Inventor · disambiguated record
Alan Stivers
Also filed as: STIVERS ALAN · STIVERS ALAN R
8 granted patents·2 pending applications·225 citations·filing 1999–2005
89Inventor score
Top patents by PatentIndex Score
10 records- 0192US6352803B1Coatings on reflective mask substratesUNIV CALIFORNIA·Filed 2000·Granted Mar 5, 2002·69 cites·20 claims
- 0288US6627362B2Photolithographic mask fabricationINTEL CORP·Filed 2001·Granted Sep 30, 2003·47 cites·29 claims
- 0385US6897157B2Method of repairing an opaque defect on a mask with electron beam-induced chemical etchingINTEL CORP·Filed 2003·Granted May 24, 2005·35 cites·5 claims
- 0482US6506526B2Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelengthINTEL CORP·Filed 2001·Granted Jan 14, 2003·23 cites·28 claims
- 0576US7171637B2Translation generation for a mask patternINTEL CORP·Filed 2005·Granted Jan 30, 2007·6 cites·21 claims
- 0666US6774990B2Method to inspect patterns with high resolution photoemissionINTEL CORP·Filed 2002·Granted Aug 10, 2004·7 cites·85 claims
- 0764US6410193B1Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelengthINTEL CORP·Filed 1999·Granted Jun 25, 2002·36 cites·48 claims
- 0849US7154109B2Method and apparatus for producing electromagnetic radiationINTEL CORP·Filed 2004·Granted Dec 26, 2006·2 cites·39 claims
- 0940US2005109278A1Method to locally protect extreme ultraviolet multilayer blanks used for lithographyFiled 2003·Application pending·0 cites
- 1036US2003000921A1Mask repair with electron beam-induced chemical etchingFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →