Inventor · disambiguated record
Naomasa Shiraishi
Also filed as: SHIRAISHI NAOMASA
107 granted patents·16 pending applications·5,080 citations·filing 1991–2017
99Inventor score
Top patents by PatentIndex Score
123 records- 0198US6842221B1Exposure apparatus and exposure method, and device manufacturing methodNIKON CORP·Filed 2000·Granted Jan 11, 2005·147 cites·41 claims
- 0297US6731371B1Exposure method and apparatus, and method of fabricating a deviceFiled 2000·Granted May 4, 2004·97 cites·37 claims
- 0397US6211944B1Projection exposure method and apparatusNIKON CORP·Filed 1995·Granted Apr 3, 2001·150 cites·15 claims
- 0497US6034378AMethod of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatusNIKON CORP·Filed 1996·Granted Mar 7, 2000·126 cites·79 claims
- 0597US5801390APosition-detection method and apparatus with a grating markNIKON CORP·Filed 1997·Granted Sep 1, 1998·228 cites·57 claims
- 0697US5638211AMethod and apparatus for increasing the resolution power of projection lithography exposure systemNIKON CORP·Filed 1994·Granted Jun 10, 1997·131 cites·19 claims
- 0797US5117255AProjection exposure apparatusNIKON CORP·Filed 1991·Granted May 26, 1992·152 cites·13 claims
- 0896US6710855B2Projection exposure apparatus and methodNIKON CORP·Filed 2002·Granted Mar 23, 2004·83 cites·54 claims
- 0996US6404482B1Projection exposure method and apparatusNIKON CORP·Filed 1999·Granted Jun 11, 2002·133 cites·56 claims
- 1096US6078380AProjection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposureNIKON CORP·Filed 1999·Granted Jun 20, 2000·165 cites·56 claims
- 1196US5719704AProjection exposure apparatusNIKON CORP·Filed 1995·Granted Feb 17, 1998·111 cites·32 claims
- 1295US6252647B1Projection exposure apparatusNIKON CORP·Filed 1995·Granted Jun 26, 2001·108 cites·6 claims
- 1395US6118516AProjection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patternsNIKON CORP·Filed 1997·Granted Sep 12, 2000·134 cites·35 claims
- 1495US5677757AProjection exposure apparatusNIKON CORP·Filed 1995·Granted Oct 14, 1997·140 cites·14 claims
- 1595US5610684AProjection exposure apparatusNIKON CORP·Filed 1995·Granted Mar 11, 1997·139 cites·22 claims
- 1694US6538740B1Adjusting method for position detecting apparatusNIKON CORP·Filed 2000·Granted Mar 25, 2003·64 cites·36 claims
- 1794US6342941B1Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and methodNIKON CORP·Filed 2000·Granted Jan 29, 2002·62 cites·41 claims
- 1894US6285455B1Mark detection method, optical system and mark position detectorNIKON CORP·Filed 2000·Granted Sep 4, 2001·59 cites·29 claims
- 1994US6249335B1Photo-mask and method of exposing and projection-exposing apparatusNIKON CORP·Filed 1995·Granted Jun 19, 2001·98 cites·38 claims
- 2094US5546225AHigh resolution printing technique by using improved mask pattern and improved illumination systemNIKON CORP·Filed 1995·Granted Aug 13, 1996·110 cites·23 claims
- 2193US7050149B2Exposure apparatus and exposure methodNIKON CORP·Filed 2004·Granted May 23, 2006·48 cites·33 claims
- 2293US6710854B2Projection exposure apparatusNIPPON KOGAKU KK·Filed 2001·Granted Mar 23, 2004·32 cites·39 claims
- 2393US6704092B2Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil planeNIKON CORP·Filed 2002·Granted Mar 9, 2004·35 cites·39 claims
- 2493US6310679B1Projection exposure method and apparatusNIKON CORP·Filed 1999·Granted Oct 30, 2001·93 cites·51 claims
- 2593US6304317B1Projection apparatus and methodNIKON CORP·Filed 1997·Granted Oct 16, 2001·92 cites·36 claims
