Inventor · disambiguated record
Kevin Lucas
Also filed as: LUCAS KEVIN · LUCAS KEVIN D · LUCAS KEVIN DEAN
22 granted patents·8 pending applications·1,564 citations·filing 1996–2023
97Inventor score
Top patents by PatentIndex Score
30 records- 0197US5900340AOne dimensional lithographic proximity correction using DRC shape functionsMOTOROLA INC·Filed 1997·Granted May 4, 1999·269 cites·14 claims
- 0296US5741626AMethod for forming a dielectric tantalum nitride layer as an anti-reflective coating (ARC)MOTOROLA INC·Filed 1996·Granted Apr 21, 1998·330 cites·27 claims
- 0395US6174810B1Copper interconnect structure and method of formationMOTOROLA INC·Filed 1998·Granted Jan 16, 2001·235 cites·13 claims
- 0491US8175737B2Method and apparatus for designing and integrated circuitLUCAS KEVIN DEAN·Filed 2006·Granted May 8, 2012·57 cites·20 claims
- 0591US5849440AProcess for producing and inspecting a lithographic reticle and fabricating semiconductor devices using sameMOTOROLA INC·Filed 1997·Granted Dec 15, 1998·94 cites·18 claims
- 0690US6287951B1Process for forming a combination hardmask and antireflective layerMOTOROLA INC·Filed 1998·Granted Sep 11, 2001·164 cites·20 claims
- 0788US8312394B2Method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning processBAN YONCHAN·Filed 2010·Granted Nov 13, 2012·46 cites·24 claims
- 0887US5920487ATwo dimensional lithographic proximity correction using DRC shape functionsMOTOROLA INC·Filed 1997·Granted Jul 6, 1999·70 cites·20 claims
- 0986US6004850ATantalum oxide anti-reflective coating (ARC) integrated with a metallic transistor gate electrode and method of formationMOTOROLA INC·Filed 1998·Granted Dec 21, 1999·58 cites·23 claims
- 1082US6989229B2Non-resolving mask tiling method for flare reductionFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Jan 24, 2006·33 cites·26 claims
- 1182US6783904B2Lithography correction method and deviceFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Aug 31, 2004·27 cites·18 claims
- 1279US5958635ALithographic proximity correction through subset feature modificationMOTOROLA INC·Filed 1997·Granted Sep 28, 1999·62 cites·21 claims
- 1379US5827625AMethods of designing a reticle and forming a semiconductor device therewithMOTOROLA INC·Filed 1997·Granted Oct 27, 1998·45 cites·34 claims
- 1477US7962868B2Method for forming a semiconductor device using optical proximity correction for the optical lithographyFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Jun 14, 2011·6 cites·20 claims
- 1576US6294820B1Metallic oxide gate electrode stack having a metallic gate dielectric metallic gate electrode and a metallic arc layerMOTOROLA INC·Filed 1999·Granted Sep 25, 2001·33 cites·8 claims
- 1673US8370773B2Method and apparatus for designing an integrated circuit using inverse lithography technologyFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Feb 5, 2013·4 cites·19 claims
- 1768US6649452B2Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor waferMOTOROLA INC·Filed 2002·Granted Nov 18, 2003·10 cites·14 claims
- 1867US7284231B2Layout modification using multilayer-based constraintsFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Oct 16, 2007·15 cites·22 claims
- 1963US2025199397A1Mask Stitching for Extreme Ultraviolet LithographySYNOPSYS INC·Filed 2023·Application pending·0 cites
- 2059US7935547B2Method of patterning a layer using a pellicleFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted May 3, 2011·1 cites·10 claims
- 2156US11900042B2Stochastic-aware lithographic models for mask synthesisSYNOPSYS INC·Filed 2021·Granted Feb 13, 2024·0 cites·19 claims
- 2255US6818362B1Photolithography reticle designFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Nov 16, 2004·4 cites·22 claims
- 2350US2015136695A1Systems and Methods For Cleaning A Membrane Separation SystemLUCAS KEVIN·Filed 2014·Application pending·0 cites
- 2444US2009070730A1Method and apparatus for modeling a vectorial polarization effect in an optical lithography systemSYNOPSYS INC·Filed 2007·Application pending·0 cites
- 2543US6933227B2Semiconductor device and method of forming the sameFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Aug 23, 2005·1 cites·23 claims
- 2640US2010122224A1Method and apparatus for designing an integrated circuitFREESCALE SEMICONDUCTOR INC·Filed 2007·Application pending·0 cites
- 2739US2008250374A1Method of Making an Integrated CircuitFREESCALE SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 2838US2008261375A1Method of Forming a Semiconductor Device Having a Dummy FeatureFREESCALE SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 2937US2006199087A1Method of making an integrated circuit by modifying a design layout by accounting for a parameter that varies based on a location within an exposure fieldLUCAS KEVIN D·Filed 2005·Application pending·0 cites
- 3035US2004248016A1Method of designing a reticle and forming a semiconductor device therewithFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →