Inventor · disambiguated record
Pratik Mankidy
Also filed as: MANKIDY PRATIK · MANKIDY PRATIK JACOB
7 granted patents·8 pending applications·1,100 citations·filing 2010–2024
86Inventor score
Top patents by PatentIndex Score
15 records- 0198US8573152B2Showerhead electrodeDE LA LLERA ANTHONY·Filed 2010·Granted Nov 5, 2013·595 cites·17 claims
- 0295US8419959B2Clamped monolithic showerhead electrodeBETTENCOURT GREGORY R·Filed 2010·Granted Apr 16, 2013·482 cites·20 claims
- 0387US9245716B2Edge-clamped and mechanically fastened inner electrode of showerhead electrode assemblyDE LA LLERA ANTHONY·Filed 2010·Granted Jan 26, 2016·11 cites·12 claims
- 0487US8470127B2Cam-locked showerhead electrode and assemblyDE LA LLERA ANTHONY·Filed 2011·Granted Jun 25, 2013·11 cites·9 claims
- 0575US2025043425A1Showerhead faceplates with angled gas distribution passages for semiconductor processing toolsLAM RES CORP·Filed 2024·Application pending·0 cites
- 0668US10262834B2Edge-clamped and mechanically fastened inner electrode of showerhead electrode assemblyLAM RES CORP·Filed 2015·Granted Apr 16, 2019·1 cites·15 claims
- 0763US12139791B2Showerhead faceplates with angled gas distribution passages for semiconductor processing toolsLAM RES CORP·Filed 2021·Granted Nov 12, 2024·0 cites·19 claims
- 0856US2024420929A1Extreme edge feature profile tilt control by altering input voltage waveform to edge ringLAM RES CORP·Filed 2022·Application pending·0 cites
- 0955US12505991B2Tunability of edge plasma density for tilt controlLAM RES CORP·Filed 2021·Granted Dec 23, 2025·0 cites·17 claims
- 1055US2025054778A1Improved thermal and electrical interface between parts in an etch chamberLAM RES CORP·Filed 2022·Application pending·0 cites
- 1155US2025149306A1Wafer edge tilt and etch rate uniformityLAM RES CORP·Filed 2022·Application pending·0 cites
- 1252US2024014015A1C-shroud Modification For Plasma Uniformity Without Impacting Mechanical Strength Or Lifetime Of The C-shroudLAM RES CORP·Filed 2022·Application pending·0 cites
- 1346US2023071249A1Etching and plasma uniformity control using magneticsLAM RES CORP·Filed 2021·Application pending·0 cites
- 1445US2019244793A1Tapered upper electrode for uniformity control in plasma processingLAM RES CORP·Filed 2018·Application pending·0 cites
- 1534US2011126852A1Electrostatic chuck with an angled sidewallLAM RES CORP·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →