Inventor · disambiguated record
Ingemar Carlsson
Also filed as: CARLSSON INGEMAR
29 granted patents·8 pending applications·277 citations·filing 1974–2021
96Inventor score
Top patents by PatentIndex Score
37 records- 0197US7097537B1Determination of position of sensor measurements during polishingAPPLIED MATERIALS INC·Filed 2004·Granted Aug 29, 2006·81 cites·35 claims
- 0296US9281253B2Determination of gain for eddy current sensorAPPLIED MATERIALS INC·Filed 2013·Granted Mar 8, 2016·28 cites·13 claims
- 0393US9636797B2Adjusting eddy current measurementsAPPLIED MATERIALS INC·Filed 2014·Granted May 2, 2017·11 cites·19 claims
- 0492US12320883B2Resistivity-based adjustment of thresholds for in-situ monitoringAPPLIED MATERIALS INC·Filed 2021·Granted Jun 3, 2025·1 cites·19 claims
- 0592US8284560B2Eddy current sensor with enhanced edge resolutionIRAVANI HASSAN G·Filed 2009·Granted Oct 9, 2012·24 cites·22 claims
- 0691US7952708B2High throughput measurement systemAPPLIED MATERIALS INC·Filed 2008·Granted May 31, 2011·13 cites·21 claims
- 0790US7840375B2Methods and apparatus for generating a library of spectraAPPLIED MATERIALS INC·Filed 2008·Granted Nov 23, 2010·12 cites·23 claims
- 0890US7444198B2Determining physical property of substrateAPPLIED MATERIALS INC·Filed 2006·Granted Oct 28, 2008·17 cites·15 claims
- 0988US9023667B2High sensitivity eddy current monitoring systemIRAVANI HASSAN G·Filed 2011·Granted May 5, 2015·11 cites·13 claims
- 1086US9205527B2In-situ monitoring system with monitoring of elongated regionAPPLIED MATERIALS INC·Filed 2013·Granted Dec 8, 2015·7 cites·19 claims
- 1185US10103073B2Inductive monitoring of conductive trench depthAPPLIED MATERIALS INC·Filed 2017·Granted Oct 16, 2018·3 cites·15 claims
- 1285US9754846B2Inductive monitoring of conductive trench depthAPPLIED MATERIALS INC·Filed 2014·Granted Sep 5, 2017·5 cites·23 claims
- 1383US11199605B2Resistivity-based adjustment of measurements from in-situ monitoringAPPLIED MATERIALS INC·Filed 2018·Granted Dec 14, 2021·1 cites·15 claims
- 1483US11079459B2Resistivity-based calibration of in-situ electromagnetic inductive monitoringAPPLIED MATERIALS INC·Filed 2018·Granted Aug 3, 2021·1 cites·18 claims
- 1581US8014004B2Determining physical property of substrateAPPLIED MATERIALS INC·Filed 2010·Granted Sep 6, 2011·4 cites·20 claims
- 1677US7746485B2Determining physical property of substrateAPPLIED MATERIALS INC·Filed 2008·Granted Jun 29, 2010·6 cites·25 claims
- 1775US10556315B2Determination of gain for eddy current sensorAPPLIED MATERIALS INC·Filed 2019·Granted Feb 11, 2020·1 cites·19 claims
- 1873US10589397B2Endpoint control of multiple substrate zones of varying thickness in chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2017·Granted Mar 17, 2020·1 cites·16 claims
- 1972US3971486AApparatus for handling and transporting containers, load supporting bodies, pallets and the likeLIHNELL VAGN AB·Filed 1974·Granted Jul 27, 1976·24 cites·5 claims
- 2071US8694144B2Endpoint control of multiple substrates of varying thickness on the same platen in chemical mechanical polishingDUBOUST ALAIN·Filed 2010·Granted Apr 8, 2014·2 cites·13 claims
- 2170US10207386B2Determination of gain for eddy current sensorAPPLIED MATERIALS INC·Filed 2016·Granted Feb 19, 2019·1 cites·16 claims
- 2270US8616935B2Control of overpolishing of multiple substrates on the same platen in chemical mechanical polishingZHANG JIMIN·Filed 2010·Granted Dec 31, 2013·2 cites·20 claims
- 2369US9472475B2Feedback control using detection of clearance and adjustment for uniform topographyAPPLIED MATERIALS INC·Filed 2013·Granted Oct 18, 2016·2 cites·19 claims
- 2466US8295967B2Endpoint control of multiple-wafer chemical mechanical polishingZHANG JIMIN·Filed 2008·Granted Oct 23, 2012·3 cites·25 claims
- 2562US9073169B2Feedback control of polishing using optical detection of clearanceXU KUN·Filed 2011·Granted Jul 7, 2015·2 cites·26 claims
- 2661US10741459B2Inductive monitoring of conductive loopsAPPLIED MATERIALS INC·Filed 2018·Granted Aug 11, 2020·0 cites·19 claims
- 2759US10427272B2Endpoint detection with compensation for filteringAPPLIED MATERIALS INC·Filed 2017·Granted Oct 1, 2019·0 cites·20 claims
- 2855US2014222188A1Endpoint control of multiple substrates of varying thickness on the same platen in chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 2951US4867928AApparatus and a method for the production of ribbed pipesUPONOR NV·Filed 1988·Granted Sep 19, 1989·14 cites·15 claims
- 3050US2011294400A1Determining Physical Property of SubstrateRAVID ABRAHAM·Filed 2011·Application pending·0 cites
- 3148US2010120331A1Endpoint control of multiple-wafer chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3247US2011046918A1Methods and apparatus for generating a library of spectraRAVID ABRAHAM·Filed 2010·Application pending·0 cites
- 3345US9275917B2Determination of gain for eddy current sensorAPPLIED MATERIALS INC·Filed 2013·Granted Mar 1, 2016·0 cites·16 claims
- 3445US2014024293A1Control Of Overpolishing Of Multiple Substrates On the Same Platen In Chemical Mechanical PolishingZHANG JIMIN·Filed 2012·Application pending·0 cites
- 3543US2014030956A1Control of polishing of multiple substrates on the same platen in chemical mechanical polishingZHANG JIMIN·Filed 2012·Application pending·0 cites
- 3636US2012276662A1Eddy current monitoring of metal featuresIRAVANI HASSAN G·Filed 2011·Application pending·0 cites
- 3736US2012276817A1Eddy current monitoring of metal residue or metal pillarsIRAVANI HASSAN G·Filed 2011·Application pending·0 cites
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