Inventor · disambiguated record
Tomokazu Kozakai
Also filed as: KOZAKAI TOMOKAZU
21 granted patents·3 pending applications·26 citations·filing 2001–2020
91Inventor score
Top patents by PatentIndex Score
24 records- 0182US8764994B2Method for fabricating emitterHITACHI HIGH TECH SCIENCE CORP·Filed 2013·Granted Jul 1, 2014·4 cites·4 claims
- 0281US8963100B2Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) paYASAKA ANTO·Filed 2012·Granted Feb 24, 2015·6 cites·18 claims
- 0380US9773634B2Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2017·Granted Sep 26, 2017·2 cites·11 claims
- 0476US7750318B2Working method by focused ion beam and focused ion beam working apparatusSII NANOTECHNOLOGY INC·Filed 2006·Granted Jul 6, 2010·4 cites·4 claims
- 0574US9378858B2Repair apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Jun 28, 2016·2 cites·5 claims
- 0670US8890093B2Charged particle beam apparatus and method for forming observation imageHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Nov 18, 2014·2 cites·6 claims
- 0768US9336979B2Focused ion beam apparatus with precious metal emitter surfaceHITACHI HIGH TECH SCIENCE CORP·Filed 2015·Granted May 10, 2016·1 cites·12 claims
- 0868US7488961B2Charged particle beam irradiation method and charged particle beam apparatusSII NANOTECHNOLOGY INC·Filed 2006·Granted Feb 10, 2009·2 cites·5 claims
- 0968US7485880B2Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing methodSII NANOTECHNOLOGY INC·Filed 2006·Granted Feb 3, 2009·2 cites·8 claims
- 1064US7927769B2Method for fabricating EUVL maskSII NANOTECHNOLOGY INC·Filed 2009·Granted Apr 19, 2011·1 cites·11 claims
- 1159US9583299B2Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2014·Granted Feb 28, 2017·0 cites·1 claims
- 1259US8999178B2Method for fabricating emitterHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Apr 7, 2015·0 cites·4 claims
- 1356US10276343B2Method for acquiring image and ion beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2018·Granted Apr 30, 2019·0 cites·6 claims
- 1455US11081312B2Method of manufacturing emitter, emitter, and focused ion beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2020·Granted Aug 3, 2021·0 cites·6 claims
- 1552US10014157B2Method for acquiring image and ion beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2016·Granted Jul 3, 2018·0 cites·4 claims
- 1652US9793085B2Focused ion beam apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2016·Granted Oct 17, 2017·0 cites·11 claims
- 1752US2016322123A1Repair ApparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2016·Application pending·0 cites
- 1849US9245712B2Focused ion beam systemHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Jan 26, 2016·0 cites·5 claims
- 1948US7576340B2Focused ion beam processing methodSII NANOTECHNOLOGY INC·Filed 2006·Granted Aug 18, 2009·0 cites·10 claims
- 2048US2020310245A1Mask repair apparatus and method for repairing maskHITACHI HIGH TECH SCIENCE CORP·Filed 2020·Application pending·0 cites
- 2144US2007114460A1Charged particle beam processing method and charged particle beam apparatusMURAMATSU MASASHI·Filed 2006·Application pending·0 cites
- 2242US7323685B2Ion beam processing methodSII NANOTECHNOLOGY INC·Filed 2004·Granted Jan 29, 2008·0 cites·2 claims
- 2340US6780551B2Charged particle processing for forming pattern boundaries at a uniform thicknessSII NANOTECHNOLOGY INC·Filed 2001·Granted Aug 24, 2004·0 cites·20 claims
- 2431US9793092B2Charged particle beam apparatus and processing methodHITACHI HIGH-TECH SCIENCE CORP·Filed 2015·Granted Oct 17, 2017·0 cites·6 claims
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