- 2693US6233041B1Exposure method utilizing diffracted light having different orders of diffractionNIKON CORP·Filed 1998·Granted May 15, 2001·99 cites·18 claims
- 2793US6100961AProjection exposure apparatus and methodNIKON CORP·Filed 1999·Granted Aug 8, 2000·69 cites·17 claims
- 2893US5272501AProjection exposure apparatusNIKON CORP·Filed 1992·Granted Dec 21, 1993·89 cites·23 claims
- 2992US9760014B2Illumination optical apparatus and projection exposure apparatusNIKON CORP·Filed 2015·Granted Sep 12, 2017·3 cites·24 claims
- 3092US6831731B2Projection optical system and an exposure apparatus with the projection optical systemNIKON CORP·Filed 2002·Granted Dec 14, 2004·45 cites·70 claims
- 3192US6775063B2Optical system and exposure apparatus having the optical systemNIKON CORP·Filed 2002·Granted Aug 10, 2004·48 cites·31 claims
- 3292US6677088B2Photomask producing method and apparatus and device manufacturing methodNIKON CORP·Filed 2002·Granted Jan 13, 2004·42 cites·34 claims
- 3391US6707529B1Exposure method and apparatusNIKON CORP·Filed 2000·Granted Mar 16, 2004·39 cites·44 claims
- 3491US6392740B1Projection exposure apparatusNIKON CORP·Filed 1999·Granted May 21, 2002·55 cites·12 claims
- 3591US5467166AProjection exposure method and apparatusNIKON CORP·Filed 1994·Granted Nov 14, 1995·69 cites·8 claims
- 3690US6665050B2Projection exposure methods using difracted light with increased intensity portions spaced from the optical axisNIKON CORP·Filed 2002·Granted Dec 16, 2003·27 cites·48 claims
- 3790US6653024B1Photomask, aberration correction plate, exposure apparatus, and process of production of microdeviceNIKON CORP·Filed 2000·Granted Nov 25, 2003·36 cites·30 claims
- 3890US5966201AMark for position detection, and mark detecting method and apparatusNIKON CORP·Filed 1997·Granted Oct 12, 1999·68 cites·34 claims
- 3990US5448336AApparatus and method for projection exposureNIKON CORP·Filed 1994·Granted Sep 5, 1995·68 cites·11 claims
- 4089US9423697B2Illumination optical apparatus and projection exposure apparatusNIKON CORP·Filed 2013·Granted Aug 23, 2016·3 cites·47 claims
- 4189US6242754B1Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatusNIKON CORP·Filed 1999·Granted Jun 5, 2001·50 cites·19 claims
- 4289US5706091AApparatus for detecting a mark pattern on a substrateNIKON CORP·Filed 1996·Granted Jan 6, 1998·59 cites·30 claims
- 4389US5576829AMethod and apparatus for inspecting a phase-shifted maskNIKON CORP·Filed 1995·Granted Nov 19, 1996·75 cites·29 claims
- 4489US5357311AProjection type light exposure apparatus and light exposure methodNIKON CORP·Filed 1993·Granted Oct 18, 1994·59 cites·46 claims
- 4588US6627365B1Photomask and projection exposure apparatusNIKON CORP·Filed 2000·Granted Sep 30, 2003·31 cites·11 claims
- 4688US5703675AProjection-exposing apparatus with deflecting grating memberNIKON CORP·Filed 1995·Granted Dec 30, 1997·61 cites·26 claims
- 4788US5335044AProjection type exposure apparatus and method of exposureNIKON CORP·Filed 1993·Granted Aug 2, 1994·58 cites·20 claims
- 4887US7884921B2Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing methodNIKON CORP·Filed 2007·Granted Feb 8, 2011·14 cites·28 claims
- 4987US7109508B2Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatusNIKON CORP·Filed 2003·Granted Sep 19, 2006·19 cites·20 claims
- 5087US6677601B2Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatusNIKON CORP·Filed 2001·Granted Jan 13, 2004·19 cites·36 claims
Showing the top 50 of 123 patent records by PatentIndex Score.
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