Inventor · disambiguated record
Marc W. Cantell
Also filed as: CANTELL MARC W · CANTELL MARC WAINE
14 granted patents·1 pending application·393 citations·filing 1999–2013
94Inventor score
Top patents by PatentIndex Score
15 records- 0195US6900519B2Diffused extrinsic base and method for fabricationIBM·Filed 2004·Granted May 31, 2005·95 cites·17 claims
- 0292US6774000B2Method of manufacture of MOSFET device with in-situ doped, raised source and drain structuresIBM·Filed 2002·Granted Aug 10, 2004·56 cites·17 claims
- 0389US6858532B2Low defect pre-emitter and pre-base oxide etch for bipolar transistors and related toolingIBM·Filed 2002·Granted Feb 22, 2005·44 cites·19 claims
- 0487US6926843B2Etching of hard masksIBM·Filed 2000·Granted Aug 9, 2005·45 cites·20 claims
- 0587US6541351B1Method for limiting divot formation in post shallow trench isolation processesIBM·Filed 2001·Granted Apr 1, 2003·53 cites·23 claims
- 0683US6858903B2MOSFET device with in-situ doped, raised source and drain structuresIBM·Filed 2004·Granted Feb 22, 2005·24 cites·21 claims
- 0772US7446007B2Multi-layer spacer with inhibited recess/undercut and method for fabrication thereofIBM·Filed 2006·Granted Nov 4, 2008·5 cites·13 claims
- 0866US6541336B1Method of fabricating a bipolar transistor having a realigned emitterIBM·Filed 2002·Granted Apr 1, 2003·13 cites·23 claims
- 0965US6255179B1Plasma etch pre-silicide cleanIBM·Filed 1999·Granted Jul 3, 2001·24 cites·26 claims
- 1065US6184132B1Integrated cobalt silicide process for semiconductor devicesIBM·Filed 1999·Granted Feb 6, 2001·22 cites·20 claims
- 1164US6420274B1Method for conditioning process chambersIBM·Filed 2000·Granted Jul 16, 2002·6 cites·6 claims
- 1261US8846481B2Transistor and method of forming the transistor so as to have reduced base resistanceIBM·Filed 2013·Granted Sep 30, 2014·1 cites·18 claims
- 1354US6869854B2Diffused extrinsic base and method for fabricationIBM·Filed 2002·Granted Mar 22, 2005·5 cites·29 claims
- 1442US2012313146A1Transistor and method of forming the transistor so as to have reduced base resistanceCANTELL MARC W·Filed 2011·Application pending·0 cites
- 1535US6793735B2Integrated cobalt silicide process for semiconductor devicesIBM·Filed 2000·Granted Sep 21, 2004·0 cites·17 claims
Join the waitlist — get patent alerts
Get an alert when Marc W. Cantell files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →