Inventor · disambiguated record
Michinori Nishikawa
Also filed as: NISHIKAWA MICHINORI
25 granted patents·3 pending applications·540 citations·filing 1992–2014
96Inventor score
Top patents by PatentIndex Score
28 records- 0191US6465368B2Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating filmJSR CORP·Filed 2001·Granted Oct 15, 2002·59 cites·22 claims
- 0289US5969055ALiquid crystal alignment agentJSR CORP·Filed 1997·Granted Oct 19, 1999·62 cites·10 claims
- 0388US6800330B2Composition for film formation, method of film formation, and silica-based filmJSR CORP·Filed 2002·Granted Oct 5, 2004·43 cites·20 claims
- 0487US6472079B2Composition for film formation, method of film formation, and silica-based filmJSR CORP·Filed 2001·Granted Oct 29, 2002·40 cites·8 claims
- 0587US6376634B1Composition for film formation and material for insulating film formationJSR CORP·Filed 2000·Granted Apr 23, 2002·51 cites·28 claims
- 0686US6576393B1Composition for resist underlayer film and method for producing the sameJSR CORP·Filed 2000·Granted Jun 10, 2003·75 cites·21 claims
- 0778US6503633B2Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based filmJSR CORP·Filed 2001·Granted Jan 7, 2003·22 cites·13 claims
- 0877US6797453B2Radiation sensitive composition for forming an insulating film, insulating film and display deviceJSR CORP·Filed 2003·Granted Sep 28, 2004·16 cites·13 claims
- 0976US7128976B2Composition for film formation, method of film formation, and silica-based filmJSR CORP·Filed 2002·Granted Oct 31, 2006·20 cites·8 claims
- 1075US6890605B2Method of film formation, insulating film, and substrate for semiconductorJSR CORP·Filed 2002·Granted May 10, 2005·19 cites·16 claims
- 1173US5276132ALiquid crystal aligning agent and aligning agent-applied liquid crystal display deviceJAPAN SYNTHETIC RUBBER CO LTD·Filed 1992·Granted Jan 4, 1994·42 cites·16 claims
- 1272US6468589B2Composition for film formation and insulating filmJSR CORP·Filed 2001·Granted Oct 22, 2002·10 cites·6 claims
- 1367US6824833B2Stacked film, insulating film and substrate for semiconductorJSR CORP·Filed 2002·Granted Nov 30, 2004·12 cites·13 claims
- 1464US6528605B1Diyne-containing (co)polymer, processes for producing the same, and cured filmJSR CORP·Filed 2000·Granted Mar 4, 2003·6 cites·8 claims
- 1556US6642352B2Method of manufacturing material for forming insulating filmJSR CORP·Filed 2001·Granted Nov 4, 2003·6 cites·12 claims
- 1655US5700860ALiquid crystal orienting agentJAPAN SYNTHETIC RUBBER CO LTD·Filed 1996·Granted Dec 23, 1997·25 cites·12 claims
- 1753US7153767B2Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishingJSR CORP·Filed 2004·Granted Dec 26, 2006·3 cites·4 claims
- 1852US6787193B2Method for the formation of silica film, silica film, insulating film, and semiconductor deviceJSR CORP·Filed 2002·Granted Sep 7, 2004·3 cites·11 claims
- 1950US9447323B2Method for producing liquid crystal displayJSR CORP·Filed 2014·Granted Sep 20, 2016·0 cites·5 claims
- 2048US6884862B2Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating filmJSR CORP·Filed 2002·Granted Apr 26, 2005·2 cites·19 claims
- 2148US5478682AMethod for domain-dividing liquid crystal alignment film and liquid crystal device using domain-divided alignment filmJAPAN SYNTHETIC RUBBER CO LTD·Filed 1994·Granted Dec 26, 1995·14 cites·15 claims
- 2247US6852370B2Composition for film formation and material for insulating film formationJSR CORP·Filed 2002·Granted Feb 8, 2005·2 cites·16 claims
- 2344US5698135ALiquid crystal-aligning agentJAPAN SYNTHETIC RUBBER CO LTD·Filed 1995·Granted Dec 16, 1997·8 cites·10 claims
- 2444US2012013837A1Composition for forming liquid crystal alignment film and liquid crystal display deviceTERASHITA SHINICHI·Filed 2009·Application pending·0 cites
- 2540US2002064953A1Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishingJSR CORP·Filed 2001·Application pending·0 cites
- 2639US7320854B2Radiation sensitive refractive index changing composition, pattern forming method and optical materialJSR CORP·Filed 2004·Granted Jan 22, 2008·0 cites·20 claims
- 2738US2004202892A1Polymer, polymer for forming organic electroluminescence device, polymer composition for organic electroluminescence device and organic electroluminescence deviceJSR CORP·Filed 2004·Application pending·0 cites
- 2837US6749944B2Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductorJSR CORP·Filed 2002·Granted Jun 15, 2004·0 cites·11 claims
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