Inventor · disambiguated record
Akiya Kawaue
Also filed as: KAWAUE AKIYA
43 granted patents·9 pending applications·235 citations·filing 2007–2021
97Inventor score
Top patents by PatentIndex Score
52 records- 0198US7713679B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted May 11, 2010·57 cites·11 claims
- 0297US7682772B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Mar 23, 2010·20 cites·16 claims
- 0396US9244347B2Resist composition, compound, polymeric compound and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jan 26, 2016·19 cites·18 claims
- 0496US9052592B2Resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jun 9, 2015·16 cites·15 claims
- 0592US7776510B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Aug 17, 2010·14 cites·12 claims
- 0690US9023581B2Resist composition, method of forming resist pattern, polymeric compound, and compoundKAWAUE AKIYA·Filed 2011·Granted May 5, 2015·8 cites·14 claims
- 0790US7927780B2Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Apr 19, 2011·9 cites·11 claims
- 0889US9005874B2Compound, polymeric compound, acid generator, resist composition, and method of forming resist patternKOMURO YOSHITAKA·Filed 2012·Granted Apr 14, 2015·13 cites·11 claims
- 0989US8338076B2Resist composition, method of forming resist pattern, novel compound, and acid generatorKAWAUE AKIYA·Filed 2009·Granted Dec 25, 2012·7 cites·24 claims
- 1087US8415085B2Resist composition, method of forming resist pattern, novel compound, and acid generatorHADA HIDEO·Filed 2012·Granted Apr 9, 2013·3 cites·9 claims
- 1187US8206891B2Positive resist composition and method of forming resist patternSESHIMO TAKEHIRO·Filed 2009·Granted Jun 26, 2012·10 cites·6 claims
- 1286US9164380B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Oct 20, 2015·5 cites·6 claims
- 1385US8846291B2Resist composition, method of forming resist pattern, and new compoundUTSUMI YOSHIYUKI·Filed 2011·Granted Sep 30, 2014·5 cites·12 claims
- 1485US7745097B2Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 29, 2010·4 cites·19 claims
- 1583US7488568B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Feb 10, 2009·7 cites·15 claims
- 1682US7955777B2Compound, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 7, 2011·4 cites·14 claims
- 1781US9063416B2Resist composition, method of forming resist pattern and compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Jun 23, 2015·3 cites·8 claims
- 1881US8124313B2Resist composition, method of forming resist pattern, novel compound, and acid generatorSESHIMO TAKEHIRO·Filed 2010·Granted Feb 28, 2012·11 cites·19 claims
- 1979US9040224B2Resist composition, method of forming resist pattern and compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted May 26, 2015·3 cites·7 claims
- 2076US8703387B2Resist composition, method of forming resist pattern, novel compound, and acid generatorKAWAUE AKIYA·Filed 2012·Granted Apr 22, 2014·2 cites·7 claims
- 2176US8252505B2Compound and method of producing same, acid generator, resist composition, and method of forming resist patternKAWAUE AKIYA·Filed 2009·Granted Aug 28, 2012·4 cites·12 claims
- 2272US11022880B2Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compoundTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jun 1, 2021·1 cites·14 claims
- 2371US8367297B2Resist composition, method of forming resist pattern, novel compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Feb 5, 2013·3 cites·12 claims
- 2469US8367299B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2011·Granted Feb 5, 2013·1 cites·15 claims
- 2569US8206890B2Resist composition, method of forming resist pattern, compound and acid generatorKAWAUE AKIYA·Filed 2009·Granted Jun 26, 2012·2 cites·10 claims
- 2668US8247160B2Resist composition, method of forming resist pattern, and novel compound and acid generatorUTSUMI YOSHIYUKI·Filed 2009·Granted Aug 21, 2012·2 cites·14 claims
- 2768US8227169B2Compound, acid generator, resist composition, and method of forming resist patternKAWAUE AKIYA·Filed 2008·Granted Jul 24, 2012·2 cites·9 claims
- 2867US9012129B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Apr 21, 2015·0 cites·9 claims
- 2965US8808959B2Resist composition, method of forming resist pattern, novel compound, and acid generatorHADA HIDEO·Filed 2009·Granted Aug 19, 2014·0 cites·9 claims
- 3059US10676636B2Brush composition, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jun 9, 2020·0 cites·7 claims
- 3158US10995234B2Method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted May 4, 2021·0 cites·3 claims
- 3257US2015111155A1Resist composition, method of forming resist pattern, compound and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2014·Application pending·0 cites
- 3356US9914847B2Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Mar 13, 2018·0 cites·7 claims
- 3455US2023273521A1Chemically amplified photosentive composition, photosensitive dry film, production method of substrate having template for plating, and production method of plated articleTOKYO OHKA KOGYO CO LTD·Filed 2021·Application pending·0 cites
- 3554US8541157B2Resist composition, method of forming resist pattern, compound and acid generator including the sameKAWAUE AKIYA·Filed 2009·Granted Sep 24, 2013·0 cites·12 claims
- 3654US2013260314A1Resist composition, method of forming resist pattern, compound and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 3754US2023102353A1Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method for producing photosensitive dry film, method for producing patterned resist film, method for producing substrate provided with template, and method for producing a plated articleTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 3853US2022283500A1Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, production method for photosensitive dry film, production method for patterned resist film, compound, photo-acid generator, and production method for n-organosulfonyloxy compoundTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 3952US2023106185A1Chemically amplified positive-type photosensitive composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, and acid diffusion suppressing agentTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 4050US11474432B2Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Oct 18, 2022·0 cites·13 claims
- 4149US8211616B2Positive resist composition and method of forming resist patternSHIMIZU HIROAKI·Filed 2009·Granted Jul 3, 2012·0 cites·5 claims
- 4248US10179866B2Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Jan 15, 2019·0 cites·2 claims
- 4344US9828519B2Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Nov 28, 2017·0 cites·5 claims
- 4444US2009253075A1Positive resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 4543US9776208B2Brush composition, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Oct 3, 2017·0 cites·16 claims
- 4643US7914968B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Mar 29, 2011·0 cites·6 claims
- 4742US10100134B2Method for manufacturing polymer compoundTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Oct 16, 2018·0 cites·2 claims
- 4842US2020142307A1Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 4941US11131927B2Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Sep 28, 2021·0 cites·10 claims
- 5039US11061326B2Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compoundTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jul 13, 2021·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →