Inventor · disambiguated record
Naotaka Kubota
Also filed as: KUBOTA NAOTAKA
37 granted patents·10 pending applications·352 citations·filing 2000–2021
97Inventor score
Files withTOKYO OHKA KOGYO CO LTD17AISIN SEIKI13SEIKO EPSON CORP10KUBOTA NAOTAKA2RENESAS ELECTRONICS CORP2
Top patents by PatentIndex Score
47 records- 0198US7323287B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 29, 2008·77 cites·1 claims
- 0297US7074543B2Positive resist composition and method of forming resist pattern from the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 11, 2006·151 cites·20 claims
- 0391US10363872B2Periphery monitoring deviceAISIN SEIKI·Filed 2016·Granted Jul 30, 2019·10 cites·8 claims
- 0490US9810738B2Semiconductor device, diagnostic test, and diagnostic test circuitRENESAS ELECTRONICS CORP·Filed 2015·Granted Nov 7, 2017·7 cites·20 claims
- 0590US6406829B1Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jun 18, 2002·44 cites·7 claims
- 0685US10793070B2Periphery monitoring apparatusAISIN SEIKI·Filed 2017·Granted Oct 6, 2020·5 cites·6 claims
- 0779US10474898B2Image processing apparatus for vehicleAISIN SEIKI·Filed 2016·Granted Nov 12, 2019·3 cites·11 claims
- 0879US7723007B2Polymer compound, photoresist composition including the polymer compound, and resist pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted May 25, 2010·5 cites·13 claims
- 0977US10090364B2Organic EL device, method of manufacturing organic EL device, and electronic apparatusSEIKO EPSON CORP·Filed 2016·Granted Oct 2, 2018·3 cites·11 claims
- 1075US10163986B2Electro-optical device, method for manufacturing electro-optical device, and electronic apparatusSEIKO EPSON CORP·Filed 2017·Granted Dec 25, 2018·2 cites·11 claims
- 1174US10495458B2Image processing system for vehicleAISIN SEIKI·Filed 2017·Granted Dec 3, 2019·2 cites·5 claims
- 1274US9666646B2Light emitting element disposed in a display region of a substrateSEIKO EPSON CORP·Filed 2014·Granted May 30, 2017·2 cites·21 claims
- 1373US6455228B1Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 24, 2002·13 cites·6 claims
- 1471US10464551B2Traveling support deviceAISIN SEIKI·Filed 2017·Granted Nov 5, 2019·2 cites·14 claims
- 1569US10857944B2Periphery monitoring apparatusAISIN SEIKI·Filed 2017·Granted Dec 8, 2020·2 cites·16 claims
- 1668US7435530B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Oct 14, 2008·5 cites·55 claims
- 1762US7316885B2Method of forming resist pattern, positive resist composition, and layered productTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Jan 8, 2008·6 cites·16 claims
- 1861US10520549B2Semiconductor device, diagnostic test, and diagnostic test circuitRENESAS ELECTRONICS CORP·Filed 2017·Granted Dec 31, 2019·0 cites·15 claims
- 1960US11495774B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2021·Granted Nov 8, 2022·0 cites·11 claims
- 2057US6416930B2Composition for lithographic anti-reflection coating, and resist laminate using the sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Jul 9, 2002·4 cites·7 claims
- 2156US10403687B2Electro-optical device, method for manufacturing electro-optical device, and electronic apparatusSEIKO EPSON CORP·Filed 2017·Granted Sep 3, 2019·0 cites·15 claims
- 2256US10153330B2Electro-optical device and electronic apparatus having an evaluation patternSEIKO EPSON CORP·Filed 2017·Granted Dec 11, 2018·0 cites·20 claims
- 2355US7316889B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 8, 2008·2 cites·8 claims
- 2454US7316888B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 8, 2008·2 cites·7 claims
- 2553US9671640B2Color filter substrate, electro-optical device, and projection-type display deviceSEIKO EPSON CORP·Filed 2014·Granted Jun 6, 2017·0 cites·15 claims
- 2652US10347698B2Electrooptical device, manufacturing method of electrooptical device, and electronic equipmentSEIKO EPSON CORP·Filed 2018·Granted Jul 9, 2019·0 cites·20 claims
- 2752US8293449B2Positive resist composition and method of forming resist patternIWAI TAKESHI·Filed 2002·Granted Oct 23, 2012·3 cites·10 claims
- 2849US12388383B2Controller for rotary electric machineMITSUBISHI ELECTRIC CORP·Filed 2021·Granted Aug 12, 2025·0 cites·18 claims
- 2947US2021028246A1Light-emitting device, and electronic apparatusSEIKO EPSON CORP·Filed 2020·Application pending·0 cites
- 3046US7129020B2Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist patternTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Oct 31, 2006·1 cites·6 claims
- 3144US11260794B2Periphery monitoring deviceAISIN SEIKI·Filed 2017·Granted Mar 1, 2022·0 cites·5 claims
- 3244US7033731B2Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 25, 2006·0 cites·7 claims
- 3343US10157595B2Display control deviceAISIN SEIKI·Filed 2017·Granted Dec 18, 2018·0 cites·8 claims
- 3440US10632915B2Surroundings monitoring apparatusAISIN SEIKI·Filed 2016·Granted Apr 28, 2020·0 cites·12 claims
- 3540US7501221B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Mar 10, 2009·0 cites·5 claims
- 3640US7390612B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jun 24, 2008·0 cites·8 claims
- 3740US2002146645A1Multilayered body for photolithographic patterningFiled 2002·Application pending·0 cites
- 3840US2017236880A1Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2017·Application pending·0 cites
- 3940US2018253106A1Periphery monitoring deviceAISIN SEIKI·Filed 2018·Application pending·0 cites
- 4038US2019244324A1Display control apparatusAISIN SEIKI·Filed 2017·Application pending·0 cites
- 4138US2018089907A1Periphery monitoring deviceAISIN SEIKI·Filed 2017·Application pending·0 cites
- 4238US2006009583A1Method of producing (meth) acrylic acid derivative polymer for resistKUBOTA NAOTAKA·Filed 2003·Application pending·0 cites
- 4338US2006127799A1Method for forming resist pattern and resist patternKUBOTA NAOTAKA·Filed 2003·Application pending·0 cites
- 4438US2006063102A1Positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 4537US2020035207A1Display control apparatusAISIN SEIKI·Filed 2017·Application pending·0 cites
- 4635US7326515B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Feb 5, 2008·0 cites·15 claims
- 4733US6864036B2Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 8, 2005·1 cites·25 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →