Inventor · disambiguated record
Jin Hee Hong
Also filed as: HONG JIN · HONG JIN HEE
5 granted patents·6 pending applications·0 citations·filing 2009–2024
58Inventor score
Top patents by PatentIndex Score
11 records- 0160US12276025B2Substrate processing apparatus and substrate processing methodSEMES CO LTD·Filed 2022·Granted Apr 15, 2025·0 cites·20 claims
- 0255US2024410761A1Temperature measurement method and temperature measurement deviceSEMES CO LTD·Filed 2024·Application pending·0 cites
- 0354US2024222171A1Substrate treatment system and substrate treatment methodSEMES CO LTD·Filed 2023·Application pending·0 cites
- 0452US2024063025A1Sacrificial passivation film deposition method, trench etching method and semiconductor processing apparatus using low-temperature ald processSEMES CO LTD·Filed 2023·Application pending·0 cites
- 0551US12444577B2Apparatus and method for processing substrateSEMES CO LTD·Filed 2022·Granted Oct 14, 2025·0 cites·17 claims
- 0649US2022285139A1Apparatus for treating substrate and substrate treating methodSEMES CO LTD·Filed 2022·Application pending·0 cites
- 0749US2023343563A1Substrate treating apparatusSEMES CO LTD·Filed 2022·Application pending·0 cites
- 0848US12347759B2Semiconductor package and substrate for semiconductor packageSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 1, 2025·0 cites·19 claims
- 0948US2022415626A1Apparatus for treating substrate and method for treating substrateSEMES CO LTD·Filed 2022·Application pending·0 cites
- 1046US9162179B2Apparatus for decomposing perfluorocarbon and harmful gas using high-density confined plasma sourceTERATECH CO LTD·Filed 2014·Granted Oct 20, 2015·0 cites·19 claims
- 1140US8460469B2Apparatus for etching substrate and method of etching substrate using the sameKWON GI-CHUNG·Filed 2009·Granted Jun 11, 2013·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →