using the SameCHEIL IND INC·Filed 2014·Application pending·0 cites
- 1449US2017327640A1Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2017·Application pending·0 cites
- 1546US9606438B2Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the patternCHEIL IND INC·Filed 2013·Granted Mar 28, 2017·0 cites·18 claims
- 1645US8956790B2Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the sameCHEIL IND INC·Filed 2013·Granted Feb 17, 2015·0 cites·9 claims
- 1740US10556986B2Polymer, organic layer composition, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted Feb 11, 2020·0 cites·20 claims
- 1834US10364221B2Monomer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2016·Granted Jul 30, 2019·0 cites·11 claims
- 1934US9862668B2Monomer, polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jan 9, 2018·0 cites·22 claims
- 2030US10323124B2Polymer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 18, 2019·0 cites·15 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →