Inventor · disambiguated record
Irene Mcstay
Also filed as: MCSTAY IRENE · MCSTAY IRENE L · MCSTAY IRENE LENNOX
14 granted patents·2 pending applications·353 citations·filing 2000–2005
94Inventor score
Top patents by PatentIndex Score
16 records- 0194US6498061B2Negative ion implant mask formation for self-aligned, sublithographic resolution patterning for single-sided vertical device formationIBM·Filed 2000·Granted Dec 24, 2002·66 cites·11 claims
- 0288US6706634B1Control of separation between transfer gate and storage node in vertical DRAMINFINEON TECHNOLOGIES AG·Filed 2000·Granted Mar 16, 2004·39 cites·14 claims
- 0388US6309924B1Method of forming self-limiting polysilicon LOCOS for DRAM cellIBM·Filed 2000·Granted Oct 30, 2001·34 cites·12 claims
- 0487US6555430B1Process flow for capacitance enhancement in a DRAM trenchIBM·Filed 2000·Granted Apr 29, 2003·44 cites·16 claims
- 0586US6905944B2Sacrificial collar method for improved deep trench processingINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jun 14, 2005·34 cites·20 claims
- 0682US6444516B1Semi-insulating diffusion barrier for low-resistivity gate conductorsIBM·Filed 2000·Granted Sep 3, 2002·31 cites·20 claims
- 0777US6620724B1Low resistivity deep trench fill for DRAM and EDRAM applicationsINFINEON TECHNOLOGIES AG·Filed 2002·Granted Sep 16, 2003·23 cites·38 claims
- 0877US6576565B1RTCVD process and reactor for improved conformality and step-coverageINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jun 10, 2003·19 cites·20 claims
- 0977US6458647B1Process flow for sacrificial collar with poly maskINFINEON TECHNOLOGIES AG·Filed 2001·Granted Oct 1, 2002·22 cites·27 claims
- 1068US6544855B1Process flow for sacrificial collar with polysilicon voidINFINEON TECHNOLOGIES AG·Filed 2001·Granted Apr 8, 2003·11 cites·21 claims
- 1168US6528383B1Simultaneous formation of deep trench capacitor and resistorIBM·Filed 2001·Granted Mar 4, 2003·14 cites·7 claims
- 1258US6613642B2Method for surface roughness enhancement in semiconductor capacitor manufacturingIBM·Filed 2001·Granted Sep 2, 2003·8 cites·18 claims
- 1351US6709947B1Method of area enhancement in capacitor platesIBM·Filed 2002·Granted Mar 23, 2004·5 cites·20 claims
- 1451US6559002B1Rough oxide hard mask for DT surface area enhancement for DT DRAMINFINEON TECHNOLOGIES CORP·Filed 2001·Granted May 6, 2003·3 cites·10 claims
- 1538US2006001162A1Nitride and polysilicon interface with titanium layerSCHUTZ RONALD J·Filed 2005·Application pending·0 cites
- 1633US2002106857A1Method for surface area enhancement of capacitors by film growth and self maskingIBM·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →